Inventor · disambiguated record
Asao Yamashita
Also filed as: YAMASHITA ASAO
22 granted patents·5 pending applications·315 citations·filing 2002–2012
96Inventor score
Top patents by PatentIndex Score
27 records- 0194US7328418B2Iso/nested control for soft mask processingTOKYO ELECTRON LTD·Filed 2005·Granted Feb 5, 2008·29 cites·19 claims
- 0293US7967995B2Multi-layer/multi-input/multi-output (MLMIMO) models and method for usingTOKYO ELECTRON LTD·Filed 2008·Granted Jun 28, 2011·25 cites·19 claims
- 0393US7894927B2Using Multi-Layer/Multi-Input/Multi-Output (MLMIMO) models for metal-gate structuresTOKYO ELECTRON LTD·Filed 2008·Granted Feb 22, 2011·23 cites·32 claims
- 0490US7906032B2Method for conditioning a process chamberTOKYO ELECTRON LTD·Filed 2006·Granted Mar 15, 2011·18 cites·10 claims
- 0589US8251011B2Plasma processing apparatusYAMAZAWA YOHEI·Filed 2007·Granted Aug 28, 2012·13 cites·19 claims
- 0689US7713758B2Method and apparatus for optimizing a gate channelTOKYO ELECTON LTD·Filed 2007·Granted May 11, 2010·22 cites·20 claims
- 0788US7939450B2Method and apparatus for spacer-optimization (S-O)TOKYO ELECTRON LTD·Filed 2007·Granted May 10, 2011·13 cites·20 claims
- 0885US7899637B2Method and apparatus for creating a gate optimization evaluation libraryTOKYO ELECTRON LTD·Filed 2007·Granted Mar 1, 2011·11 cites·15 claims
- 0985US7765077B2Method and apparatus for creating a Spacer-Optimization (S-O) libraryTOKYO ELECTRON LTD·Filed 2007·Granted Jul 27, 2010·13 cites·16 claims
- 1083US7292906B2Formula-based run-to-run controlTOKYO ELECTRON LTD·Filed 2004·Granted Nov 6, 2007·33 cites·27 claims
- 1181US7763404B2Methods and apparatus for changing the optical properties of resistsTOKYO ELECTRON LTD·Filed 2006·Granted Jul 27, 2010·7 cites·42 claims
- 1280US7527016B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2003·Granted May 5, 2009·16 cites·11 claims
- 1380US7209798B2Iso/nested cascading trim control with model feedback updatesTOKYO ELECTRON LTD·Filed 2004·Granted Apr 24, 2007·24 cites·36 claims
- 1478US6893975B1System and method for etching a maskTOKYO ELECTRON LTD·Filed 2004·Granted May 17, 2005·17 cites·17 claims
- 1575US8019458B2Creating multi-layer/multi-input/multi-output (MLMIMO) models for metal-gate structuresTOKYO ELECTRON LTD·Filed 2008·Granted Sep 13, 2011·14 cites·26 claims
- 1675US7097779B2Processing system and method for chemically treating a TERA layerTOKYO ELECTRON LTD·Filed 2004·Granted Aug 29, 2006·14 cites·21 claims
- 1773US9022225B2Filtration filter and production method thereforMORIYA TSUYOSHI·Filed 2012·Granted May 5, 2015·2 cites·21 claims
- 1870US7877161B2Method and system for performing a chemical oxide removal processTOKYO ELECTRON LTD·Filed 2003·Granted Jan 25, 2011·13 cites·49 claims
- 1968US8183062B2Creating metal gate structures using Lithography-Etch-Lithography-Etch (LELE) processing sequencesFUNK MERRITT·Filed 2009·Granted May 22, 2012·3 cites·19 claims
- 2068US8175736B2Method and system for performing a chemical oxide removal processTOMOYASU MASAYUKI·Filed 2010·Granted May 8, 2012·3 cites·52 claims
- 2166US8501628B2Differential metal gate etching processLUONG VINH HOANG·Filed 2010·Granted Aug 6, 2013·2 cites·20 claims
- 2249US2006254716A1Processing system and method for chemically treating a tera layerTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 2348US2005221619A1System and method for etching a maskTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 2444US2008217294A1Method and system for etching a hafnium containing materialTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 2538US2005227494A1Processing system and method for treating a substrateTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 2634US2005106868A1Etching methodFiled 2003·Application pending·0 cites
- 2733US7192532B2Dry etching methodTOKYO ELECTRON LTD·Filed 2002·Granted Mar 20, 2007·0 cites·11 claims
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