Inventor · disambiguated record
Subhash M. Joshi
Also filed as: JOSHI SUBHASH · JOSHI SUBHASH M
43 granted patents·14 pending applications·638 citations·filing 2001–2025
98Inventor score
Top patents by PatentIndex Score
57 records- 0198US11887891B2Self-aligned contactsINTEL CORP·Filed 2023·Granted Jan 30, 2024·2 cites·20 claims
- 0298US8436404B2Self-aligned contactsBOHR MARK T·Filed 2009·Granted May 7, 2013·148 cites·30 claims
- 0397US9508821B2Self-aligned contactsINTEL CORP·Filed 2015·Granted Nov 29, 2016·13 cites·3 claims
- 0497US9466565B2Self-aligned contactsINTEL CORP·Filed 2015·Granted Oct 11, 2016·24 cites·18 claims
- 0597US9054178B2Self-aligned contactsBOHR MARK T·Filed 2014·Granted Jun 9, 2015·30 cites·12 claims
- 0697US6853076B2Copper-containing C4 ball-limiting metallurgy stack for enhanced reliability of packaged structures and method of making sameINTEL CORP·Filed 2001·Granted Feb 8, 2005·203 cites·7 claims
- 0796US11664439B2Trench contact structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2021·Granted May 30, 2023·2 cites·22 claims
- 0895US9093513B2Self-aligned contactsBOHR MARK T·Filed 2013·Granted Jul 28, 2015·12 cites·14 claims
- 0994US11088261B2Trench contact structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2019·Granted Aug 10, 2021·3 cites·25 claims
- 1092US12255247B2Trench contact structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2024·Granted Mar 18, 2025·0 cites·20 claims
- 1191US10930557B2Self-aligned contactsINTEL CORP·Filed 2020·Granted Feb 23, 2021·2 cites·12 claims
- 1290US8981435B2Source/drain contacts for non-planar transistorsPRADHAN SAMEER S·Filed 2011·Granted Mar 17, 2015·9 cites·15 claims
- 1390US8193641B2Recessed workfunction metal in CMOS transistor gatesRACHMADY WILLY·Filed 2006·Granted Jun 5, 2012·21 cites·9 claims
- 1489US10957782B2Trench contact structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2017·Granted Mar 23, 2021·2 cites·18 claims
- 1589US9653584B2Pre-sculpting of Si fin elements prior to cladding for transistor channel applicationsINTEL CORP·Filed 2013·Granted May 16, 2017·7 cites·14 claims
- 1689US9425316B2Source/drain contacts for non-planar transistorsINTEL CORP·Filed 2015·Granted Aug 23, 2016·4 cites·19 claims
- 1788US11948997B2Trench contact structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2023·Granted Apr 2, 2024·0 cites·20 claims
- 1888US9633835B2Transistor fabrication technique including sacrificial protective layer for source/drain at contact locationINTEL CORP·Filed 2013·Granted Apr 25, 2017·7 cites·19 claims
- 1988US7196001B2Copper-containing C4 ball-limiting metallurgy stack for enhanced reliability of packaged structures and method of making sameINTEL CORP·Filed 2004·Granted Mar 27, 2007·34 cites·7 claims
- 2087US12266571B2Self-aligned contactsINTEL CORP·Filed 2023·Granted Apr 1, 2025·0 cites·16 claims
- 2186US10141226B2Self-aligned contactsINTEL CORP·Filed 2017·Granted Nov 27, 2018·2 cites·27 claims
- 2286US9853156B2Source/drain contacts for non-planar transistorsINTEL CORP·Filed 2015·Granted Dec 26, 2017·3 cites·16 claims
- 2386US7087452B2Edge arrangements for integrated circuit chipsINTEL CORP·Filed 2003·Granted Aug 8, 2006·59 cites·17 claims
- 2485US9419106B2Non-planar transistors and methods of fabrication thereofJOSHI SUBHASH M·Filed 2011·Granted Aug 16, 2016·9 cites·9 claims
- 2582US2025194201A1Trench contact structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2025·Application pending·0 cites
- 2682US2023028568A1Source/drain contacts for non-planar transistorsINTEL CORP·Filed 2022·Application pending·0 cites
- 2782US2025239486A1Self-aligned contactsINTEL CORP·Filed 2025·Application pending·0 cites
- 2878US7498252B2Dual layer dielectric stack for microelectronics having thick metal linesINTEL CORP·Filed 2006·Granted Mar 3, 2009·8 cites·13 claims
- 2977US8704336B2Selective removal of on-die redistribution interconnects from scribe-linesHE JUN·Filed 2007·Granted Apr 22, 2014·6 cites·7 claims
- 3077US2025126869A1Epitaxial source or drain structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2024·Application pending·0 cites
- 3176US11600524B2Self-aligned contactsINTEL CORP·Filed 2021·Granted Mar 7, 2023·0 cites·12 claims
- 3273US11837456B2Continuous gate and fin spacer for advanced integrated circuit structure fabricationINTEL CORP·Filed 2022·Granted Dec 5, 2023·0 cites·20 claims
- 3372US8952550B2Copper-containing C4 ball-limiting metallurgy stack for enhanced reliability of packaged structures and method of making sameDATTA MADHAV·Filed 2010·Granted Feb 10, 2015·2 cites·3 claims
- 3472US2020357916A1Source/drain contacts for non-planar transistorsINTEL CORP·Filed 2020·Application pending·0 cites
- 3571US11411095B2Epitaxial source or drain structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2017·Granted Aug 9, 2022·0 cites·6 claims
- 3670US10037956B2Copper-containing C4 ball-limiting metallurgy stack for enhanced reliability of packaged structures and method of making sameINTEL CORP·Filed 2015·Granted Jul 31, 2018·1 cites·7 claims
- 3769US7250678B2Copper-containing C4 ball-limiting metallurgy stack for enhanced reliability of packaged structures and method of making sameINTEL CORP·Filed 2004·Granted Jul 31, 2007·10 cites·1 claims
- 3867US10629483B2Self-aligned contactsINTEL CORP·Filed 2018·Granted Apr 21, 2020·0 cites·20 claims
- 3967US2022344494A1Epitaxial source or drain structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2022·Application pending·0 cites
- 4066US10770591B2Source/drain contacts for non-planar transistorsINTEL CORP·Filed 2019·Granted Sep 8, 2020·0 cites·20 claims
- 4164US8377771B2Recessed workfunction metal in CMOS transistor gatesINTEL CORP·Filed 2012·Granted Feb 19, 2013·2 cites·24 claims
- 4263US6740427B2Thermo-mechanically robust C4 ball-limiting metallurgy to prevent failure due to die-package interaction and method of making sameINTEL CORP·Filed 2001·Granted May 25, 2004·13 cites·25 claims
- 4362US10283640B2Source/drain contacts for non-planar transistorsINTEL CORP·Filed 2017·Granted May 7, 2019·0 cites·16 claims
- 4462US9892967B2Self-aligned contactsINTEL CORP·Filed 2016·Granted Feb 13, 2018·0 cites·8 claims
- 4561US10396203B2Pre-sculpting of Si fin elements prior to cladding for transistor channel applicationsINTEL CORP·Filed 2018·Granted Aug 27, 2019·0 cites·17 claims
- 4658US10014412B2Pre-sculpting of Si fin elements prior to cladding for transistor channel applicationsINTEL CORP·Filed 2017·Granted Jul 3, 2018·0 cites·20 claims
- 4757US2017141062A1Copper-containing c4 ball-limiting metallurgy stack for enhanced reliability of packaged structures and method of making sameINTEL CORP·Filed 2017·Application pending·0 cites
- 4855US11462436B2Continuous gate and fin spacer for advanced integrated circuit structure fabricationINTEL CORP·Filed 2017·Granted Oct 4, 2022·0 cites·14 claims
- 4953US10032915B2Non-planar transistors and methods of fabrication thereofINTEL CORP·Filed 2016·Granted Jul 24, 2018·0 cites·8 claims
- 5050US2017229342A1Transistor fabrication technique including sacrificial protective layer for source/drain at contact locationINTEL CORP·Filed 2017·Application pending·0 cites
Showing the top 50 of 57 patent records by PatentIndex Score.
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