Titanium-containing precursors for vapor deposition

Abstract

Disclosed are titanium-containing precursors and methods of synthesizing the same. The compounds may be used to deposit titanium, titanium oxide, strontium-titanium oxide, and barium strontium titanate containing layers using vapor deposition methods such as chemical vapor deposition or atomic layer deposition.

What is claimed is: 
     
         1 . A molecule having the following formula:
   Ti(R 1 —N—C(R 3 )—N—R 2 ) u (OR 4 ) x (NR 5 R 6 ) y (O 2 CR 7 ) z    Formula I
     or     Ti(R 1 —N—(C(R 3 ) 2 ) m —N—R 2 ) v (OR 4 ) x (NR 5 R 6 ) y (O 2 CR 7 ) z    Formula II
   
       wherein:
 R 1 , R 2 , R 5 , R 6 , and R 7  are independently selected from the group consisting of H and C1-C6 alkyl group; 
 R 3  ═H, C1-C6 alkyl group, or NMe 2 ; 
 R 4  is a C1-C6 alkyl group; 
 m=2-4; 
 u=0; 
 v=0; 
 x=2-3; 
 y=0; 
 z=1-2; 
 in Formula I, u+x+y+z=4; 
 in Formula II, 2v+x+y+z=4; and 
 u, v, or 1. 
 
     
     
         2 . The molecule of  claim 1 , the molecule being Ti(OiPr) 2 (O 2 CMe) 2 . 
     
     
         3 . The molecule of  claim 1 , the molecule being Ti(OiPr) 3 (O 2 CMe). 
     
     
         4 . A method of forming a Ti-containing layer on a substrate, the method comprising:
 providing a reaction chamber having at least one substrate disposed therein;   introducing into the reaction chamber a vapor including at least one precursor having the formula:
   Ti(R 1 —N—C(R 3 )—N—R 2 ) u (OR 4 ) x (NR 5 R 6 ) y (O 2 CR 7 ) z    Formula I
 
   or 
   Ti(R 1 —N—(C(R 3 ) 2 ) m —N—R 2 ) v (OR 4 ) x (NR 5 R 6 ) y (O 2 CR 7 ) z    Formula II
 
   
       wherein:
 R 1 , R 2 , R 5 , R 6 , and R 7  are independently selected from the group consisting of H and C1-C6 alkyl group; 
 R 3 ═H, C1-C6 alkyl group, or NMe 2 ; 
 R 4  is a C1-C6 alkyl group; 
 m=2-4; 
 u=0; 
 v=0; 
 x=2-3; 
 y=0; 
 z=1-2; 
 in Formula I, u+x+y+z=4; 
 in Formula II, 2v+x+y+z=4; and 
 u, v, or 1; 
 contacting the vapor with the substrate to form a Ti-containing layer on at least one surface of the substrate using a vapor deposition process. 
 
     
     
         5 . The method of  claim 4 , wherein the at least one precursor is Ti(OiPr) 2 (O 2 CMe) 2 . 
     
     
         6 . The method of  claim 4 , wherein the at least one precursor is Ti(OiPr) 3 (O 2 CMe). 
     
     
         7 . The method of  claim 4 , further comprising:
 introducing into the reaction chamber a second vapor including at least one metal-containing precursor selected from the group consisting of M(L) 2  and M(L) 2 .A, wherein:
 M is Sr or Ba; 
 L is selected from substituted cyclopentadienyl ligand systems R 1 R 2 R 3 R 4 R 5 Cp or beta-diketonate ligand systems—O‘ 3 CR 6 —CH—CR 7 —O—; 
 each of R 1  to R 5  is independently selected from H or C1-C6 linear or branched alkyl chain; 
 each of R 6  and R 7  is independently selected from C1-C6 linear or branched alkyl chain; and 
 A is a neutral oxygen containing molecules selected from the group consisting of tetrahydrofuran, dimethoxyethane, diglyme, triglyme, and tetraglyme; and 
   contacting the second vapor with the substrate to form a metal-containing layer on at least one surface of the substrate using the vapor deposition process.   
     
     
         8 . The method of  claim 7 , wherein the metal-containing precursor is selected from the group consisting of Sr(iPr 3 Cp) 2 , Sr(iPr 3 Cp) 2 .thf, Sr(iPr 3 Cp) 2 .dme, Sr(tBu 3 Cp) 2 , Sr(tBu 3 Cp) 2 .thf, Sr(tBu 3 Cp) 2 .dme, Sr(thmd) 2 , Sr(thmd) 2 .triglyme, Sr(thmd) 2 .tetraglyme, Sr(Me 5 Cp) 2 , Sr(Me 4 Cp) 2 , Sr(Me 4 EtCp) 2 , Sr(Me 4 nBuCp) 2 , Ba(iPr 3 Cp) 2 , Ba(iPr 3 Cp) 2 .thf, Ba(iPr 3 Cp) 2 .dme, Ba(tBu 3 Cp) 2 , Ba(tBu 3 Cp) 2 .thf, Ba(tBu 3 Cp) 2 .dme, Ba(thmd) 2 , Ba(thmd) 2 .triglyme, Ba(thmd) 2 .tetraglyme, Ba(Me 5 Cp) 2 , Ba(Me 4 Cp) 2 , Ba(Me 4 EtCp) 2 , and Ba(Me 4 nBuCp) 2 . 
     
     
         9 . A method of depositing a STO or BST film, the method comprising:
 providing an ALD reaction chamber having at least one substrate disposed therein;   pulsing into the reaction chamber a precursor having the formula:
   Ti(R 1 —N—C(R 3 )—N—R 2 ) u (OR 4 ) x (NR 5 R 6 ) y (O 2 CR 7 ) z    Formula I
 
   or 
   Ti(R 1 —N—(C(R 3 ) 2 ) m —N—R 2 ) v (OR 4 ) x (NR 5 R 6 ) y (O 2 CR 7 ) z    Formula II
 
   
       wherein:
 R 1 , R 2 , R 5 , R 6 , and R 7  are independently selected from the group consisting of H and C1-C6 alkyl group; 
 R 3 ═H, C1-C6 alkyl group, or NMe 2 ; 
 R 4  is a C1-C6 alkyl group; 
 m=2-4; 
 u=0; 
 v=0; 
 x=2-3; 
 y=0; 
 z=1-2; 
 in Formula I, u+x+y+z=4; 
 in Formula II, 2v+x+y+z=4; and 
 u, v, or z 1; and 
 pulsing into the reaction chamber an oxygen source; 
 pulsing into the reaction chamber a metal-containing precursor selected from the group consisting of M(L) 2  and M(L) 2 .A, wherein:
 M is Sr or Ba; 
 L is selected from substituted cyclopentadenyl ligand systems R 1 R 2 R 3 R 4 R 5 Cp or beta-diketonate ligand systems —O—CR 6 —CH—CR 7 —O—; 
 each of R 1  to R 5  is independently selected from H or C1-C6 linear or branched alkyl chain; 
 each of R 6  and R 7  is independently selected from C1-C6 linear or branched alkyl chain; and 
 A is a neutral oxygen containing molecules selected from the group consisting of tetrahydrofuran, dimethoxyethane, diglyme, triglyme, and tetraglyme; 
 
 pulsing into the reaction chamber a second oxygen source; and 
 controlling the stoichiometry of M:Ti ratio in the STO or BST film by varying a number of the pulsing steps for the precursor and metal-containing precursor. 
 
     
     
         10 . The method of  claim 9 , wherein the precursor is Ti(OiPr) 2 (O 2 CMe) 2 . 
     
     
         11 . The method of  claim 9 , wherein the precursor is Ti(OiPr) 3 (O 2 CMe). 
     
     
         12 . The method of  claim 9 , wherein the metal-containing precursor is selected from the group consisting of Sr(iPr 3 Cp) 2 , Sr(iPr 3 Cp) 2 .thf, Sr(iPr 3 Cp) 2 .dme, Sr(tBu 3 Cp) 2 , Sr(tBu 3 Cp) 2 .thf, Sr(tBu 3 Cp) 2 .dme, Sr(thmd) 2 , Sr(thmd) 2 .triglyme, Sr(thmd) 2 .tetraglyme, Sr(Me 5 Cp) 2 , Sr(Me 4 Cp) 2 , Sr(Me 4 EtCp) 2 , Sr(Me 4 nBuCp) 2 , Ba(iPr 3 Cp) 2 , Ba(iPr 3 Cp) 2 .thf, Ba(iPr 3 Cp) 2 .dme, Ba(tBu 3 Cp) 2 , Ba(tBu 3 Cp) 2 .thf, Ba(tBu 3 Cp) 2 .dme, Ba(thmd) 2 , Ba(thmd) 2 .triglyme, Ba(thmd) 2 .tetraglyme, Ba(Me 5 Cp) 2 , Ba(Me 4 Cp) 2 , Ba(Me 4 EtCp) 2 , and Ba(Me 4 nBuCp) 2 . 
     
     
         13 . The method of  claim 9 , wherein the oxygen source and the second oxygen source are water.