Inventor · disambiguated record
Chien-Wei Wang
Also filed as: WANG CHIEN-WEI
54 granted patents·15 pending applications·502 citations·filing 2004–2025
98Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD34WANG CHIEN-WEI12TAIWAN SEMICONDUCTOR MFG5CORETRONIC CORP4VANGUARD INT SEMICONDUCT CORP4
Top patents by PatentIndex Score
69 records- 0199US8216767B2Patterning process and chemical amplified photoresist with a photodegradable baseWANG CHIEN-WEI·Filed 2009·Granted Jul 10, 2012·110 cites·19 claims
- 0298US8658344B2Patterning process and photoresist with a photodegradable baseWANG CHIEN-WEI·Filed 2012·Granted Feb 25, 2014·93 cites·19 claims
- 0397US8586290B2Patterning process and chemical amplified photoresist compositionWANG CHIEN-WEI·Filed 2009·Granted Nov 19, 2013·34 cites·21 claims
- 0496US7711636B2Systems and methods for analyzing dataEXPERIAN INFORMATION SOLUTIONS·Filed 2006·Granted May 4, 2010·134 cites·9 claims
- 0595US11157997B2Systems and methods for analyzing dataEXPERIAN INF SOLUTIONS INC·Filed 2018·Granted Oct 26, 2021·17 cites·18 claims
- 0695US9921480B2Extreme ultraviolet photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Mar 20, 2018·7 cites·20 claims
- 0794US10520813B2Extreme ultraviolet photoresist with high-efficiency electron transferTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 31, 2019·4 cites·19 claims
- 0893US10658184B2Pattern fidelity enhancement with directional patterning technologyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted May 19, 2020·7 cites·12 claims
- 0993US10515812B1Methods of reducing pattern roughness in semiconductor fabricationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 24, 2019·6 cites·20 claims
- 1092US11703766B2Materials and methods for forming resist bottom layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jul 18, 2023·1 cites·20 claims
- 1191US11442364B2Materials and methods for forming resist bottom layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Sep 13, 2022·3 cites·20 claims
- 1291US8563231B2Patterning process and materials for lithographyWANG CHIEN-WEI·Filed 2011·Granted Oct 22, 2013·10 cites·22 claims
- 1390US8512939B2Photoresist stripping techniqueWANG CHIEN-WEI·Filed 2009·Granted Aug 20, 2013·13 cites·14 claims
- 1489US11422465B2Extreme ultraviolet photoresist with high-efficiency electron transferTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Aug 23, 2022·2 cites·20 claims
- 1588US8741552B2Double patterning strategy for contact hole and trench in photolithographyCHEN CHUN-KUANG·Filed 2010·Granted Jun 3, 2014·9 cites·21 claims
- 1686US12334920B2Level shifterVANGUARD INT SEMICONDUCT CORP·Filed 2023·Granted Jun 17, 2025·1 cites·16 claims
- 1786US9958779B2Photoresist additive for outgassing reduction and out-of-band radiation absorptionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted May 1, 2018·4 cites·20 claims
- 1886US8105954B2System and method of vapor depositionWANG CHIEN-WEI·Filed 2008·Granted Jan 31, 2012·8 cites·19 claims
- 1985US8841066B2Photoresist stripping techniqueTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Sep 23, 2014·5 cites·20 claims
- 2084US11106138B2Lithography process and material for negative tone developmentTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Aug 31, 2021·2 cites·20 claims
- 2182US9983474B2Photoresist having sensitizer bonded to acid generatorTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted May 29, 2018·3 cites·19 claims
- 2281US10394126B2Photolithography process and materialsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Aug 27, 2019·2 cites·17 claims
- 2380US11809080B2Extreme ultraviolet photoresist with high-efficiency electron transferTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Nov 7, 2023·0 cites·20 claims
- 2480US10163632B2Material composition and process for substrate modificationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 25, 2018·2 cites·20 claims
- 2579US10503070B2Photosensitive material and method of lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 10, 2019·2 cites·20 claims
- 2679US10468249B2Patterning process of a semiconductor structure with a middle layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Nov 5, 2019·2 cites·20 claims
- 2779US9864275B2Lithographic resist with floating protectantTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jan 9, 2018·4 cites·18 claims
- 2879US2023359124A1Materials and methods for forming resist bottom layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 2977US12500411B2Trigger circuit and operating circuitVANGUARD INT SEMICONDUCT CORP·Filed 2024·Granted Dec 16, 2025·0 cites·20 claims
- 3075US12189296B2Lithography process and material for negative tone developmentTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jan 7, 2025·0 cites·20 claims
- 3173US9029062B2Photoresist and patterning processWANG CHIEN-WEI·Filed 2010·Granted May 12, 2015·2 cites·20 claims
- 3272US9046785B2Method and apparatus of patterning a semiconductor deviceWANG CHIEN-WEI·Filed 2009·Granted Jun 2, 2015·2 cites·19 claims
- 3372US2025138428A1Lithography Process and Material for Negative Tone DevelopmentTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3472US2022051315A1Systems and methods for analyzing dataEXPERIAN INF SOLUTIONS INC·Filed 2021·Application pending·0 cites
- 3571US11320738B2Pattern formation method and material for manufacturing semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted May 3, 2022·1 cites·20 claims
- 3667US11158509B2Pattern fidelity enhancement with directional patterning technologyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Oct 26, 2021·0 cites·20 claims
- 3766US9323155B2Double patterning strategy for contact hole and trench in photolithographyTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Apr 26, 2016·1 cites·20 claims
- 3865US11003076B2Extreme ultraviolet photoresist and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted May 11, 2021·0 cites·20 claims
- 3965US10872773B2Methods of reducing pattern roughness in semiconductor fabricationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 22, 2020·0 cites·20 claims
- 4065US2022260918A1Pattern formation method and material for manufacturing semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Application pending·0 cites
- 4163US11062905B2Patterning process of a semiconductor structure with a middle layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jul 13, 2021·0 cites·20 claims
- 4263US9589785B2Cleaning method and composition in photolithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Mar 7, 2017·1 cites·20 claims
- 4363US8956806B2Photoresist and patterning processWANG CHIEN-WEI·Filed 2009·Granted Feb 17, 2015·1 cites·20 claims
- 4463US2009099960A1Systems and methods for analyzing dataEXPERIAN SCOREX LLC·Filed 2008·Application pending·0 cites
- 4563US2013006825A1Systems and methods for analyzing dataEXPERIAN INF SOLUTIONS INC·Filed 2012·Application pending·0 cites
- 4662US12019375B2Photosensitive material and method of lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jun 25, 2024·0 cites·20 claims
- 4762US10401728B2Extreme ultraviolet photoresist and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Sep 3, 2019·0 cites·20 claims
- 4861US12501007B2Projector and correction method thereof for correcting geometric distortion of projection imageCORETRONIC CORP·Filed 2022·Granted Dec 16, 2025·0 cites·18 claims
- 4961US10802402B2Material composition and process for substrate modificationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Oct 13, 2020·0 cites·20 claims
- 5061US2025341788A1Chuck with buffer portionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
Showing the top 50 of 69 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →