Inventor · disambiguated record
Tetsuo Okayasu
Also filed as: OKAYASU TETSUO
9 granted patents·3 pending applications·20 citations·filing 2003–2021
81Inventor score
Files withMERCK PATENT GMBH4AZ ELECTRONIC MAT (LUXEMBOURG) S A R L2AZ ELECTRONIC MATERIALS USA2AKIYAMA YASUSHI1AZ ELECTRONIC MAT LUXEMBOURG SARL1
Top patents by PatentIndex Score
12 records- 0185US7745093B2Water soluble resin composition and method for pattern formation using the sameAZ ELECTRONIC MATERIALS USA·Filed 2005·Granted Jun 29, 2010·14 cites·11 claims
- 0275US9810988B2Composition for forming overlay film, and resist pattern formation method employing the sameAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2013·Granted Nov 7, 2017·1 cites·15 claims
- 0366US9482952B2Composition for forming topcoat layer and resist pattern formation method employing the sameAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2014·Granted Nov 1, 2016·1 cites·10 claims
- 0465US11866554B2Polycarbosilazane, and composition comprising the same, and method for producing silicon-containing film using the sameMERCK PATENT GMBH·Filed 2021·Granted Jan 9, 2024·0 cites·15 claims
- 0564US9448485B2Composition for forming fine resist pattern and pattern forming method using sameOKAYASU TETSUO·Filed 2012·Granted Sep 20, 2016·2 cites·7 claims
- 0663US11999827B2Polycarbosilazane, and composition comprising the same, and method for producing silicon-containing film using the sameMERCK PATENT GMBH·Filed 2021·Granted Jun 4, 2024·0 cites·14 claims
- 0752US9804493B2Composition for forming topcoat layer and resist pattern formation method employing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Oct 31, 2017·0 cites·10 claims
- 0848US7799513B2Process for preventing development defect and composition for use in the sameAZ ELECTRONIC MATERIALS USA·Filed 2003·Granted Sep 21, 2010·2 cites·1 claims
- 0947US2016327867A1Composition for forming fine resist pattern and pattern forming method using sameMERCK PATENT GMBH·Filed 2016·Application pending·0 cites
- 1044US2023374226A1Polysilazane, siliceous film-forming composition comprising the same, and method for producing siliceous film using the sameMERCK PATENT GMBH·Filed 2021·Application pending·0 cites
- 1142US10268117B2Top-layer membrane formation composition and method for forming resist pattern using sameAZ ELECTRONIC MAT LUXEMBOURG SARL·Filed 2015·Granted Apr 23, 2019·0 cites·19 claims
- 1239US2010324330A1Process for Preventing Development Defect and Composition for Use in the SameAKIYAMA YASUSHI·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →