Underlayer composition and method of manufacturing a semiconductor device

Abstract

A method of manufacturing a semiconductor device includes forming a photoresist underlayer over a semiconductor substrate. The underlayer includes a polymer having a photocleavable functional group. A photoresist layer is formed over the underlayer. The photoresist layer is selectively exposed to actinic radiation, and the selectively exposed photoresist layer is developed to form a photoresist pattern.

What is claimed is: 
     
         1 . A composition, comprising:
 a cross linker;   a first main polymer chain;   a second main polymer chain; and   a photocleavable functional group,   wherein the photocleavable functional group is a polycarbonate or a polysulfone, the photocleavable functional group is embedded in the first or second main polymer chains, embedded in a side chain of the first and second main polymer chains, or embedded in the cross linker.   
     
     
         2 . The composition of  claim 1 , wherein the photocleavable functional group is an oligomer or a polymer. 
     
     
         3 . The composition of  claim 1 , wherein a number of repeating units of the photocleavable functional group ranges from 2 to 500. 
     
     
         4 . The composition of  claim 1 , wherein the first and second main polymer chains are one or more of a polyhydroxystyrene, polyacrylate, polymethacrylate, polyvinylphenol, polystyrene, an inorganic polymer, and copolymers thereof. 
     
     
         5 . The composition of  claim 4 , wherein at least one of the first and second polymer main chains is the inorganic polymer and the inorganic polymer is a polysiloxane. 
     
     
         6 . The composition of  claim 5 , wherein the polysiloxane includes epoxy groups, amine groups, or thiol groups. 
     
     
         7 . The composition of  claim 4 , wherein at least one of the first and second main polymer chains is a polyhydroxystyrene selected from the group consisting of a poly(4-hydroxystyrene), a poly(4-vinylphenol-co-methyl methacrylate) copolymer, and a poly(styrene)-b-poly(4-hydroxystyrene) copolymer. 
     
     
         8 . The composition of  claim 1 , wherein the polymer includes a plurality of different photocleavable functional groups. 
     
     
         9 . The composition of  claim 1 , further comprising a solvent. 
     
     
         10 . A composition, comprising:
 a cross linker or a coupling agent;   a first polymer;   a second polymer;   polycarbonate or polysulfone photocleavable groups embedded in either the first polymer, the second polymer, or the cross linker,   wherein at least one of the first polymer or the second polymer is a polyhydroxystyrene, polyacrylate, polymethacrylate, polyvinylphenol, polystyrene, or a polysiloxane.   
     
     
         11 . The composition of  claim 10 , wherein both the first polymer and the second polymer are a polyhydroxystyrene, polyacrylate, polymethacrylate, polyvinylphenol, polystyrene, or a polysiloxane. 
     
     
         12 . The composition of  claim 10 , wherein the polycarbonate or polysulfone photocleavable groups are in main chains of both the first polymer and the second polymer. 
     
     
         13 . The composition of  claim 10 , wherein the polycarbonate or polysulfone photocleavable groups are in side chains of both the first polymer and the second polymer. 
     
     
         14 . The composition of  claim 10 , wherein at least one of the first polymer and the second polymer chains is a polyhydroxystyrene selected from the group consisting of a poly(4-hydroxystyrene), a poly(4-vinylphenol-co-methyl methacrylate) copolymer, and a poly(styrene)-b-poly(4-hydroxystyrene) copolymer. 
     
     
         15 . The composition of  claim 10 , comprising the coupling agent, wherein the coupling agent reagent has the following structure: 
       
         
           
           
               
               
           
         
         where R is a carbon atom, a nitrogen atom, a sulfur atom, or an oxygen atom; M includes a chlorine atom, a bromine atom, an iodine atom, —NO 2 ; —SO 3 —; —H—; —CN; —NCO, —OCN; —CO 2 —; —OH; —OR*, —OC(O)CR*; —SR*, —SO 2 N(R*) 2 ; —SO 2 R*; SOR*; —OC(O)R*; —C(O)OR*; —C(O)R*; —Si(OR*) 3 ; —Si(R*) 3 ; or epoxy groups, and R* is a substituted or unsubstituted C1-C12 alkyl, C1-C12 aryl, or C1-C12 aralkyl. 
       
     
     
         16 . A composition, comprising:
 a cross linker;   a first polymer;   a second polymer;   polycarbonate or polysulfone photocleavable groups embedded in either the first polymer, the second polymer, or the cross linker,   wherein at least one of the first polymer or the second polymer is a polyhydroxystyrene, polyacrylate, polymethacrylate, polyvinylphenol, polystyrene, or a polysiloxane, and wherein the cross linker includes   
       
         
           
           
               
               
           
         
       
       where C is carbon, n ranges from 1 to 15; A and B independently include a hydrogen atom, a hydroxyl group, a halide, an aromatic carbon ring, or a straight or cyclic alkyl, alkoxyl/fluoro, alkyl/fluoroalkoxyl chain having a carbon number of between 1 and 12, and each carbon C contains A and B; a first terminal carbon C at a first end of a carbon C chain includes X and a second terminal carbon C at a second end of the carbon chain includes Y, wherein X and Y independently include an amine group, a thiol group, a hydroxyl group, an isopropyl alcohol group, or an isopropyl amine group, except when n=1 then X and Y are bonded to a same carbon C. 
     
     
         17 . The composition of  claim 16 , wherein both the first polymer and the second polymer are a polyhydroxystyrene, polyacrylate, polymethacrylate, polyvinylphenol, polystyrene, or a polysiloxane. 
     
     
         18 . The composition of  claim 16 , wherein the polycarbonate or polysulfone photocleavable groups are in a main chain of at least one of the first polymer and the second polymer. 
     
     
         19 . The composition of  claim 16 , wherein the polycarbonate or polysulfone photocleavable groups are in side chains of at least one of the first polymer and the second polymer. 
     
     
         20 . The composition of  claim 16 , wherein the polycarbonate or polysulfone photocleavable groups are embedded in the cross linker.