Inventor · disambiguated record
Barry Loevsky
Also filed as: LOEVSKY BARRY
12 granted patents·65 citations·filing 2014–2019
88Inventor score
Top patents by PatentIndex Score
12 records- 0197US9182219B1Overlay measurement based on moire effect between structured illumination and overlay targetKLA TENCOR CORP·Filed 2014·Granted Nov 10, 2015·23 cites·20 claims
- 0296US10190979B2Metrology imaging targets having reflection-symmetric pairs of reflection-asymmetric structuresKLA TENCOR CORP·Filed 2015·Granted Jan 29, 2019·12 cites·21 claims
- 0396US9123649B1Fit-to-pitch overlay measurement targetsKLA TENCOR CORP·Filed 2014·Granted Sep 1, 2015·14 cites·20 claims
- 0490US10209183B2Scatterometry system and method for generating non-overlapping and non-truncated diffraction imagesKLA TENCOR CORP·Filed 2017·Granted Feb 19, 2019·4 cites·24 claims
- 0587US10877437B2Zero order blocking and diverging for holographic imagingREAL VIEW IMAGING LTD·Filed 2018·Granted Dec 29, 2020·8 cites·16 claims
- 0681US9255787B1Measurement of critical dimension and scanner aberration utilizing metrology targetsKLA TENCOR CORP·Filed 2014·Granted Feb 9, 2016·2 cites·19 claims
- 0776US9719920B2Scatterometry system and method for generating non-overlapping and non-truncated diffraction imagesKLA TENCOR CORP·Filed 2014·Granted Aug 1, 2017·2 cites·36 claims
- 0861US9429856B1Detectable overlay targets with strong definition of center locationsKLA TENCOR CORP·Filed 2014·Granted Aug 30, 2016·0 cites·26 claims
- 0958US11060845B2Polarization measurements of metrology targets and corresponding target designsKLA TENCOR CORP·Filed 2019·Granted Jul 13, 2021·0 cites·42 claims
- 1048US10458777B2Polarization measurements of metrology targets and corresponding target designsKLA TENCOR CORP·Filed 2015·Granted Oct 29, 2019·0 cites·20 claims
- 1147US11663937B2Pupil tracking in an image display systemREAL VIEW IMAGING LTD·Filed 2018·Granted May 30, 2023·0 cites·26 claims
- 1240US10352766B1Focusing modules and methodsKLA TENCOR CORP·Filed 2015·Granted Jul 16, 2019·0 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →