Inventor · disambiguated record
Gerd Strauch
Also filed as: STRAUCH GERD
7 granted patents·2 pending applications·531 citations·filing 1999–2004
88Inventor score
Files withAIXTRON AG7
Top patents by PatentIndex Score
9 records- 0195US6849241B2Device and method for depositing one or more layers on a substrateAIXTRON AG·Filed 2002·Granted Feb 1, 2005·401 cites·20 claims
- 0285US7294207B2Gas-admission element for CVD processes, and deviceAIXTRON AG·Filed 2003·Granted Nov 13, 2007·32 cites·9 claims
- 0383US6786973B2Method for depositing in particular crystalline layers, gas-admission element and device for carrying out the methodAIXTRON AG·Filed 2003·Granted Sep 7, 2004·25 cites·20 claims
- 0478US6309465B1CVD reactorAIXTRON AG·Filed 1999·Granted Oct 30, 2001·49 cites·32 claims
- 0576US7201942B2Coating methodAIXTRON AG·Filed 2002·Granted Apr 10, 2007·17 cites·27 claims
- 0658US7056388B2Reaction chamber with at least one HF feedthroughAIXTRON AG·Filed 2002·Granted Jun 6, 2006·4 cites·9 claims
- 0749US7473316B1Method of growing nitrogenous semiconductor crystal materialsAIXTRON AG·Filed 2000·Granted Jan 6, 2009·3 cites·8 claims
- 0841US2005092246A1Device for depositing thin layers with a wireless detection of process parametersFiled 2004·Application pending·0 cites
- 0937US2003056728A1Method and device for depositing at least one precursor, which is in liquid or dissolved form, on at least one substrateFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →