Assignee
SAKAMOTO RIKIMARU
JP·6 granted patents·2 pending applications·9 citations·filing 2009–2012
Top patents by PatentIndex Score
8 records- 0187US8722840B2Resist underlayer film forming composition, and method for forming resist pattern using the sameSAKAMOTO RIKIMARU·Filed 2011·Granted May 13, 2014·6 cites·8 claims
- 0266US10437150B2Composition for forming resist underlayer film with reduced outgassingSAKAMOTO RIKIMARU·Filed 2009·Granted Oct 8, 2019·2 cites·1 claims
- 0360US9240327B2Resist underlayer film-forming composition for EUV lithography containing condensation polymerSAKAMOTO RIKIMARU·Filed 2012·Granted Jan 19, 2016·1 cites·8 claims
- 0458US8435721B2Resist underlayer film forming composition and forming method of resist pattern using the sameSAKAMOTO RIKIMARU·Filed 2009·Granted May 7, 2013·0 cites·19 claims
- 0544US2012040291A1Composition for forming resist underlayer film for euv lithographySAKAMOTO RIKIMARU·Filed 2010·Application pending·0 cites
- 0643US11675269B2Composition for forming resist overlayer film for EUV lithographySAKAMOTO RIKIMARU·Filed 2011·Granted Jun 13, 2023·0 cites·13 claims
- 0741US9753369B2Polymer-containing developerSAKAMOTO RIKIMARU·Filed 2012·Granted Sep 5, 2017·0 cites·14 claims
- 0841US2012251955A1Composition for formation of resist underlayer filmSAKAMOTO RIKIMARU·Filed 2010·Application pending·0 cites
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