Inventor · disambiguated record
Manuel Madriaga
Also filed as: MADRIAGA MANUEL · MADRIAGA MANUEL B
30 granted patents·3 pending applications·438 citations·filing 2003–2011
97Inventor score
Top patents by PatentIndex Score
33 records- 0196US8289527B2Optimization of ray tracing and beam propagation parametersLI SHIFANG·Filed 2010·Granted Oct 16, 2012·20 cites·19 claims
- 0295US7372583B1Controlling a fabrication tool using support vector machineTOKYO ELECTRON LTD·Filed 2007·Granted May 13, 2008·22 cites·23 claims
- 0394US8173451B1Etch stage measurement systemTIAN XINKANG·Filed 2011·Granted May 8, 2012·35 cites·17 claims
- 0492US8193007B1Etch process control using optical metrology and sensor devicesMADRIAGA MANUEL·Filed 2011·Granted Jun 5, 2012·24 cites·5 claims
- 0592US7595869B1Optical metrology system optimized with a plurality of design goalsTOKYO ELECTRON LTD·Filed 2008·Granted Sep 29, 2009·24 cites·20 claims
- 0692US7126700B2Parametric optimization of optical metrology modelTIMBRE TECH INC·Filed 2003·Granted Oct 24, 2006·59 cites·56 claims
- 0790US7636649B2Automated process control of a fabrication tool using a dispersion function relating process parameter to dispersionTOKYO ELECTRON LTD·Filed 2007·Granted Dec 22, 2009·16 cites·18 claims
- 0890US7567352B2Controlling a fabrication tool using support vector machineTOKYO ELECTRON LTD·Filed 2008·Granted Jul 28, 2009·10 cites·23 claims
- 0989US7761178B2Automated process control using an optical metrology system optimized with design goalsTOKYO ELECTRON LTD·Filed 2008·Granted Jul 20, 2010·16 cites·23 claims
- 1087US8173450B1Method of designing an etch stage measurement systemTIAN XINKANG·Filed 2011·Granted May 8, 2012·10 cites·18 claims
- 1187US7417750B2Consecutive measurement of structures formed on a semiconductor wafer using an angle-resolved spectroscopic scatterometerTOKYO ELECTRON LTD·Filed 2006·Granted Aug 26, 2008·11 cites·26 claims
- 1286US7734437B2Apparatus for designing an optical metrology system optimized with signal criteriaTOKYO ELECTRON LTD·Filed 2008·Granted Jun 8, 2010·12 cites·20 claims
- 1386US7660696B1Apparatus for auto focusing a workpiece using two or more focus parametersTOKYO ELECTRON LTD·Filed 2008·Granted Feb 9, 2010·15 cites·17 claims
- 1486US7444196B2Optimized characterization of wafers structures for optical metrologyTIMBRE TECH INC·Filed 2006·Granted Oct 28, 2008·10 cites·32 claims
- 1585US7589845B1Process control using an optical metrology system optimized with signal criteriaTOKYO ELECTRON LTD·Filed 2008·Granted Sep 15, 2009·16 cites·20 claims
- 1685US7526354B2Managing and using metrology data for process and equipment controlTOKYO ELECTRON LTD·Filed 2006·Granted Apr 28, 2009·10 cites·31 claims
- 1784US7567353B2Automated process control using optical metrology and photoresist parametersTOKYO ELECTRON LTD·Filed 2007·Granted Jul 28, 2009·10 cites·24 claims
- 1884US6791679B2Adaptive correlation of pattern resist structures using optical metrologyTIMBRE TECH INC·Filed 2003·Granted Sep 14, 2004·32 cites·37 claims
- 1983US7742889B2Designing an optical metrology system optimized with signal criteriaTOKYO ELECTRON LTD·Filed 2008·Granted Jun 22, 2010·9 cites·20 claims
- 2083US7667858B2Automated process control using optical metrology and a correlation between profile models and key profile shape variablesTOKYO ELECTRON LTD·Filed 2007·Granted Feb 23, 2010·9 cites·26 claims
- 2181US8838422B2Process control using ray tracing-based libraries and machine learning systemsLI SHIFANG·Filed 2011·Granted Sep 16, 2014·6 cites·21 claims
- 2280US7761250B2Optical metrology system optimized with design goalsTOKYO ELECTRON LTD·Filed 2008·Granted Jul 20, 2010·12 cites·18 claims
- 2380US7627392B2Automated process control using parameters determined with approximation and fine diffraction modelsTOKYO ELECTRON LTD·Filed 2007·Granted Dec 1, 2009·12 cites·20 claims
- 2477US7961306B2Optimizing sensitivity of optical metrology measurementsTOKYO ELECTRON LTD·Filed 2009·Granted Jun 14, 2011·9 cites·20 claims
- 2576US7480062B2Automated process control using parameters determined from a photomask covered by a pellicleTOKYO ELECTRON LTD·Filed 2007·Granted Jan 20, 2009·4 cites·14 claims
- 2675US7522295B2Consecutive measurement of structures formed on a semiconductor wafer using a polarized reflectometerTOKYO ELECTRON LTD·Filed 2006·Granted Apr 21, 2009·4 cites·26 claims
- 2771US7949618B2Training a machine learning system to determine photoresist parametersTOKYO ELECTRON LTD·Filed 2007·Granted May 24, 2011·10 cites·19 claims
- 2864US7639351B2Automated process control using optical metrology with a photonic nanojetTOKYO ELECTRON LTD·Filed 2007·Granted Dec 29, 2009·4 cites·32 claims
- 2960US9103664B2Automated process control using an adjusted metrology output signalLI SHIFANG·Filed 2010·Granted Aug 11, 2015·1 cites·15 claims
- 3058US7440881B2Adaptive correlation of pattern resist structures using optical metrologyTIMBRE TECH INC·Filed 2004·Granted Oct 21, 2008·6 cites·9 claims
- 3156US2009234687A1Method of designing an optical metrology system optimized for operating time budgetTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 3246US2009240537A1Apparatus for designing an optical metrology system optimized for operating time budgetTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 3344US2010118316A1Auto focus array detector optimized for operating objectivesTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
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