Inventor · disambiguated record
Rikimaru Sakamoto
Also filed as: SAKAMOTO RIKIMARU
101 granted patents·14 pending applications·179 citations·filing 2003–2023
99Inventor score
Top patents by PatentIndex Score
115 records- 0197US11720024B2Resist underlayer film-forming composition containing indolocarbazole novolak resinNISSAN CHEMICAL IND LTD·Filed 2022·Granted Aug 8, 2023·4 cites·8 claims
- 0292US7632626B2Anti-reflective coating forming composition for lithography containing polymer having ethylenedicarbonyl structureNISSAN CHEMICAL IND LTD·Filed 2006·Granted Dec 15, 2009·14 cites·12 claims
- 0391US9005873B2Composition for forming resist underlayer film for EUV lithographyNISSAN CHEMICAL IND LTD·Filed 2013·Granted Apr 14, 2015·11 cites·8 claims
- 0490US8993215B2Resist underlayer film forming composition containing phenylindole-containing novolac resinNISSAN CHEMICAL IND LTD·Filed 2013·Granted Mar 31, 2015·11 cites·8 claims
- 0589US7790356B2Condensation type polymer-containing anti-reflective coating for semiconductorNISSAN CHEMICAL IND LTD·Filed 2005·Granted Sep 7, 2010·9 cites·16 claims
- 0688US10804111B2Method for roughening surface using wet treatmentNISSAN CHEMICAL IND LTD·Filed 2016·Granted Oct 13, 2020·5 cites·16 claims
- 0787US9263286B2Diarylamine novolac resinNISSAN CHEMICAL IND LTD·Filed 2012·Granted Feb 16, 2016·8 cites·13 claims
- 0887US8722840B2Resist underlayer film forming composition, and method for forming resist pattern using the sameSAKAMOTO RIKIMARU·Filed 2011·Granted May 13, 2014·6 cites·8 claims
- 0987US7736822B2Resist underlayer coating forming composition for mask blank, mask blank and maskHOYA CORP·Filed 2007·Granted Jun 15, 2010·10 cites·11 claims
- 1085US10795261B2Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the sameNISSAN CHEMICAL IND LTD·Filed 2016·Granted Oct 6, 2020·2 cites·7 claims
- 1183US9910354B2Resist underlayer film-forming composition and method for forming resist pattern using the sameNISSAN CHEMICAL IND LTD·Filed 2015·Granted Mar 6, 2018·4 cites·9 claims
- 1282US10865262B2Upper-layer film forming composition and method for producing a phase-separated patternNISSAN CHEMICAL CORP·Filed 2017·Granted Dec 15, 2020·3 cites·14 claims
- 1381US9195137B2Composition for forming highly adhesive resist underlayer filmNISSAN CHEMICAL IND LTD·Filed 2013·Granted Nov 24, 2015·5 cites·6 claims
- 1480US11681223B2Photocurable composition and method for producing semiconductor deviceNISSAN CHEMICAL CORP·Filed 2017·Granted Jun 20, 2023·2 cites·10 claims
- 1580US9746768B2Resist overlayer film forming composition for lithography and method for producing semiconductor device using the sameNISSAN CHEMICAL IND LTD·Filed 2014·Granted Aug 29, 2017·5 cites·4 claims
- 1680US9469777B2Resist underlayer film forming composition that contains novolac resin having polynuclear phenolNISSAN CHEMICAL IND LTD·Filed 2013·Granted Oct 18, 2016·4 cites·12 claims
- 1779US12242196B2Resist underlayer film-forming composition containing indolocarbazole novolak resinNISSAN CHEMICAL IND LTD·Filed 2023·Granted Mar 4, 2025·0 cites·4 claims
- 1879US7846638B2Composition for forming anti-reflective coating for use in lithographyNISSAN CHEMICAL IND LTD·Filed 2007·Granted Dec 7, 2010·5 cites·12 claims
- 1978US9261790B2Resist underlayer film-forming composition containing copolymer resin having heterocyclic ringNISSAN CHEMICAL IND LTD·Filed 2013·Granted Feb 16, 2016·4 cites·15 claims
- 2077US9250525B2Resist underlayer film-forming compositionNISSAN CHEMICAL IND LTD·Filed 2015·Granted Feb 2, 2016·2 cites·4 claims
- 2176US10082735B2Silicon-containing resist underlayer film-forming composition having organic group having aliphatic polycyclic structureNISSAN CHEMICAL IND LTD·Filed 2015·Granted Sep 25, 2018·1 cites·11 claims
- 2276US9746764B2Mask blank and transfer maskHOYA CORP·Filed 2014·Granted Aug 29, 2017·2 cites·6 claims
- 2375US11650505B2Resist underlayer film-forming composition containing novolac resin reacted with aromatic methylol compoundNISSAN CHEMICAL IND LTD·Filed 2015·Granted May 16, 2023·2 cites·15 claims
- 2475US11022884B2Silicon-containing resist underlayer film-forming composition having halogenated sulfonylalkyl groupNISSAN CHEMICAL IND LTD·Filed 2015·Granted Jun 1, 2021·2 cites·18 claims
- 2575US10139729B2Coating composition for pattern reversal on soc patternNISSAN CHEMICAL IND LTD·Filed 2015·Granted Nov 27, 2018·2 cites·6 claims
- 2675US9244353B2Resist underlayer film forming compositionNISSAN CHEMICAL IND LTD·Filed 2013·Granted Jan 26, 2016·3 cites·5 claims
- 2775US8445175B2Composition containing hydroxylated condensation resin for forming resist underlayer filmHIROI YOSHIOMI·Filed 2007·Granted May 21, 2013·4 cites·8 claims
- 2874US9384977B2Method of manufacturing semiconductor device using organic underlayer film forming composition for solvent development lithography processNISSAN CHEMICAL IND LTD·Filed 2013·Granted Jul 5, 2016·2 cites·12 claims
- 2973US8962234B2Resist underlayer film forming composition and method for forming resist pattern using the sameOHNISHI RYUJI·Filed 2012·Granted Feb 24, 2015·2 cites·9 claims
- 3073US7425399B2Composition for forming anti-reflective coating for use in lithographyNISSAN CHEMICAL IND LTD·Filed 2003·Granted Sep 16, 2008·13 cites·1 claims
- 3172US2024006183A1Resist underlayer film-forming composition containing amide solventNISSAN CHEMICAL CORP·Filed 2023·Application pending·0 cites
- 3271US12147158B2Photocurable composition and method for producing semiconductor deviceNISSAN CHEMICAL CORP·Filed 2023·Granted Nov 19, 2024·0 cites·12 claims
- 3371US9165782B2Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the sameNISSAN CHEMICAL IND LTD·Filed 2012·Granted Oct 20, 2015·2 cites·6 claims
- 3470US11300879B2Resist underlayer film forming composition containing triaryldiamine-containing novolac resinNISSAN CHEMICAL CORP·Filed 2017·Granted Apr 12, 2022·1 cites·12 claims
- 3570US10000664B2Underlayer film-forming composition for self-assembled filmsNISSAN CHEMICAL IND LTD·Filed 2013·Granted Jun 19, 2018·2 cites·7 claims
- 3670US9627217B2Silicon-containing EUV resist underlayer film-forming composition including additiveNISSAN CHEMICAL IND LTD·Filed 2013·Granted Apr 18, 2017·2 cites·14 claims
- 3768US10372040B2Resist underlayer film forming composition for lithography containing hydrolyzable silane having halogen-containing carboxylic acid amide groupNISSAN CHEMICAL IND LTD·Filed 2015·Granted Aug 6, 2019·1 cites·13 claims
- 3868US9337052B2Silicon-containing EUV resist underlayer film forming compositionNISSAN CHEMICAL IND LTD·Filed 2012·Granted May 10, 2016·2 cites·13 claims
- 3967US7501229B2Anti-reflective coating containing sulfur atomNISSAN CHEMICAL IND LTD·Filed 2005·Granted Mar 10, 2009·2 cites·4 claims
- 4066US10558119B2Composition for coating resist patternNISSAN CHEMICAL IND LTD·Filed 2016·Granted Feb 11, 2020·1 cites·15 claims
- 4166US10437150B2Composition for forming resist underlayer film with reduced outgassingSAKAMOTO RIKIMARU·Filed 2009·Granted Oct 8, 2019·2 cites·1 claims
- 4266US10191374B2Resist underlayer film-forming compositionNISSAN CHEMICAL IND LTD·Filed 2015·Granted Jan 29, 2019·1 cites·11 claims
- 4366US10042258B2Composition for forming a resist upper-layer film and method for producing a semiconductor device using the compositionNISSAN CHEMICAL IND LTD·Filed 2015·Granted Aug 7, 2018·1 cites·13 claims
- 4465US11199777B2Resist underlayer film-forming composition containing novolac polymer having secondary amino groupNISSAN CHEMICAL IND LTD·Filed 2014·Granted Dec 14, 2021·1 cites·10 claims
- 4565US10042247B2Mask blank, method for manufacturing mask blank and transfer maskHOYA CORP·Filed 2015·Granted Aug 7, 2018·1 cites·11 claims
- 4664US10242871B2Resist underlayer film-forming composition including a compound having an amino group protected with a tert-butoxycarbonyl groupNISSAN CHEMICAL IND LTD·Filed 2015·Granted Mar 26, 2019·1 cites·8 claims
- 4764US8603731B2Resist underlayer film forming composition for electron beam lithographyENOMOTO TOMOYUKI·Filed 2008·Granted Dec 10, 2013·2 cites·6 claims
- 4863US10613440B2Silicon-containing EUV resist underlayer film-forming composition containing onium sulfonateNISSAN CHEMICAL IND LTD·Filed 2013·Granted Apr 7, 2020·1 cites·7 claims
- 4963US9927705B2Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the sameNISSAN CHEMICAL IND LTD·Filed 2014·Granted Mar 27, 2018·1 cites·4 claims
- 5063US9494864B2Resist overlayer film forming composition for lithography and method for manufacturing semiconductor device using the sameNISSAN CHEMICAL IND LTD·Filed 2013·Granted Nov 15, 2016·1 cites·12 claims
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