Inventor · disambiguated record
Heng-Jen Lee
Also filed as: LEE HENG-JEN
31 granted patents·3 pending applications·93 citations·filing 2006–2024
95Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD12HUANG I-HSIUNG4PENG JUI-CHUN3TAIWAN SEMICONDUCTOR MFG3LIN CHIN-HSIANG2
Top patents by PatentIndex Score
34 records- 0197US8507177B2Photoresist materials and photolithography processesWANG HSIEN-CHENG·Filed 2011·Granted Aug 13, 2013·34 cites·19 claims
- 0291US8592102B2Cost-effective method for extreme ultraviolet (EUV) mask productionLIN CHIN-HSIANG·Filed 2009·Granted Nov 26, 2013·16 cites·13 claims
- 0390US9671685B2Lithographic plane check for mask processingLIN CHIN-HSIANG·Filed 2010·Granted Jun 6, 2017·8 cites·13 claims
- 0483US8183701B2Structure of stacking scatterometry based overlay marks for marks footprint reductionSHIH CHI-YUAN·Filed 2009·Granted May 22, 2012·7 cites·13 claims
- 0582US2024393051A1Adaptive baking methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 0681US10558120B2System and method for supplying and dispensing bubble-free photolithography chemical solutionsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Feb 11, 2020·2 cites·20 claims
- 0780US7901854B2Wafer edge exposure unitTAIWAN SEMICONDUCTOR MFG·Filed 2009·Granted Mar 8, 2011·5 cites·20 claims
- 0880US7393616B2Line end spacing measurementTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Jul 1, 2008·6 cites·20 claims
- 0979US8860941B2Tool induced shift reduction determination for overlay metrologyLEE YUNG-YAO·Filed 2012·Granted Oct 14, 2014·3 cites·19 claims
- 1078US2023384680A1System and method for supplying and dispensing bubble-free photolithography chemical solutionsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 1176US12196491B2Adaptive baking methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jan 14, 2025·0 cites·20 claims
- 1276US8239788B2Frame cell for shot layout flexibilityLIN CHIH-WEI·Filed 2009·Granted Aug 7, 2012·4 cites·24 claims
- 1372US9196515B2Litho cluster and modulization to enhance productivityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Nov 24, 2015·2 cites·20 claims
- 1466US12025917B2System and method for supplying and dispensing bubble-free photolithography chemical solutionsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jul 2, 2024·0 cites·20 claims
- 1566US8955530B2System and method for cleaning a wafer chuckPENG JUI-CHUN·Filed 2011·Granted Feb 17, 2015·2 cites·9 claims
- 1661US11204200B2Adaptive baking methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 21, 2021·0 cites·20 claims
- 1759US9632426B2In-situ immersion hood cleaningPENG JUI-CHUN·Filed 2011·Granted Apr 25, 2017·1 cites·20 claims
- 1857US10006717B2Adaptive baking system and method of using the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Jun 26, 2018·0 cites·19 claims
- 1957US9817315B2System and method for supplying and dispensing bubble-free photolithography chemical solutionsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Nov 14, 2017·0 cites·20 claims
- 2056US8848163B2Photoresist materials and photolithography processesWANG HSIEN-CHENG·Filed 2011·Granted Sep 30, 2014·0 cites·16 claims
- 2156US8101530B2Lithography patterning methodHUANG I-HSIUNG·Filed 2009·Granted Jan 24, 2012·1 cites·20 claims
- 2253US9601324B2Method of making wafer assemblyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Mar 21, 2017·0 cites·21 claims
- 2352US9111982B2Wafer assembly with carrier waferHUANG I-HSIUNG·Filed 2012·Granted Aug 18, 2015·0 cites·20 claims
- 2448US8101340B2Method of inhibiting photoresist pattern collapseCHANG CHING-YU·Filed 2007·Granted Jan 24, 2012·0 cites·20 claims
- 2547US8237132B2Method and apparatus for reducing down time of a lithography systemPENG JUI-CHUN·Filed 2009·Granted Aug 7, 2012·2 cites·20 claims
- 2646US10274839B2Two-dimensional marksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Apr 30, 2019·0 cites·20 claims
- 2746US9690212B2Hybrid focus-exposure matrixTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Jun 27, 2017·0 cites·19 claims
- 2846US2009258159A1Novel treatment for mask surface chemical reductionTAIWAN SEMICONDUCTOR MFG·Filed 2008·Application pending·0 cites
- 2945US8338262B2Dual wavelength exposure method and system for semiconductor device manufacturingLEE HENG-JEN·Filed 2009·Granted Dec 25, 2012·0 cites·14 claims
- 3044US8544317B2Semiconductor processing apparatus with simultaneously movable stagesLIN YU-FU·Filed 2009·Granted Oct 1, 2013·0 cites·8 claims
- 3142US8903532B2Litho cluster and modulization to enhance productivityHUANG I-HSIUNG·Filed 2012·Granted Dec 2, 2014·0 cites·20 claims
- 3241US8609545B2Method to improve mask critical dimension uniformity (CDU)HUANG I-HSIUNG·Filed 2008·Granted Dec 17, 2013·0 cites·12 claims
- 3337US8906599B2Enhanced scanner throughput system and methodLIU YU-MEI·Filed 2012·Granted Dec 9, 2014·0 cites·13 claims
- 3433US8625076B2Wafer edge exposure moduleCHIEN TSUNG-CHIH·Filed 2010·Granted Jan 7, 2014·0 cites·15 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →