Inventor · disambiguated record
Hanyou Chu
Also filed as: CHU HANYOU
34 granted patents·1 pending application·845 citations·filing 2000–2024
98Inventor score
Top patents by PatentIndex Score
35 records- 0199US6704661B1Real time analysis of periodic structures on semiconductorsTHERMA WAVE INC·Filed 2001·Granted Mar 9, 2004·215 cites·28 claims
- 0298US6919964B2CD metrology analysis using a finite difference methodTHERMA WAVE INC·Filed 2003·Granted Jul 19, 2005·162 cites·32 claims
- 0397US7038850B2CD metrology analysis using green's functionTHERMA WAVE INC·Filed 2005·Granted May 2, 2006·67 cites·49 claims
- 0497US6778911B2Real time analysis of periodic structures on semiconductorsTHERMA WAVE INC·Filed 2003·Granted Aug 17, 2004·82 cites·19 claims
- 0595US7394535B1Optical metrology using a photonic nanojetTOKYO ELECTRON LTD·Filed 2007·Granted Jul 1, 2008·37 cites·20 claims
- 0694US7031848B2Real time analysis of periodic structures on semiconductorsTHERMA WAVE INC·Filed 2005·Granted Apr 18, 2006·18 cites·18 claims
- 0792US7327475B1Measuring a process parameter of a semiconductor fabrication process using optical metrologyTOKYO ELECTRON LTD·Filed 2006·Granted Feb 5, 2008·19 cites·41 claims
- 0892US6867866B1CD metrology analysis using green's functionTHERMA WAVE INC·Filed 2002·Granted Mar 15, 2005·54 cites·35 claims
- 0991US6281027B1Spatial averaging technique for ellipsometry and reflectometryTHERMA-WAVE INC·Filed 2000·Granted Aug 28, 2001·43 cites·9 claims
- 1090US7636649B2Automated process control of a fabrication tool using a dispersion function relating process parameter to dispersionTOKYO ELECTRON LTD·Filed 2007·Granted Dec 22, 2009·16 cites·18 claims
- 1189US7106459B2CD metrology analysis using a finite difference methodTHERMA WAVE INC·Filed 2005·Granted Sep 12, 2006·9 cites·14 claims
- 1286US6947850B2Real time analysis of periodic structures on semiconductorsTHERMA WAVE INC·Filed 2003·Granted Sep 20, 2005·17 cites·13 claims
- 1384US9970818B2Spatially resolved optical emission spectroscopy (OES) in plasma processingTOKYO ELECTRON LTD·Filed 2014·Granted May 15, 2018·5 cites·19 claims
- 1484US6931361B2Real time analysis of periodic structures on semiconductorsTHERMA WAVE INC·Filed 2004·Granted Aug 16, 2005·15 cites·10 claims
- 1583US12261030B2Normal-incidence in-situ process monitor sensorTOKYO ELECTRON LTD·Filed 2024·Granted Mar 25, 2025·0 cites·10 claims
- 1683US7145664B2Global shape definition method for scatterometryTHERMA WAVE INC·Filed 2004·Granted Dec 5, 2006·20 cites·16 claims
- 1782US10978278B2Normal-incident in-situ process monitor sensorTOKYO ELECTRON LTD·Filed 2018·Granted Apr 13, 2021·2 cites·19 claims
- 1880US9059038B2System for in-situ film stack measurement during etching and etch control methodTOKYO ELECTRON LTD·Filed 2013·Granted Jun 16, 2015·5 cites·10 claims
- 1979US7522294B2Measuring a process parameter of a semiconductor fabrication process using optical metrologyTOKYO ELECTRON LTD·Filed 2008·Granted Apr 21, 2009·5 cites·22 claims
- 2078US7613598B2Global shape definition method for scatterometryKLA TENCOR CORP·Filed 2006·Granted Nov 3, 2009·5 cites·19 claims
- 2177US7912679B2Determining profile parameters of a structure formed on a semiconductor wafer using a dispersion function relating process parameter to dispersionTOKYO ELECTRON LTD·Filed 2007·Granted Mar 22, 2011·5 cites·17 claims
- 2275US9127927B2Techniques for optimized scatterometryILORETA JONATHAN·Filed 2012·Granted Sep 8, 2015·5 cites·40 claims
- 2375US8762100B1Numerical aperture integration for optical critical dimension (OCD) metrologyCHU HANYOU·Filed 2012·Granted Jun 24, 2014·2 cites·20 claims
- 2474US8670948B2Numerical aperture integration for optical critical dimension (OCD) metrologyCHU HANYOU·Filed 2012·Granted Mar 11, 2014·2 cites·21 claims
- 2572US7233390B2Scatterometry for samples with non-uniform edgesTHERMA WAVE INC·Filed 2004·Granted Jun 19, 2007·10 cites·27 claims
- 2670US6577384B2Spatial averaging technique for ellipsometry and reflectometryTHERMA WAVE INC·Filed 2001·Granted Jun 10, 2003·9 cites·8 claims
- 2769US11961721B2Normal-incidence in-situ process monitor sensorTOKYO ELECTRON LTD·Filed 2021·Granted Apr 16, 2024·0 cites·8 claims
- 2869US8069020B2Generating simulated diffraction signal using a dispersion function relating process parameter to dispersionLI SHIFANG·Filed 2007·Granted Nov 29, 2011·2 cites·14 claims
- 2967US10837902B2Optical sensor for phase determinationTOKYO ELECTRON LTD·Filed 2018·Granted Nov 17, 2020·1 cites·20 claims
- 3064US7639351B2Automated process control using optical metrology with a photonic nanojetTOKYO ELECTRON LTD·Filed 2007·Granted Dec 29, 2009·4 cites·32 claims
- 3161US9625937B2Computation efficiency by diffraction order truncationBISCHOFF JOERG·Filed 2008·Granted Apr 18, 2017·2 cites·18 claims
- 3260US8560270B2Rational approximation and continued-fraction approximation approaches for computation efficiency of diffraction signalsCHU HANYOU·Filed 2008·Granted Oct 15, 2013·3 cites·28 claims
- 3358US6856385B2Spatial averaging technique for ellipsometry and reflectometryTHERMA WAVE INC·Filed 2003·Granted Feb 15, 2005·4 cites·8 claims
- 3458US2025271779A1Modeling substrate characteristics from manufacturing sensor dataAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3546US7639375B2Determining transmittance of a photomask using optical metrologyTOKYO ELECTRON LTD·Filed 2006·Granted Dec 29, 2009·0 cites·20 claims
Join the waitlist — get patent alerts
Get an alert when Hanyou Chu files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →