Inventor · disambiguated record
Alexander W. Hains
Also filed as: HAINS ALEXANDER · HAINS ALEXANDER W
12 granted patents·8 pending applications·34 citations·filing 2008–2025
87Inventor score
Top patents by PatentIndex Score
20 records- 0192US9505952B2Polishing composition containing ceria abrasiveCABOT MICROELECTRONICS CORP·Filed 2015·Granted Nov 29, 2016·14 cites·15 claims
- 0287US10920107B2Self-stopping polishing composition and method for bulk oxide planarizationCABOT MICROELECTRONICS CORP·Filed 2020·Granted Feb 16, 2021·2 cites·14 claims
- 0387US10619076B2Self-stopping polishing composition and method for bulk oxide planarizationCABOT MICROELECTRONICS CORP·Filed 2019·Granted Apr 14, 2020·2 cites·8 claims
- 0486US7799990B2Electron-blocking layer / hole-transport layer for organic photovoltaics and applications of sameUNIV NORTHWESTERN·Filed 2008·Granted Sep 21, 2010·10 cites·24 claims
- 0581US10619075B2Self-stopping polishing composition and method for bulk oxide planarizationCABOT MICROELECTRONICS CORP·Filed 2018·Granted Apr 14, 2020·1 cites·10 claims
- 0677US2025346785A1Composition and method for polishing boron doped polysiliconENTEGRIS INC·Filed 2025·Application pending·0 cites
- 0776US10344186B2Polishing composition comprising an amine-containing surfactantCABOT MICROELECTRONICS CORP·Filed 2017·Granted Jul 9, 2019·1 cites·19 claims
- 0871US8399761B2Organic photovoltaic device with interfacial layer and method of fabricating sameMARKS TOBIN J·Filed 2010·Granted Mar 19, 2013·2 cites·37 claims
- 0967US12398293B2Composition and method for polishing boron doped polysiliconCMC MAT INC·Filed 2022·Granted Aug 26, 2025·0 cites·7 claims
- 1067US2025354033A1Highly modified colloidal silica tungsten cmp compositionENTEGRIS INC·Filed 2025·Application pending·0 cites
- 1166US7888593B2TFB:TPDSi2 interfacial layer usable in organic photovoltaic cellsUNIV NORTHWESTERN·Filed 2008·Granted Feb 15, 2011·2 cites·17 claims
- 1264US2025297134A1High rate bulk oxide cmp compositionENTEGRIS INC·Filed 2025·Application pending·0 cites
- 1363US2025376604A1Silica-based slurry for selective polishing of silicon nitride and silicon carbideENTEGRIS INC·Filed 2025·Application pending·0 cites
- 1458US2025297135A1Ceria and hydroxamic acid cmp compositionENTEGRIS INC·Filed 2025·Application pending·0 cites
- 1557US9796882B2CMP processing composition comprising alkylamine and cyclodextrinCABOT MICROELECTRONICS CORP·Filed 2016·Granted Oct 24, 2017·0 cites·17 claims
- 1654US11725116B2CMP composition including a novel abrasiveCMC MAT INC·Filed 2021·Granted Aug 15, 2023·0 cites·32 claims
- 1749US2024166915A1Amine-based compositions for use in cmp with high polysilicon rateENTEGRIS INC·Filed 2022·Application pending·0 cites
- 1847US9828528B2Polishing composition containing ceria abrasiveCABOT MICROELECTRONICS CORP·Filed 2016·Granted Nov 28, 2017·0 cites·14 claims
- 1944US2021115301A1Self-stopping polishing composition and methodCMC MAT INC·Filed 2020·Application pending·0 cites
- 2043US2021115302A1Composition and method for selective oxide cmpCMC MAT INC·Filed 2020·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →