Inventor · disambiguated record
Kevin Hamer
Also filed as: HAMER KEVIN T
8 granted patents·6 pending applications·110 citations·filing 2001–2006
87Inventor score
Top patents by PatentIndex Score
14 records- 0192US6677250B2CVD apparatuses and methods of forming a layer over a semiconductor substrateMICRON TECHNOLOGY INC·Filed 2001·Granted Jan 13, 2004·56 cites·19 claims
- 0285US6800172B2Interfacial structure for semiconductor substrate processing chambers and substrate transfer chambers and for semiconductor substrate processing chambers and accessory attachments, and semiconductor substrate processorMICRON TECHNOLOGY INC·Filed 2002·Granted Oct 5, 2004·30 cites·68 claims
- 0368US6950178B2Method and system for monitoring plasma using optical emission spectroscopyMICRON TECHNOLOGY INC·Filed 2003·Granted Sep 27, 2005·6 cites·39 claims
- 0464US6936547B2Gas delivery system for deposition processes, and methods of using sameMICRON TECHNOLOGY INC·Filed 2002·Granted Aug 30, 2005·5 cites·113 claims
- 0558US7354631B2Chemical vapor deposition apparatus and methodsMICRON TECHNOLOGY INC·Filed 2003·Granted Apr 8, 2008·5 cites·60 claims
- 0658US2006251815A1Atomic layer deposition methodsHAMER KEVIN T·Filed 2006·Application pending·0 cites
- 0757US6849133B2CVD apparatuses and methods of forming a layer over a semiconductor substrateMICRON TECHNOLOGY INC·Filed 2003·Granted Feb 1, 2005·4 cites·12 claims
- 0854US7312857B2Method and system for monitoring plasma using optical emission spectrometryMICRON TECHNOLOGY INC·Filed 2005·Granted Dec 25, 2007·1 cites·18 claims
- 0953US7192487B2Semiconductor substrate processing chamber and accessory attachment interfacial structureMICRON TECHNOLOGY INC·Filed 2003·Granted Mar 20, 2007·3 cites·40 claims
- 1051US2006240188A1Chemical vapor deposition apparatusFUSS JEFF N·Filed 2006·Application pending·0 cites
- 1150US2005011449A1Gas delivery system for deposition processes, and methods of using sameMICRON TECHNOLOGY INC·Filed 2004·Application pending·0 cites
- 1249US2006027326A1Semiconductor substrate processing chamber and substrate transfer chamber interfacial structureMICRON TECHNOLOGY INC·Filed 2005·Application pending·0 cites
- 1348US2006019029A1Atomic layer deposition methods and apparatusHAMER KEVIN T·Filed 2004·Application pending·0 cites
- 1444US2005112890A1CVD apparatuses and methods of forming a layer over a semiconductor substrateFiled 2004·Application pending·0 cites
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