Inventor · disambiguated record
Pao-Hwa Chou
Also filed as: CHOU PAO-HWA
27 granted patents·11 pending applications·887 citations·filing 2001–2015
97Inventor score
Top patents by PatentIndex Score
38 records- 0198US7507676B2Film formation method and apparatus for semiconductor processTOKYO ELECTRON LTD·Filed 2007·Granted Mar 24, 2009·79 cites·10 claims
- 0298US7462571B2Film formation method and apparatus for semiconductor process for forming a silicon nitride filmTOKYO ELECTRON LTD·Filed 2005·Granted Dec 9, 2008·91 cites·15 claims
- 0398US7351668B2Film formation method and apparatus for semiconductor processTOKYO ELECTRON LTD·Filed 2006·Granted Apr 1, 2008·96 cites·22 claims
- 0498US7300885B2Film formation apparatus and method for semiconductor processTOKYO ELECTRON LTD·Filed 2005·Granted Nov 27, 2007·91 cites·20 claims
- 0597US8080290B2Film formation method and apparatus for semiconductor processHASEBE KAZUHIDE·Filed 2009·Granted Dec 20, 2011·109 cites·12 claims
- 0697US7758920B2Method and apparatus for forming silicon-containing insulating filmTOKYO ELECTRON LTD·Filed 2006·Granted Jul 20, 2010·81 cites·18 claims
- 0796US8563096B2Vertical film formation apparatus and method for using sameMATSUNAGA MASANOBU·Filed 2010·Granted Oct 22, 2013·31 cites·13 claims
- 0896US8034673B2Film formation method and apparatus for forming silicon-containing insulating film doped with metalTOKYO ELECTRON LTD·Filed 2009·Granted Oct 11, 2011·74 cites·17 claims
- 0996US7964241B2Film formation method and apparatus for semiconductor processTOKYO ELECTRON LTD·Filed 2007·Granted Jun 21, 2011·75 cites·10 claims
- 1094US8178448B2Film formation method and apparatus for semiconductor processNODERA NOBUTAKE·Filed 2010·Granted May 15, 2012·82 cites·16 claims
- 1193US8591989B2SiCN film formation method and apparatusCHOU PAO-HWA·Filed 2012·Granted Nov 26, 2013·15 cites·8 claims
- 1290US8673725B2Multilayer sidewall spacer for seam protection of a patterned structureO'MEARA DAVID L·Filed 2010·Granted Mar 18, 2014·15 cites·12 claims
- 1388US8343594B2Film formation method and apparatus for semiconductor processTOKYO ELECTRON LTD·Filed 2008·Granted Jan 1, 2013·8 cites·14 claims
- 1486US7989354B2Patterning methodTOKYO ELECTRON LTD·Filed 2008·Granted Aug 2, 2011·9 cites·30 claims
- 1583US8025931B2Film formation apparatus for semiconductor process and method for using the sameTOKYO ELECTRON LTD·Filed 2007·Granted Sep 27, 2011·5 cites·12 claims
- 1682US8216648B2Film formation method and apparatusMATSUNAGA MASANOBU·Filed 2010·Granted Jul 10, 2012·6 cites·3 claims
- 1780US8168375B2Patterning methodNAKAJIMA SHIGERU·Filed 2008·Granted May 1, 2012·9 cites·25 claims
- 1874US7959733B2Film formation apparatus and method for semiconductor processTOKYO ELECTRON LTD·Filed 2009·Granted Jun 14, 2011·1 cites·12 claims
- 1973US8383522B2Micro pattern forming methodTOKYO ELECTRON LTD·Filed 2011·Granted Feb 26, 2013·2 cites·18 claims
- 2070US7718497B2Method for manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2008·Granted May 18, 2010·3 cites·4 claims
- 2168US7754622B2Patterning method utilizing SiBN and photolithographyTOKYO ELECTRON LTD·Filed 2008·Granted Jul 13, 2010·2 cites·11 claims
- 2264US2008213479A1SiCN film formation method and apparatusTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 2360US8658247B2Film deposition methodIKEUCHI TOSHIYUKI·Filed 2011·Granted Feb 25, 2014·1 cites·15 claims
- 2460US8642486B2Thin film forming method, thin film forming apparatus, and programIKEUCHI TOSHIYUKI·Filed 2011·Granted Feb 4, 2014·1 cites·5 claims
- 2558US8664102B2Dual sidewall spacer for seam protection of a patterned structureO'MEARA DAVID L·Filed 2010·Granted Mar 4, 2014·1 cites·13 claims
- 2657US2006207504A1Film formation method and apparatus for semiconductor processHASEBE KAZUHIDE·Filed 2006·Application pending·0 cites
- 2756US2005282365A1Film formation apparatus and method for semiconductor processHASEBE KAZUHIDE·Filed 2005·Application pending·0 cites
- 2853US2014199839A1Film-forming method for forming silicon oxide film on tungsten film or tungsten oxide filmTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 2952US2008311760A1Film formation method and apparatus for semiconductor processNODERA NOBUTAKE·Filed 2008·Application pending·0 cites
- 3049US2012164327A1Film-forming method and film-forming apparatus for forming silicon oxide film on tungsten film or tungsten oxide filmSATO JUN·Filed 2011·Application pending·0 cites
- 3148US2014090594A1Thin film forming apparatus and computer-readable mediumTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 3246US9466476B2Film-forming method for forming silicon oxide film on tungsten film or tungsten oxide filmTOKYO ELECTRON LTD·Filed 2014·Granted Oct 11, 2016·0 cites·7 claims
- 3345US2011281443A1Film formation method and film formation apparatusCHOU PAO-HWA·Filed 2011·Application pending·0 cites
- 3443US2016024654A1Film Forming ApparatusTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 3542US9460913B2Film-forming method for forming silicon oxide film on tungsten film or tungsten oxide filmTOKYO ELECTRON LTD·Filed 2015·Granted Oct 4, 2016·0 cites·6 claims
- 3637US2003029839A1Method of reducing wet etch rate of silicon nitrideWINBOND ELECTRONICS CORP·Filed 2001·Application pending·0 cites
- 3734US8734901B2Film deposition method and apparatusSUZUKI KEISUKE·Filed 2012·Granted May 27, 2014·0 cites·4 claims
- 3833US2015259799A1Vertical heat treatment apparatus, method of operating vertical heat treatment apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
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