Inventor · disambiguated record
Michael Kutney
Also filed as: KUTNEY MICHAEL · KUTNEY MICHAEL C · KUTNEY MICHAEL CHARLES
30 granted patents·23 pending applications·592 citations·filing 2005–2025
96Inventor score
Files withAPPLIED MATERIALS INC42CARDUCCI JAMES D4HOFFMAN DANIEL J3BACHRACH ROBERT Z1BOLANDI HOOMAN1
Top patents by PatentIndex Score
53 records- 0198US8382939B2Plasma processing chamber with enhanced gas deliveryAPPLIED MATERIALS INC·Filed 2009·Granted Feb 26, 2013·403 cites·12 claims
- 0296US8118938B2Lower liner with integrated flow equalizer and improved conductanceCARDUCCI JAMES D·Filed 2011·Granted Feb 21, 2012·26 cites·10 claims
- 0396US7780866B2Method of plasma confinement for enhancing magnetic control of plasma radial distributionAPPLIED MATERIALS INC·Filed 2007·Granted Aug 24, 2010·40 cites·20 claims
- 0495US12283503B2Substrate measurement subsystemAPPLIED MATERIALS INC·Filed 2021·Granted Apr 22, 2025·3 cites·20 claims
- 0595US7987814B2Lower liner with integrated flow equalizer and improved conductanceAPPLIED MATERIALS INC·Filed 2008·Granted Aug 2, 2011·26 cites·14 claims
- 0694US8617351B2Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reductionHOFFMAN DANIEL J·Filed 2005·Granted Dec 31, 2013·26 cites·10 claims
- 0794US8282736B2Lower liner with integrated flow equalizer and improved conductanceCARDUCCI JAMES D·Filed 2012·Granted Oct 9, 2012·14 cites·10 claims
- 0893US11668602B2Spatial optical emission spectroscopy for etch uniformityAPPLIED MATERIALS INC·Filed 2021·Granted Jun 6, 2023·2 cites·18 claims
- 0991US8313578B2Etching chamber having flow equalizer and lower linerCARDUCCI JAMES D·Filed 2009·Granted Nov 20, 2012·13 cites·13 claims
- 1089US8440019B2Lower liner with integrated flow equalizer and improved conductanceCARDUCCI JAMES D·Filed 2012·Granted May 14, 2013·7 cites·15 claims
- 1187US7674353B2Apparatus to confine plasma and to enhance flow conductanceAPPLIED MATERIALS INC·Filed 2006·Granted Mar 9, 2010·8 cites·20 claims
- 1284US7618516B2Method and apparatus to confine plasma and to enhance flow conductanceAPPLIED MATERIALS INC·Filed 2006·Granted Nov 17, 2009·6 cites·19 claims
- 1383USD977504SPortion of a display panel with a graphical user interfaceAPPLIED MATERIALS INC·Filed 2020·Granted Feb 7, 2023·10 cites·1 claims
- 1480US12405164B2Spatial optical emission spectroscopy for etch uniformityAPPLIED MATERIALS INC·Filed 2023·Granted Sep 2, 2025·0 cites·20 claims
- 1580US11719952B2Adjustable achromatic collimator assembly for endpoint detection systemsAPPLIED MATERIALS INC·Filed 2020·Granted Aug 8, 2023·1 cites·20 claims
- 1680US9685655B2Complex showerhead coating apparatus with electrospray for lithium ion batteryAPPLIED MATERIALS INC·Filed 2014·Granted Jun 20, 2017·2 cites·19 claims
- 1776US12066639B2Adjustable achromatic collimator assembly for endpoint detection systemsAPPLIED MATERIALS INC·Filed 2023·Granted Aug 20, 2024·0 cites·20 claims
- 1876US8048806B2Methods to avoid unstable plasma states during a process transitionAPPLIED MATERIALS INC·Filed 2006·Granted Nov 1, 2011·5 cites·13 claims
- 1976US2025291335A1Estimation of chamber component conditions using substrate measurementsAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 2072US12191176B2Integrated substrate measurement system to improve manufacturing process performanceAPPLIED MATERIALS INC·Filed 2023·Granted Jan 7, 2025·0 cites·16 claims
- 2172US2024339347A1Integrated substrate measurement systemAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2270US11927543B2Multiple reflectometry for measuring etch parametersAPPLIED MATERIALS INC·Filed 2023·Granted Mar 12, 2024·0 cites·20 claims
- 2370US2025218829A1Substrate measurement subsystemAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 2469US12339645B2Estimation of chamber component conditions using substrate measurementsAPPLIED MATERIALS INC·Filed 2022·Granted Jun 24, 2025·0 cites·24 claims
- 2564US12148647B2Integrated substrate measurement systemAPPLIED MATERIALS INC·Filed 2022·Granted Nov 19, 2024·0 cites·18 claims
- 2663US11688616B2Integrated substrate measurement system to improve manufacturing process performanceAPPLIED MATERIALS INC·Filed 2021·Granted Jun 27, 2023·0 cites·10 claims
- 2763US11619594B2Multiple reflectometry for measuring etch parametersAPPLIED MATERIALS INC·Filed 2021·Granted Apr 4, 2023·0 cites·19 claims
- 2862US2024393761A1Vibration determination in substrate processing systemsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2960US11054184B2Methods and apparatus for processing a substrate to remove moisture and/or residueAPPLIED MATERIALS INC·Filed 2019·Granted Jul 6, 2021·0 cites·18 claims
- 3059US2024128100A1Methods and systems for a spectral library at a manufacturing systemAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3159US2023062206A1Determining substrate profile properties using machine learningAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 3258US2024321649A1On-the-fly measurement of substrate structuresAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3357US12216455B2Chamber component condition estimation using substrate measurementsAPPLIED MATERIALS INC·Filed 2022·Granted Feb 4, 2025·0 cites·20 claims
- 3456US2025336711A1Substrate holder systemsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3555US2025334445A1Substrate measurement systems having substrate holdersAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3653US2022081758A1Methods and apparatus for in-situ deposition monitoringAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 3753US2022026817A1Determining substrate profile properties using machine learningAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 3852US2009250335A1Method of controlling plasma distribution uniformity by superposition of different constant solenoid fieldsHOFFMAN DANIEL J·Filed 2008·Application pending·0 cites
- 3952US2009250432A1Method of controlling plasma distribution uniformity by time-weighted superposition of different solenoid fieldsHOFFMAN DANIEL J·Filed 2008·Application pending·0 cites
- 4051US10247473B2Methods and apparatus for processing a substrate to remove moisture and/or residueAPPLIED MATERIALS INC·Filed 2015·Granted Apr 2, 2019·0 cites·13 claims
- 4150US9982786B2Valve with adjustable hard stopAPPLIED MATERIALS INC·Filed 2014·Granted May 29, 2018·0 cites·20 claims
- 4249US11150120B2Low temperature thermal flow ratio controllerAPPLIED MATERIALS INC·Filed 2019·Granted Oct 19, 2021·0 cites·17 claims
- 4349US2008110567A1Plasma confinement baffle and flow equalizer for enhanced magnetic control of plasma radial distributionMILLER MATTHEW L·Filed 2007·Application pending·0 cites
- 4449US2022066411A1Detecting and correcting substrate process drift using machine learningAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 4548US2024209500A1Processing system and methods for forming void-free and seam-free tungsten featuresAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 4648US2024222128A1Methods to improve productivity of advanced cvd w gapfill processAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 4747US2012219841A1Lithium ion cell design apparatus and methodBOLANDI HOOMAN·Filed 2012·Application pending·0 cites
- 4845US11289387B2Methods and apparatus for backside via reveal processingAPPLIED MATERIALS INC·Filed 2020·Granted Mar 29, 2022·0 cites·18 claims
- 4945US2011217585A1Integrated composite separator for lithium-ion batteriesAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 5042US2007048882A1Method to reduce plasma-induced charging damageAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
Showing the top 50 of 53 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →