Inventor · disambiguated record
Hung-Eil Kim
Also filed as: KIM HUNG E · KIM HUNG-EIL
26 granted patents·495 citations·filing 1994–2008
96Inventor score
Top patents by PatentIndex Score
26 records- 0194US7065738B1Method of verifying an optical proximity correction (OPC) modelADVANCED MICRO DEVICES INC·Filed 2004·Granted Jun 20, 2006·63 cites·7 claims
- 0294US6581023B1Accurate contact critical dimension measurement using variable threshold methodADVANCED MICRO DEVICES INC·Filed 2001·Granted Jun 17, 2003·58 cites·20 claims
- 0393US7207017B1Method and system for metrology recipe generation and review and analysis of design, simulation and metrology resultsADVANCED MICRO DEVICES INC·Filed 2004·Granted Apr 17, 2007·85 cites·25 claims
- 0489US7194725B1System and method for design rule creation and selectionADVANCED MICRO DEVICES INC·Filed 2004·Granted Mar 20, 2007·57 cites·22 claims
- 0589US6544699B1Method to improve accuracy of model-based optical proximity correctionADVANCED MICRO DEVICES INC·Filed 2001·Granted Apr 8, 2003·34 cites·20 claims
- 0688US7269804B2System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniquesADVANCED MICRO DEVICES INC·Filed 2004·Granted Sep 11, 2007·27 cites·15 claims
- 0782US7657864B2System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniquesGLOBALFOUNDRIES INC·Filed 2007·Granted Feb 2, 2010·5 cites·15 claims
- 0880US7313769B1Optimizing an integrated circuit layout by taking into consideration layout interactions as well as extra manufacturability marginADVANCED MICRO DEVICES INC·Filed 2004·Granted Dec 25, 2007·30 cites·20 claims
- 0972US7422828B1Mask CD measurement monitor outside of the pellicle areaADVANCED MICRO DEVICES INC·Filed 2004·Granted Sep 9, 2008·14 cites·12 claims
- 1068US6593039B1Photoresist mask that combines attenuated and alternating phase shifting masksADVANCED MICRO DEVICES INC·Filed 2001·Granted Jul 15, 2003·9 cites·20 claims
- 1163US7788609B2Method and apparatus for optimizing an optical proximity correction modelGLOBALFOUNDRIES INC·Filed 2008·Granted Aug 31, 2010·1 cites·21 claims
- 1263US6900124B1Patterning for elliptical Vss contact on flash memoryADVANCED MICRO DEVICES INC·Filed 2003·Granted May 31, 2005·9 cites·10 claims
- 1362US5583069AMethod for making a fine annular charge storage electrode in a semiconductor device using a phase-shift maskHYUNDAI ELECTRONICS IND·Filed 1995·Granted Dec 10, 1996·32 cites·20 claims
- 1460US7543256B1System and method for designing an integrated circuit deviceADVANCED MICRO DEVICES INC·Filed 2004·Granted Jun 2, 2009·6 cites·2 claims
- 1559US7507661B2Method of forming narrowly spaced flash memory contact openings and lithography masksSPANSION LLC·Filed 2004·Granted Mar 24, 2009·6 cites·8 claims
- 1656US6566020B2Dark field trench in an alternating phase shift mask to avoid phase conflictADVANCED MICRO DEVICES INC·Filed 2001·Granted May 20, 2003·4 cites·20 claims
- 1755US7368225B1Two mask photoresist exposure pattern for dense and isolated regionsADVANCED MICRO DEVICES INC·Filed 2004·Granted May 6, 2008·5 cites·20 claims
- 1855US7018922B1Patterning for elongated VSS contact flash memoryADVANCED MICRO DEVICES INC·Filed 2004·Granted Mar 28, 2006·5 cites·7 claims
- 1955US5756235APhase shift mask and method for fabricating the sameHYUNDAI ELECTRONICS IND·Filed 1996·Granted May 26, 1998·20 cites·14 claims
- 2053US7384725B2System and method for fabricating contact holesADVANCED MICRO DEVICES INC·Filed 2004·Granted Jun 10, 2008·3 cites·14 claims
- 2150US6576376B1Tri-tone mask process for dense and isolated patternsADVANCED MICRO DEVICES INC·Filed 2001·Granted Jun 10, 2003·2 cites·20 claims
- 2248US8003545B2Method of forming an electronic device including forming features within a mask and a selective removal processSPANSION LLC·Filed 2008·Granted Aug 23, 2011·0 cites·20 claims
- 2348US5897975APhase shift mask for formation of contact holes having micro dimensionHYUNDAI ELECTRONICS IND·Filed 1995·Granted Apr 27, 1999·15 cites·4 claims
- 2438US6811932B1Method and system for determining flow rates for contact formationADVANCED MICRO DEVICES INC·Filed 2002·Granted Nov 2, 2004·0 cites·7 claims
- 2533US5817437AMethod for detecting phase error of a phase shift maskHYUNDAI ELECTRONICS IND·Filed 1996·Granted Oct 6, 1998·4 cites·19 claims
- 2626US5498497AMethod for manufacturing a phase shift maskHYUNDAI ELECTRONICS IND·Filed 1994·Granted Mar 12, 1996·1 cites·6 claims
Join the waitlist — get patent alerts
Get an alert when Hung-Eil Kim files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →