Inventor · disambiguated record
Chun-Chih Ho
Also filed as: HO CHUN-CHIH
10 granted patents·9 pending applications·4 citations·filing 2005–2025
79Inventor score
Top patents by PatentIndex Score
19 records- 0182US11886121B2Method for forming patterned photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jan 30, 2024·1 cites·20 claims
- 0281US11971659B2Photoresist composition and method of forming photoresist patternTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Apr 30, 2024·1 cites·20 claims
- 0379US12222647B2Photoresist composition and method of forming photoresist patternTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Feb 11, 2025·0 cites·20 claims
- 0478US12354874B2Method of manufacturing semiconductor devices and pattern formation methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jul 8, 2025·0 cites·20 claims
- 0576US2025164881A1Photoresist composition and method of forming photoresist patternTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 0676US2025299955A1Method of manufacturing semiconductor devices and pattern formation methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 0772US2024103375A1Method for forming patterned photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 0871US2023393478A1Underlayer composition and method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 0964US7704415B2Composite material with electron-donating and electron-accepting property, method for forming the same, and their applicationUNIV NAT TAIWAN·Filed 2005·Granted Apr 27, 2010·2 cites·48 claims
- 1064US2025155809A1Photoresist material and method for lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 1160US2021200091A1Underlayer composition and method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Application pending·0 cites
- 1258US11942322B2Method of manufacturing semiconductor devices and pattern formation methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Mar 26, 2024·0 cites·20 claims
- 1357US12087616B2Air gap formation methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Sep 10, 2024·0 cites·20 claims
- 1457US2024126170A1Method of manufacturing a semiconductor device and photoresist compositionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 1556US2024118618A1Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 1653US10838304B2Priming material for organometallic resistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Nov 17, 2020·0 cites·20 claims
- 1748US11022885B2Photosensitive middle layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jun 1, 2021·0 cites·20 claims
- 1847US9650495B2Manufacturing method for enhancing ordered structure of block copolymersUNIV NAT TAIWAN·Filed 2014·Granted May 16, 2017·0 cites·11 claims
- 1945US2015114467A1Donor-acceptor alternating conjugated polymer and solar cell device manufactured by using the sameUNIV NAT TAIWAN·Filed 2014·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →