Inventor · disambiguated record
Mohamad A. Ayoub
Also filed as: AYOUB MOHAMAD · AYOUB MOHAMAD A
32 granted patents·8 pending applications·670 citations·filing 1998–2023
97Inventor score
Files withAPPLIED MATERIALS INC26CHEN JIAN J2JANAKIRAMAN KARTHIK2SHAH ASHISH2BALASUBRAMANIAN GANESH1
Top patents by PatentIndex Score
40 records- 0198US10774423B2Tunable ground planes in plasma chambersAPPLIED MATERIALS INC·Filed 2014·Granted Sep 15, 2020·41 cites·20 claims
- 0297US9466469B2Remote plasma source for controlling plasma skewAPPLIED MATERIALS INC·Filed 2016·Granted Oct 11, 2016·121 cites·20 claims
- 0397US9157730B2PECVD processAPPLIED MATERIALS INC·Filed 2013·Granted Oct 13, 2015·49 cites·18 claims
- 0496US9458537B2PECVD processAPPLIED MATERIALS INC·Filed 2015·Granted Oct 4, 2016·12 cites·20 claims
- 0596US8587321B2System and method for current-based plasma excursion detectionCHEN JIAN J·Filed 2010·Granted Nov 19, 2013·53 cites·21 claims
- 0696US8502689B2System and method for voltage-based plasma excursion detectionCHEN JIAN J·Filed 2010·Granted Aug 6, 2013·50 cites·18 claims
- 0795US9816187B2PECVD processAPPLIED MATERIALS INC·Filed 2016·Granted Nov 14, 2017·8 cites·20 claims
- 0894US8197636B2Systems for plasma enhanced chemical vapor deposition and bevel edge etchingSHAH ASHISH·Filed 2008·Granted Jun 12, 2012·30 cites·11 claims
- 0993US11613812B2PECVD processAPPLIED MATERIALS INC·Filed 2020·Granted Mar 28, 2023·2 cites·20 claims
- 1091US10192717B2Conditioning remote plasma source for enhanced performance having repeatable etch and deposition ratesAPPLIED MATERIALS INC·Filed 2015·Granted Jan 29, 2019·3 cites·10 claims
- 1191US10083818B2Auto frequency tuned remote plasma sourceAPPLIED MATERIALS INC·Filed 2015·Granted Sep 25, 2018·8 cites·19 claims
- 1290US10793954B2PECVD processAPPLIED MATERIALS INC·Filed 2018·Granted Oct 6, 2020·3 cites·13 claims
- 1390US10060032B2PECVD processAPPLIED MATERIALS INC·Filed 2017·Granted Aug 28, 2018·3 cites·20 claims
- 1487US10450653B2High impedance RF filter for heater with impedance tuning deviceAPPLIED MATERIALS INC·Filed 2018·Granted Oct 22, 2019·1 cites·17 claims
- 1586US10347465B2Apparatus and method for tuning a plasma profile using a tuning electrode in a processing chamberAPPLIED MATERIALS INC·Filed 2018·Granted Jul 9, 2019·3 cites·14 claims
- 1685US11898249B2PECVD processAPPLIED MATERIALS INC·Filed 2023·Granted Feb 13, 2024·0 cites·17 claims
- 1785US9865431B2Apparatus and method for tuning a plasma profile using a tuning electrode in a processing chamberAPPLIED MATERIALS INC·Filed 2014·Granted Jan 9, 2018·5 cites·10 claims
- 1885US6477363B1System and method for communicating the location of an emergency caller through a telephone network to a control stationFiled 1999·Granted Nov 5, 2002·182 cites·41 claims
- 1984US10125422B2High impedance RF filter for heater with impedance tuning deviceAPPLIED MATERIALS INC·Filed 2014·Granted Nov 13, 2018·4 cites·15 claims
- 2081US10032608B2Apparatus and method for tuning electrode impedance for high frequency radio frequency and terminating low frequency radio frequency to groundAPPLIED MATERIALS INC·Filed 2014·Granted Jul 24, 2018·4 cites·15 claims
- 2179US8884524B2Apparatus and methods for improving reliability of RF groundingZHOU JIANHUA·Filed 2011·Granted Nov 11, 2014·4 cites·19 claims
- 2276US8778813B2Confined process volume PECVD chamberSANKARAKRISHNAN RAMPRAKASH·Filed 2011·Granted Jul 15, 2014·4 cites·17 claims
- 2374US10227695B2Shadow ring for modifying wafer edge and bevel depositionDU BOIS DALE R·Filed 2010·Granted Mar 12, 2019·4 cites·13 claims
- 2473US10128118B2Bottom and side plasma tuning having closed loop controlAPPLIED MATERIALS INC·Filed 2013·Granted Nov 13, 2018·2 cites·18 claims
- 2573US10030306B2PECVD apparatus and processAPPLIED MATERIALS INC·Filed 2013·Granted Jul 24, 2018·1 cites·16 claims
- 2672US11136665B2Shadow ring for modifying wafer edge and bevel depositionAPPLIED MATERIALS INC·Filed 2019·Granted Oct 5, 2021·1 cites·13 claims
- 2772US6085097ACellular communications tracking system using a multitude of assigned call-numbersFiled 1998·Granted Jul 4, 2000·66 cites·28 claims
- 2871US9386680B2Detecting plasma arcs by monitoring RF reflected power in a plasma processing chamberAPPLIED MATERIALS INC·Filed 2014·Granted Jul 5, 2016·4 cites·18 claims
- 2966US9337072B2Apparatus and method for substrate clamping in a plasma chamberBALASUBRAMANIAN GANESH·Filed 2010·Granted May 10, 2016·2 cites·12 claims
- 3065US2009236214A1Tunable ground planes in plasma chambersJANAKIRAMAN KARTHIK·Filed 2008·Application pending·0 cites
- 3165US2020010957A1High impedance rf filter for heater with impedance tuning deviceAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 3260US10916407B2Conditioning remote plasma source for enhanced performance having repeatable etch and deposition ratesAPPLIED MATERIALS INC·Filed 2018·Granted Feb 9, 2021·0 cites·19 claims
- 3357US10910227B2Bottom and side plasma tuning having closed loop controlAPPLIED MATERIALS INC·Filed 2018·Granted Feb 2, 2021·0 cites·16 claims
- 3455US2012205046A1Tunable ground planes in plasma chambersJANAKIRAMAN KARTHIK·Filed 2012·Application pending·0 cites
- 3553US2008254233A1Plasma-induced charge damage control for plasma enhanced chemical vapor deposition processesLEE KWANGDUK DOUGLAS·Filed 2007·Application pending·0 cites
- 3652US2008084650A1Apparatus and method for substrate clamping in a plasma chamberAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 3748US2012211164A1Systems for plasma enhanced chemical vapor deposition and bevel edge etchingSHAH ASHISH·Filed 2012·Application pending·0 cites
- 3847US2009314208A1Pedestal heater for low temperature pecvd applicationAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 3945US2016017494A1Apparatus and method for tuning a plasma profile using a tuning ring in a processing chamberAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 4019US5999680ATelecommunications method for using incomplete call timeFiled 1998·Granted Dec 7, 1999·0 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →