Inventor · disambiguated record
Kuo-Lih Chang
Also filed as: CHANG KUO-LIH
7 granted patents·5 pending applications·54 citations·filing 2003–2025
82Inventor score
Top patents by PatentIndex Score
12 records- 0196US10161786B2Emitter module for an LED illumination deviceLUTRON KETRA LLC·Filed 2014·Granted Dec 25, 2018·42 cites·18 claims
- 0293US10605652B2Emitter module for an LED illumination deviceLUTRON KETRA LLC·Filed 2018·Granted Mar 31, 2020·6 cites·20 claims
- 0388US12292326B2Emitter module for an LED illumination deviceLUTRON TECH CO LLC·Filed 2024·Granted May 6, 2025·0 cites·20 claims
- 0484US12050126B2Emitter module for an LED illumination deviceLUTRON TECH CO LLC·Filed 2023·Granted Jul 30, 2024·0 cites·20 claims
- 0577US11740123B2Emitter module for an LED illumination deviceLUTRON TECH CO LLC·Filed 2022·Granted Aug 29, 2023·0 cites·17 claims
- 0677US2025155280A1Emitter Module for an LED Illumination DeviceLUTRON TECH CO LLC·Filed 2025·Application pending·0 cites
- 0771US11243112B2Emitter module for an LED illumination deviceLUTRON TECH CO LLC·Filed 2020·Granted Feb 8, 2022·0 cites·20 claims
- 0857US7407863B2Adhesive bonding with low temperature grown amorphous or polycrystalline compound semiconductorsUNIV ILLINOIS·Filed 2003·Granted Aug 5, 2008·6 cites·63 claims
- 0950US2008296619A1Adhesive bonding with low temperature grown amorphous or polycrystalline compound semiconductorsUNIV ILLINOIS·Filed 2008·Application pending·0 cites
- 1048US2010096360A1Compositions and methods for barrier layer polishingAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 1148US2010130101A1Two-line mixing of chemical and abrasive particles with endpoint control for chemical mechanical polishingAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 1246US2009061743A1Method of soft pad preparation to reduce removal rate ramp-up effect and to stabilize defect rateJEW STEPHEN·Filed 2008·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →