Inventor · disambiguated record
John J. Hench
Also filed as: HENCH JOHN · HENCH JOHN J · HENCH JOHN JOSEF
37 granted patents·4 pending applications·551 citations·filing 2000–2023
97Inventor score
Top patents by PatentIndex Score
41 records- 0198US10324050B2Measurement system optimization for X-ray based metrologyKLA TENCOR CORP·Filed 2016·Granted Jun 18, 2019·32 cites·20 claims
- 0298US9518916B1Compressive sensing for metrologyKLA TENCOR CORP·Filed 2014·Granted Dec 13, 2016·38 cites·29 claims
- 0397US10775323B2Full beam metrology for X-ray scatterometry systemsKLA TENCOR CORP·Filed 2017·Granted Sep 15, 2020·19 cites·21 claims
- 0497US9494535B2Scatterometry-based imaging and critical dimension metrologyKLA TENCOR CORP·Filed 2015·Granted Nov 15, 2016·23 cites·25 claims
- 0596US10545104B2Computationally efficient X-ray based overlay measurementKLA TENCOR CORP·Filed 2016·Granted Jan 28, 2020·10 cites·20 claims
- 0695US10325004B1Method of optimizing an optical parametric model for structural analysis using optical critical dimension (OCD) metrologyDZIURA THADDEUS G·Filed 2016·Granted Jun 18, 2019·11 cites·14 claims
- 0794US10481111B2Calibration of a small angle X-ray scatterometry based metrology systemKLA TENCOR CORP·Filed 2017·Granted Nov 19, 2019·11 cites·22 claims
- 0894US7716003B1Model-based measurement of semiconductor device features with feed forward use of data for dimensionality reductionKLA TENCOR TECH CORP·Filed 2007·Granted May 11, 2010·23 cites·14 claims
- 0992US11099137B2Visualization of three-dimensional semiconductor structuresKLA CORP·Filed 2020·Granted Aug 24, 2021·3 cites·21 claims
- 1092US9846132B2Small-angle scattering X-ray metrology systems and methodsKLA TENCOR CORP·Filed 2014·Granted Dec 19, 2017·10 cites·13 claims
- 1192US6970560B1Method and apparatus for impairment diagnosis in communication systemsTOKYO ELECTRON LTD·Filed 2000·Granted Nov 29, 2005·97 cites·24 claims
- 1291US11313816B2Full beam metrology for x-ray scatterometry systemsKLA CORP·Filed 2020·Granted Apr 26, 2022·2 cites·19 claims
- 1391US8798966B1Measuring critical dimensions of a semiconductor structureHENCH JOHN·Filed 2007·Granted Aug 5, 2014·38 cites·35 claims
- 1491US6978015B1Method and apparatus for cooperative diagnosis of impairments and mitigation of disturbers in communication systemsTOKYO ELECTRON LTD·Filed 2000·Granted Dec 20, 2005·49 cites·28 claims
- 1590US6870901B1Design and architecture of an impairment diagnosis system for use in communications systemsTOKYO ELECTRON LTD·Filed 2000·Granted Mar 22, 2005·81 cites·35 claims
- 1688US8666703B2Method for automated determination of an optimally parameterized scatterometry modelFERNS JASON·Filed 2010·Granted Mar 4, 2014·12 cites·17 claims
- 1787US7602509B1Method for selecting optical configuration for high-precision scatterometric measurementKLA TENCOR CORP·Filed 2008·Granted Oct 13, 2009·11 cites·24 claims
- 1885US10794839B2Visualization of three-dimensional semiconductor structuresKLA TENCOR CORP·Filed 2019·Granted Oct 6, 2020·4 cites·21 claims
- 1983US11073487B2Methods and systems for characterization of an x-ray beam with high spatial resolutionKLA TENCOR CORP·Filed 2018·Granted Jul 27, 2021·3 cites·35 claims
- 2083US10983227B2On-device metrology using target decompositionKLA TENCOR CORP·Filed 2018·Granted Apr 20, 2021·3 cites·20 claims
- 2179US12320763B2Full beam metrology for x-ray scatterometry systemsKLA CORP·Filed 2022·Granted Jun 3, 2025·0 cites·20 claims
- 2279US8108328B2Neural network based hermite interpolator for scatterometry parameter estimationHENCH JOHN J·Filed 2008·Granted Jan 31, 2012·20 cites·24 claims
- 2376US9310296B2Optimizing an optical parametric model for structural analysis using optical critical dimension (OCD) metrologyDZIURA THADDEUS G·Filed 2011·Granted Apr 12, 2016·4 cites·24 claims
- 2475US8381140B2Wide process range library for metrologyTOKYO ELECTRON LTD·Filed 2011·Granted Feb 19, 2013·3 cites·26 claims
- 2573US7796544B2Method and system for providing an analog front end for multiline transmission in communication systemsTOKYO ELECTRON LTD·Filed 2003·Granted Sep 14, 2010·17 cites·14 claims
- 2671US11428650B2Computationally efficient x-ray based overlay measurementKLA CORP·Filed 2019·Granted Aug 30, 2022·0 cites·18 claims
- 2771US10062157B2Compressive sensing for metrologyKLA TENCOR CORP·Filed 2016·Granted Aug 28, 2018·1 cites·21 claims
- 2870US7826072B1Method for optimizing the configuration of a scatterometry measurement systemKLA TENCOR TECH CORP·Filed 2007·Granted Nov 2, 2010·6 cites·19 claims
- 2963US12379668B2Methods and systems for measurement of semiconductor structures with multi-pass statistical optimizationKLA CORP·Filed 2023·Granted Aug 5, 2025·0 cites·24 claims
- 3063US10677586B2Phase revealing optical and X-ray semiconductor metrologyKLA TENCOR CORP·Filed 2018·Granted Jun 9, 2020·0 cites·20 claims
- 3163US7053705B2Mixed-mode (current-voltage) audio amplifierTYMPHANY CORP·Filed 2003·Granted May 30, 2006·15 cites·42 claims
- 3258US12449386B2Forward library based seeding for efficient X-ray scatterometry measurementsKLA CORP·Filed 2023·Granted Oct 21, 2025·0 cites·20 claims
- 3358US7864692B1Method and apparatus for the prediction and optimization in impaired communication systemsTOKYO ELECTRON LTD·Filed 2000·Granted Jan 4, 2011·5 cites·30 claims
- 3453US2022252395A1Methods And Systems For Accurate Measurement Of Deep Structures Having Distorted GeometryKLA CORP·Filed 2022·Application pending·0 cites
- 3552US2024060914A1Methods And Systems For X-Ray Scatterometry Measurements Employing A Machine Learning Based Electromagnetic Response ModelKLA CORP·Filed 2022·Application pending·0 cites
- 3651US2024085321A1Methods And Systems For Model-less, Scatterometry Based Measurements Of Semiconductor StructuresKLA CORP·Filed 2023·Application pending·0 cites
- 3748US7978591B2Mitigation of interference and crosstalk in communications systemsTOKYO ELECTRON LTD·Filed 2007·Granted Jul 12, 2011·0 cites·20 claims
- 3842US11305178B2Chess variant including additional player piece and method of playHENCH JOHN JOSEF·Filed 2020·Granted Apr 19, 2022·0 cites·18 claims
- 3942US8760649B1Model-based metrology using tesselation-based discretizationVELDMAN ANDREI·Filed 2008·Granted Jun 24, 2014·0 cites·22 claims
- 4042US2020025554A1System, method and computer program product for fast automatic determination of signals for efficient metrologyKLA TENCOR CORP·Filed 2016·Application pending·0 cites
- 4138US9523800B2Computation efficiency by iterative spatial harmonics order truncationVELDMAN ANDREI·Filed 2010·Granted Dec 20, 2016·0 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →