Inventor · disambiguated record
Joseph Aubuchon
Also filed as: AUBUCHON JOSEPH · AUBUCHON JOSEPH F
41 granted patents·15 pending applications·1,009 citations·filing 2005–2025
97Inventor score
Top patents by PatentIndex Score
56 records- 0198US9252024B2Deposition chambers with UV treatment and methods of useAPPLIED MATERIALS INC·Filed 2013·Granted Feb 2, 2016·469 cites·16 claims
- 0298US7780789B2Vortex chamber lids for atomic layer depositionAPPLIED MATERIALS INC·Filed 2007·Granted Aug 24, 2010·458 cites·24 claims
- 0397US11670489B2Modular microwave source with embedded ground surfaceAPPLIED MATERIALS INC·Filed 2021·Granted Jun 6, 2023·4 cites·10 claims
- 0495US11584993B2Thermally uniform deposition stationAPPLIED MATERIALS INC·Filed 2020·Granted Feb 21, 2023·4 cites·18 claims
- 0595US11049694B2Modular microwave source with embedded ground surfaceAPPLIED MATERIALS INC·Filed 2019·Granted Jun 29, 2021·12 cites·20 claims
- 0694US11110425B2Gas distribution plate for thermal depositionAPPLIED MATERIALS INC·Filed 2019·Granted Sep 7, 2021·4 cites·20 claims
- 0791US11626281B2PEALD nitride filmsAPPLIED MATERIALS INC·Filed 2020·Granted Apr 11, 2023·2 cites·18 claims
- 0891US11583816B2Gas distribution plate for thermal depositionAPPLIED MATERIALS INC·Filed 2021·Granted Feb 21, 2023·1 cites·18 claims
- 0989US12305283B2Dithering or dynamic offsets for improved uniformityAPPLIED MATERIALS INC·Filed 2024·Granted May 20, 2025·0 cites·12 claims
- 1089US9613783B2Method and apparatus for controlling a magnetic field in a plasma chamberAPPLIED MATERIALS INC·Filed 2014·Granted Apr 4, 2017·7 cites·20 claims
- 1189US9209074B2Cobalt deposition on barrier surfacesAPPLIED MATERIALS INC·Filed 2015·Granted Dec 8, 2015·5 cites·20 claims
- 1288US10115566B2Method and apparatus for controlling a magnetic field in a plasma chamberAPPLIED MATERIALS INC·Filed 2017·Granted Oct 30, 2018·4 cites·12 claims
- 1386US9418890B2Method for tuning a deposition rate during an atomic layer deposition processMA PAUL·Filed 2014·Granted Aug 16, 2016·8 cites·25 claims
- 1484US9779953B2Electromagnetic dipole for plasma density tuning in a substrate processing chamberAPPLIED MATERIALS INC·Filed 2014·Granted Oct 3, 2017·6 cites·5 claims
- 1584US9051641B2Cobalt deposition on barrier surfacesLU JIANG·Filed 2008·Granted Jun 9, 2015·8 cites·25 claims
- 1683US11169547B2Gas-pulsing-based shared precursor distribution system and methods of useAPPLIED MATERIALS INC·Filed 2019·Granted Nov 9, 2021·2 cites·18 claims
- 1783US8491967B2In-situ chamber treatment and deposition processMA PAUL F·Filed 2008·Granted Jul 23, 2013·12 cites·2 claims
- 1880US11713508B2Apparatus and methods for improving chemical utilization rate in deposition processAPPLIED MATERIALS INC·Filed 2022·Granted Aug 1, 2023·0 cites·18 claims
- 1980US11586789B2Machine learning based smart process recipe builder to improve azimuthal flow and thickness uniformityAPPLIED MATERIALS INC·Filed 2021·Granted Feb 21, 2023·1 cites·13 claims
- 2079US11220747B2Complementary pattern station designsAPPLIED MATERIALS INC·Filed 2019·Granted Jan 11, 2022·2 cites·13 claims
- 2177US12442080B2Plasma showerhead assembly and method of reducing defectsAPPLIED MATERIALS INC·Filed 2024·Granted Oct 14, 2025·0 cites·19 claims
- 2276US12119221B2PEALD nitride filmsAPPLIED MATERIALS INC·Filed 2023·Granted Oct 15, 2024·0 cites·16 claims
- 2374US11761083B2Methods for controlling a flow pulse shapeAPPLIED MATERIALS INC·Filed 2020·Granted Sep 19, 2023·0 cites·13 claims
- 2474US11396703B2Apparatus and methods for improving chemical utilization rate in deposition processAPPLIED MATERIALS INC·Filed 2020·Granted Jul 26, 2022·0 cites·20 claims
- 2574US2024360553A1Deposition apparatus and methods using staggered pumping locationsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2673US12077861B2Dithering or dynamic offsets for improved uniformityAPPLIED MATERIALS INC·Filed 2020·Granted Sep 3, 2024·0 cites·10 claims
- 2773US11520358B2Gas-pulsing-based shared precursor distribution system and methods of useAPPLIED MATERIALS INC·Filed 2021·Granted Dec 6, 2022·0 cites·3 claims
- 2873US2024096688A1Single wafer processing environments with spatial separationAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2967US11017986B2Deposition radial and edge profile tunability through independent control of TEOS flowAPPLIED MATERIALS INC·Filed 2018·Granted May 25, 2021·0 cites·17 claims
- 3066US2023253186A1Peald titanium nitride with direct microwave plasmaAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3164US11823870B2PEALD titanium nitride with direct microwave plasmaAPPLIED MATERIALS INC·Filed 2020·Granted Nov 21, 2023·0 cites·17 claims
- 3263US11560624B2Precursor delivery systemAPPLIED MATERIALS INC·Filed 2019·Granted Jan 24, 2023·0 cites·13 claims
- 3362US12060638B2Deposition apparatus and methods using staggered pumping locationsAPPLIED MATERIALS INC·Filed 2020·Granted Aug 13, 2024·0 cites·14 claims
- 3462US11479855B2Spatial wafer processing with improved temperature uniformityAPPLIED MATERIALS INC·Filed 2020·Granted Oct 25, 2022·0 cites·10 claims
- 3561US11791136B2Deposition radial and edge profile tunability through independent control of TEOS flowAPPLIED MATERIALS INC·Filed 2021·Granted Oct 17, 2023·0 cites·17 claims
- 3661US10787739B2Spatial wafer processing with improved temperature uniformityAPPLIED MATERIALS INC·Filed 2019·Granted Sep 29, 2020·0 cites·16 claims
- 3759US2025087477A1Methods of forming silicon nitride filmsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3858US12469739B2Methods of operating a spatial deposition toolAPPLIED MATERIALS INC·Filed 2019·Granted Nov 11, 2025·0 cites·17 claims
- 3958US11978625B2Methods of forming metal nitride filmsAPPLIED MATERIALS INC·Filed 2021·Granted May 7, 2024·0 cites·20 claims
- 4058US11894257B2Single wafer processing environments with spatial separationAPPLIED MATERIALS INC·Filed 2018·Granted Feb 6, 2024·0 cites·17 claims
- 4157US2025239479A1Methods of operating a spatial deposition toolAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 4257US2025037978A1Gas distribution assemblies for semiconductor devicesAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4355US2021262092A1Sequential pulse and purge for ald processesAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 4452US2010062149A1Method for tuning a deposition rate during an atomic layer deposition processAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 4550US11923233B2Dual-function wafer backside pressure control and edge purgeAPPLIED MATERIALS INC·Filed 2020·Granted Mar 5, 2024·0 cites·16 claims
- 4650US9659751B2System and method for selective coil excitation in inductively coupled plasma processing reactorsAPPLIED MATERIALS INC·Filed 2014·Granted May 23, 2017·0 cites·19 claims
- 4750US2022389580A1Non-conformal plasma induced ald gapfillAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 4849US2008102208A1Vortex chamber lids for atomic layer depositionWU DIEN-YEH·Filed 2007·Application pending·0 cites
- 4946US10249479B2Magnet configurations for radial uniformity tuning of ICP plasmasAPPLIED MATERIALS INC·Filed 2015·Granted Apr 2, 2019·0 cites·17 claims
- 5045US2007207318A1Catalytically Grown Mano-Bent Nanostructure and Method for Making the SameJIN SUNGHO·Filed 2005·Application pending·0 cites
Showing the top 50 of 56 patent records by PatentIndex Score.
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