Inventor · disambiguated record
Venkateswara R. Pallem
Also filed as: PALLEM VENKATESWARA · PALLEM VENKATESWARA R
37 granted patents·16 pending applications·138 citations·filing 2009–2023
97Inventor score
Files withAIR LIQUIDE AMERICAN35AIR LIQUIDE5PALLEM VENKATESWARA R5DUSSARRAT CHRISTIAN2KOROLEV ANDREY V1
Top patents by PatentIndex Score
53 records- 0197US9371338B2Organosilane precursors for ALD/CVD silicon-containing film applicationsAIR LIQUIDE AMERICAN·Filed 2013·Granted Jun 21, 2016·22 cites·19 claims
- 0296US9382268B1Sulfur containing organosilane precursors for ALD/CVD silicon-containing film applicationsAIR LIQUIDE AMERICAN·Filed 2014·Granted Jul 5, 2016·19 cites·21 claims
- 0395US9701695B1Synthesis methods for amino(halo)silanesAIR LIQUIDE AMERICAN·Filed 2015·Granted Jul 11, 2017·13 cites·20 claims
- 0494US9659788B2Nitrogen-containing compounds for etching semiconductor structuresAIR LIQUIDE AMERICAN·Filed 2015·Granted May 23, 2017·13 cites·20 claims
- 0593US11430663B2Iodine-containing compounds for etching semiconductor structuresAIR LIQUIDE AMERICAN·Filed 2020·Granted Aug 30, 2022·3 cites·18 claims
- 0692US10629451B1Method to improve profile control during selective etching of silicon nitride spacersAIR LIQUIDE AMERICAN·Filed 2019·Granted Apr 21, 2020·6 cites·20 claims
- 0790US10217681B1Gases for low damage selective silicon nitride etchingAIR LIQUIDE AMERICAN·Filed 2015·Granted Feb 26, 2019·7 cites·22 claims
- 0890US8283201B2Preparation of lanthanide-containing precursors and deposition of lanthanide-containing filmsPALLEM VENKATESWARA R·Filed 2009·Granted Oct 9, 2012·13 cites·18 claims
- 0989US11784041B2Preparation of lanthanide-containing precursors and deposition of lanthanide-containing filmsAIR LIQUIDE·Filed 2022·Granted Oct 10, 2023·2 cites·6 claims
- 1089US9711347B2Preparation of lanthanide-containing precursors and deposition of lanthanide-containing filmsAIR LIQUIDE AMERICAN·Filed 2016·Granted Jul 18, 2017·4 cites·29 claims
- 1188US9773683B2Atomic layer or cyclic plasma etching chemistries and processesAIR LIQUIDE AMERICAN·Filed 2015·Granted Sep 26, 2017·5 cites·14 claims
- 1286US10607850B2Iodine-containing compounds for etching semiconductor structuresAIR LIQUIDE AMERICAN·Filed 2016·Granted Mar 31, 2020·4 cites·19 claims
- 1385US8809849B2Preparation of cerium-containing precursors and deposition of cerium-containing filmsAIR LIQUIDE AMERICAN·Filed 2013·Granted Aug 19, 2014·4 cites·11 claims
- 1484US12327732B2Method to improve profile control during selective etching of silicon nitride spacersAIR LIQUIDE AMERICAN·Filed 2023·Granted Jun 10, 2025·0 cites·20 claims
- 1583US9822132B2Hexacoordinate silicon-containing precursors for ALD/CVD silicon-containing film applicationsAIR LIQUIDE AMERICAN·Filed 2014·Granted Nov 21, 2017·3 cites·14 claims
- 1682US8404878B2Titanium-containing precursors for vapor depositionPALLEM VENKATESWARA R·Filed 2010·Granted Mar 26, 2013·4 cites·13 claims
- 1781US11821080B2Reagents to remove oxygen from metal oxyhalide precursors in thin film deposition processesAIR LIQUIDE·Filed 2021·Granted Nov 21, 2023·1 cites·19 claims
- 1879US11837474B2Method to improve profile control during selective etching of silicon nitride spacersAIR LIQUIDE AMERICAN·Filed 2022·Granted Dec 5, 2023·0 cites·20 claims
- 1979US10256109B2Nitrogen-containing compounds for etching semiconductor structuresAIR LIQUIDE AMERICAN·Filed 2017·Granted Apr 9, 2019·2 cites·19 claims
- 2077US12435096B2Indium precursors for vapor depositionsAIR LIQUIDE AMERICAN·Filed 2023·Granted Oct 7, 2025·0 cites·11 claims
- 2177US9773679B2Method of etching semiconductor structures with etch gasAIR LIQUIDE AMERICAN·Filed 2014·Granted Sep 26, 2017·3 cites·15 claims
- 2277US9384963B2Preparation of cerium-containing precursor and deposition of cerium-containing filmsAIR LIQUIDE AMERICAN·Filed 2014·Granted Jul 5, 2016·2 cites·20 claims
- 2377US8692010B1Synthesis method for copper compoundsKOROLEV ANDREY V·Filed 2012·Granted Apr 8, 2014·2 cites·12 claims
- 2475US9969756B2Carbosilane substituted amine precursors for deposition of Si-containing films and methods thereofAIR LIQUIDE AMERICAN·Filed 2015·Granted May 15, 2018·2 cites·20 claims
- 2572US10115600B2Method of etching semiconductor structures with etch gasAIR LIQUIDE AMERICAN·Filed 2017·Granted Oct 30, 2018·1 cites·16 claims
- 2672US9045509B2Hafnium- and zirconium-containing precursors and methods of using the sameDUSSARRAT CHRISTIAN·Filed 2010·Granted Jun 2, 2015·1 cites·13 claims
- 2770US11469110B2Method to improve profile control during selective etching of silicon nitride spacersAIR LIQUIDE AMERICAN·Filed 2020·Granted Oct 11, 2022·0 cites·20 claims
- 2870US9938303B2Organosilane precursors for ALD/CVD silicon-containing film applicationsAIR LIQUIDE AMERICAN·Filed 2013·Granted Apr 10, 2018·0 cites·16 claims
- 2970US9593133B2Organosilane precursors for ALD/CVD silicon-containing film applicationsAIR LIQUIDE AMERICAN·Filed 2013·Granted Mar 14, 2017·0 cites·15 claims
- 3070US8765220B2Methods of making and deposition methods using hafnium- or zirconium-containing compoundsDUSSARRAT CHRISTIAN·Filed 2010·Granted Jul 1, 2014·2 cites·20 claims
- 3161US12187853B2Silicon-based self-assembling monolayer compositions and surface preparation using the sameAIR LIQUIDE AMERICAN·Filed 2021·Granted Jan 7, 2025·0 cites·12 claims
- 3260US2022106333A1Indium precursors for vapor depositionsAIR LIQUIDE AMERICAN·Filed 2020·Application pending·0 cites
- 3358US2023323530A1Niobium, vanadium, tantalum film forming compositions and deposition of group v (five) containing films using the sameLAIR LIQUIDE SA POUR LETUDE ET LEXPLOITATATION DES PROCEDES GEORGES CLAUDE·Filed 2022·Application pending·0 cites
- 3458US2019256532A1Alkylamino-substituted carbosilane precursorsAIR LIQUIDE AMERICAN·Filed 2019·Application pending·0 cites
- 3557US9076648B2Preparation of lanthanide-containing precursors and deposition of lanthanide-containing filmsAIR LIQUIDE AMERICAN·Filed 2013·Granted Jul 7, 2015·0 cites·23 claims
- 3657US8633329B2Titanium-containing precursors for vapor depositionAIR LIQUIDE AMERICAN·Filed 2013·Granted Jan 21, 2014·0 cites·16 claims
- 3756US10053775B2Methods of using amino(bromo)silane precursors for ALD/CVD silicon-containing film applicationsAIR LIQUIDE AMERICAN·Filed 2015·Granted Aug 21, 2018·0 cites·20 claims
- 3856US10006122B2Organodisilane precursors for ALD/CVD silicon-containing film applicationsAIR LIQUIDE AMERICAN·Filed 2015·Granted Jun 26, 2018·0 cites·20 claims
- 3956US2010078601A1Preparation of Lanthanide-Containing Precursors and Deposition of Lanthanide-Containing FilmsAIR LIQUIDE AMERICAN·Filed 2009·Application pending·0 cites
- 4055US2014127913A1Titanium-containing precursors for vapor depositionAIR LIQUIDE AMERICAN·Filed 2014·Application pending·0 cites
- 4154US2024222114A1Method of forming a conformal and continuous crystalline silicon nanosheet with improved electrical properties at low doping levelsLAIR LIQUIDE SA POUR LETUDE ET L’EXPLOITATION DES PROCEDES GEORGES CLAUDE·Filed 2022·Application pending·0 cites
- 4254US2023095074A1CURABLE FORMULATIONS FOR FORMING LOW-k DIELECTRIC SILICON-CONTAINING FILMS USING POLYCARBOSILAZANEAIR LIQUIDE·Filed 2022·Application pending·0 cites
- 4353US2024384400A1Method of forming a ruthenium-containing layer and laminateAIR LIQUIDE·Filed 2022·Application pending·0 cites
- 4452US2012156373A1Preparation of cerium-containing precursors and deposition of cerium-containing filmsPALLEM VENKATESWARA R·Filed 2011·Application pending·0 cites
- 4549US8507905B2Preparation of lanthanide-containing precursors and deposition of lanthanide-containing filmsPALLEM VENKATESWARA·Filed 2012·Granted Aug 13, 2013·0 cites·5 claims
- 4648US2017190720A1Alkylamino-substituted carbosilane precursorsL'Air Liquide Société Anonyme pour I'Etude et I'Exploitation des Procédés Georges Claude·Filed 2015·Application pending·0 cites
- 4745US2018202042A1Alkylamino-substituted halocarbosilane precursorsAIR LIQUIDE·Filed 2016·Application pending·0 cites
- 4844US2023274947A1Selective thermal etching methods of metal or metal-containing materials for semiconductor manufacturingAIR LIQUIDE AMERICAN·Filed 2021·Application pending·0 cites
- 4943US9087690B2Hafnium-containing and zirconium-containing precursors for vapor depositionPALLEM VENKATESWARA R·Filed 2011·Granted Jul 21, 2015·0 cites·19 claims
- 5042US2016046408A1Internally coated vessel for housing a metal halideL AIR LIQUIDE SOCIÉTÉ ANONYME POUR L ETUDE ET L EXPL DES PROCÉDÉS GEORGES CLAUDE·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →