Inventor · disambiguated record
Martin Jay Seamons
Also filed as: SEAMONS MARTIN · SEAMONS MARTIN J · SEAMONS MARTIN JAY
37 granted patents·33 pending applications·1,205 citations·filing 1995–2023
97Inventor score
Files withAPPLIED MATERIALS INC47LEE KWANGDUK DOUGLAS5PADHI DEENESH5SEAMONS MARTIN JAY4BALASUBRAMANIAN GANESH2
Top patents by PatentIndex Score
70 records- 0196US8361906B2Ultra high selectivity ashable hard mask filmAPPLIED MATERIALS INC·Filed 2010·Granted Jan 29, 2013·63 cites·13 claims
- 0295US8536065B2Ultra high selectivity doped amorphous carbon strippable hardmask development and integrationSEAMONS MARTIN JAY·Filed 2011·Granted Sep 17, 2013·51 cites·17 claims
- 0395US6913938B2Feedback control of plasma-enhanced chemical vapor deposition processesAPPLIED MATERIALS INC·Filed 2002·Granted Jul 5, 2005·115 cites·81 claims
- 0495US6413321B1Method and apparatus for reducing particle contamination on wafer backside during CVD processAPPLIED MATERIALS INC·Filed 2000·Granted Jul 2, 2002·679 cites·6 claims
- 0594US8993454B2Ultra high selectivity doped amorphous carbon strippable hardmask development and integrationAPPLIED MATERIALS INC·Filed 2013·Granted Mar 31, 2015·16 cites·5 claims
- 0693US7407893B2Liquid precursors for the CVD deposition of amorphous carbon filmsAPPLIED MATERIALS INC·Filed 2005·Granted Aug 5, 2008·33 cites·20 claims
- 0789US10100408B2Edge hump reduction faceplate by plasma modulationAPPLIED MATERIALS INC·Filed 2015·Granted Oct 16, 2018·6 cites·18 claims
- 0889US7867578B2Method for depositing an amorphous carbon film with improved density and step coverageAPPLIED MATERIALS INC·Filed 2006·Granted Jan 11, 2011·12 cites·14 claims
- 0986US9390910B2Gas flow profile modulated control of overlay in plasma CVD filmsAPPLIED MATERIALS INC·Filed 2014·Granted Jul 12, 2016·5 cites·20 claims
- 1086US9299581B2Methods of dry stripping boron-carbon filmsLEE KWANGDUK DOUGLAS·Filed 2012·Granted Mar 29, 2016·8 cites·8 claims
- 1186US6051284AChamber monitoring and adjustment by plasma RF metrologyAPPLIED MATERIALS INC·Filed 1996·Granted Apr 18, 2000·53 cites·49 claims
- 1285US6060397AGas chemistry for improved in-situ cleaning of residue for a CVD apparatusAPPLIED MATERIALS INC·Filed 1995·Granted May 9, 2000·107 cites·32 claims
- 1384US8282734B2Methods to improve the in-film defectivity of PECVD amorphous carbon filmsPADHI DEENESH·Filed 2008·Granted Oct 9, 2012·6 cites·8 claims
- 1482US10373822B2Gas flow profile modulated control of overlay in plasma CVD filmsAPPLIED MATERIALS INC·Filed 2017·Granted Aug 6, 2019·2 cites·18 claims
- 1579US10580623B2Plasma processing using multiple radio frequency power feeds for improved uniformityAPPLIED MATERIALS INC·Filed 2014·Granted Mar 3, 2020·3 cites·11 claims
- 1679US7514125B2Methods to improve the in-film defectivity of PECVD amorphous carbon filmsAPPLIED MATERIALS INC·Filed 2007·Granted Apr 7, 2009·2 cites·7 claims
- 1778US6843881B2Detecting chemiluminescent radiation in the cleaning of a substrate processing chamberAPPLIED MATERIALS INC·Filed 2002·Granted Jan 18, 2005·17 cites·15 claims
- 1877US12046508B2Method of dielectric material fill and treatmentAPPLIED MATERIALS INC·Filed 2023·Granted Jul 23, 2024·0 cites·20 claims
- 1977US7776516B2Graded ARC for high NA and immersion lithographyAPPLIED MATERIALS INC·Filed 2006·Granted Aug 17, 2010·4 cites·14 claims
- 2071US11133177B2Oxidation reduction for SiOC filmAPPLIED MATERIALS INC·Filed 2019·Granted Sep 28, 2021·1 cites·17 claims
- 2171US9837265B2Gas flow profile modulated control of overlay in plasma CVD filmsAPPLIED MATERIALS INC·Filed 2016·Granted Dec 5, 2017·1 cites·7 claims
- 2268US8105465B2Method for depositing conformal amorphous carbon film by plasma-enhanced chemical vapor deposition (PECVD)LEE KWANGDUK DOUGLAS·Filed 2009·Granted Jan 31, 2012·3 cites·17 claims
- 2368US6868856B2Enhanced remote plasma cleaningAPPLIED MATERIALS INC·Filed 2001·Granted Mar 22, 2005·9 cites·18 claims
- 2467US11615984B2Method of dielectric material fill and treatmentAPPLIED MATERIALS INC·Filed 2020·Granted Mar 28, 2023·0 cites·20 claims
- 2567US8513129B2Planarizing etch hardmask to increase pattern density and aspect ratioSEAMONS MARTIN JAY·Filed 2010·Granted Aug 20, 2013·2 cites·13 claims
- 2666US9337072B2Apparatus and method for substrate clamping in a plasma chamberBALASUBRAMANIAN GANESH·Filed 2010·Granted May 10, 2016·2 cites·12 claims
- 2765US11276562B2Plasma processing using multiple radio frequency power feeds for improved uniformityAPPLIED MATERIALS INC·Filed 2020·Granted Mar 15, 2022·0 cites·17 claims
- 2861US9653327B2Methods of removing a material layer from a substrate using water vapor treatmentLEE KWANGDUK DOUGLAS·Filed 2011·Granted May 16, 2017·1 cites·11 claims
- 2961US2012204795A1Methods to improve the in-film defectivity of pecvd amorphous carbon filmsPADHI DEENESH·Filed 2012·Application pending·0 cites
- 3059US2025060321A1Optical inspection of wafers in manufacturing systemsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3159US2014091379A1Fluorocarbon coating having low refractive indexAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 3259US2014091417A1Low refractive index coating deposited by remote plasma cvdAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 3358US11469100B2Methods of post treating dielectric films with microwave radiationAPPLIED MATERIALS INC·Filed 2020·Granted Oct 11, 2022·0 cites·8 claims
- 3458US2016017487A1Integrated pre-clean and deposition of low-damage layersAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 3555US10510518B2Methods of dry stripping boron-carbon filmsAPPLIED MATERIALS INC·Filed 2015·Granted Dec 17, 2019·0 cites·19 claims
- 3654US11756796B2Techniques for improved low dielectric constant film processingAPPLIED MATERIALS INC·Filed 2021·Granted Sep 12, 2023·0 cites·19 claims
- 3754US11090683B2Cure method for cross-linking Si-hydroxyl bondsAPPLIED MATERIALS INC·Filed 2019·Granted Aug 17, 2021·0 cites·21 claims
- 3853US12334337B2Integrated flowable low-k gap-fill and plasma treatmentAPPLIED MATERIALS INC·Filed 2021·Granted Jun 17, 2025·0 cites·16 claims
- 3953US2008254233A1Plasma-induced charge damage control for plasma enhanced chemical vapor deposition processesLEE KWANGDUK DOUGLAS·Filed 2007·Application pending·0 cites
- 4052US12374584B2Multi color stack for self aligned dual pattern formation for multi purpose device structuresAPPLIED MATERIALS INC·Filed 2021·Granted Jul 29, 2025·0 cites·19 claims
- 4152US2008084650A1Apparatus and method for substrate clamping in a plasma chamberAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 4251US2007207275A1Enhancement of remote plasma source clean for dielectric filmsAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 4351US2014216498A1Methods of dry stripping boron-carbon filmsLEE KWANGDUK DOUGLAS·Filed 2013·Application pending·0 cites
- 4450US7094442B2Methods for the reduction and elimination of particulate contamination with CVD of amorphous carbonAPPLIED MATERIALS INC·Filed 2004·Granted Aug 22, 2006·4 cites·18 claims
- 4550US2016133443A1Methods of dry stripping boron-carbon filmsAPPLIED MATERIALS INC·Filed 2016·Application pending·0 cites
- 4648US2013284090A1Compensating concentration uncertainityBALASUBRAMANIAN GANESH·Filed 2013·Application pending·0 cites
- 4748US2022333245A1Systems, methods, and apparatus for applying a bias voltage to an ion blocker plate during substrate processing operationsAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 4847US11798820B2Gas delivery systems and methodsAPPLIED MATERIALS INC·Filed 2020·Granted Oct 24, 2023·0 cites·20 claims
- 4947US2009104541A1Plasma surface treatment to prevent pattern collapse in immersion lithographyKIM EUI KYOON·Filed 2007·Application pending·0 cites
- 5047US2006162661A1Mixing energized and non-energized gases for silicon nitride depositionAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
Showing the top 50 of 70 patent records by PatentIndex Score.
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