Inventor · disambiguated record
Naoyuki Kofuji
Also filed as: KOFUJI NAOYUKI
30 granted patents·20 pending applications·182 citations·filing 1995–2025
96Inventor score
Top patents by PatentIndex Score
50 records- 0192US8546266B2Plasma processing method and plasma processing apparatusMORI MASAHITO·Filed 2011·Granted Oct 1, 2013·12 cites·5 claims
- 0289US7396771B2Plasma etching apparatus and plasma etching methodHITACHI HIGH TECH CORP·Filed 2006·Granted Jul 8, 2008·15 cites·4 claims
- 0387US9099349B2Semiconductor device manufacturing methodHITACHI HIGH TECH CORP·Filed 2013·Granted Aug 4, 2015·8 cites·10 claims
- 0486US11398371B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Jul 26, 2022·4 cites·7 claims
- 0586US9960014B2Plasma etching methodHITACHI HIGH TECH CORP·Filed 2016·Granted May 1, 2018·4 cites·14 claims
- 0685US10418224B2Plasma etching methodHITACHI HIGH TECH CORP·Filed 2018·Granted Sep 17, 2019·3 cites·8 claims
- 0784US11915951B2Plasma processing methodHITACHI HIGH TECH CORP·Filed 2020·Granted Feb 27, 2024·1 cites·5 claims
- 0882US8129283B2Plasma processing method and plasma processing apparatusMORI MASAHITO·Filed 2008·Granted Mar 6, 2012·6 cites·4 claims
- 0981US9076637B2Plasma processing method and plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2013·Granted Jul 7, 2015·3 cites·4 claims
- 1080US11152237B2Substitute sample, method for determining control parameter of processing, and measurement systemHITACHI LTD·Filed 2019·Granted Oct 19, 2021·2 cites·13 claims
- 1180US6677244B2Specimen surface processing methodHITACHI LTD·Filed 2002·Granted Jan 13, 2004·18 cites·4 claims
- 1279US2025253167A1Plasma processing device and plasma processing method using sameHITACHI HIGH TECH CORP·Filed 2025·Application pending·0 cites
- 1377US8093529B2Control method of a temperature of a sampleKOFUJI NAOYUKI·Filed 2008·Granted Jan 10, 2012·6 cites·20 claims
- 1476US8791027B2Method of manufacturing semiconductor deviceKOFUJI NAOYUKI·Filed 2010·Granted Jul 29, 2014·4 cites·8 claims
- 1575US6332425B1Surface treatment method and systemHITACHI LTD·Filed 2000·Granted Dec 25, 2001·16 cites·15 claims
- 1673US2023282491A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2023·Application pending·0 cites
- 1771US9997337B2Plasma processing method and plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2015·Granted Jun 12, 2018·1 cites·4 claims
- 1871US6231777B1Surface treatment method and systemHITACHI LTD·Filed 1995·Granted May 15, 2001·34 cites·6 claims
- 1970US10310321B2Optical element, manufacturing method of optical element, and optical deviceHIRATA KOJI·Filed 2012·Granted Jun 4, 2019·2 cites·10 claims
- 2065US11287782B2Computer, method for determining processing control parameter, substitute sample, measurement system, and measurement methodHITACHI LTD·Filed 2018·Granted Mar 29, 2022·1 cites·10 claims
- 2164US6784109B2Method for fabricating semiconductor devices including wiring forming with a porous low-k film and copperHITACHI LTD·Filed 2001·Granted Aug 31, 2004·9 cites·11 claims
- 2263US7680563B2Pressure control device for low pressure processing chamberHITACHI HIGH TECH CORP·Filed 2007·Granted Mar 16, 2010·3 cites·6 claims
- 2363US7479459B2Semiconductor device manufacturing method and semiconductor device manufacturing apparatusELPIDA MEMORY INC·Filed 2005·Granted Jan 20, 2009·1 cites·12 claims
- 2462US7371692B2Method for manufacturing a semiconductor device having a W/WN/polysilicon layered filmELPIDA MEMORY INC·Filed 2005·Granted May 13, 2008·1 cites·16 claims
- 2556US6573190B1Dry etching device and dry etching methodHITACHI LTD·Filed 1999·Granted Jun 3, 2003·19 cites·12 claims
- 2655US2009098669A1Semiconductor device manufacturing method and semiconductor device manufacturing apparatusELPIDA MEMORY INC·Filed 2008·Application pending·0 cites
- 2752US9933553B2Optical element and optical deviceHIRATA KOJI·Filed 2012·Granted Apr 3, 2018·0 cites·8 claims
- 2851US7604709B2Plasma processing apparatusHITACHI LTD·Filed 2002·Granted Oct 20, 2009·3 cites·42 claims
- 2951US2018122665A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2017·Application pending·0 cites
- 3051US2008154422A1Control Method for plasma etching apparatusKOFUJI NAOYUKI·Filed 2008·Application pending·0 cites
- 3150US2013087285A1Plasma etching apparatusKOFUJI NAOYUKI·Filed 2012·Application pending·0 cites
- 3250US2018047595A1Plasma processing device and plasma processing method using sameHITACHI HIGH TECH CORP·Filed 2016·Application pending·0 cites
- 3349US6797112B2Plasma treatment apparatus and method of producing semiconductor device using the apparatusHITACHI LTD·Filed 2003·Granted Sep 28, 2004·2 cites·7 claims
- 3449US2006096706A1Dry etching apparatus and a method of manufacturing a semiconductor deviceHITACHI LTD·Filed 2005·Application pending·0 cites
- 3548US10418254B2Etching method and etching apparatusHITACHI HIGH TECH CORP·Filed 2018·Granted Sep 17, 2019·0 cites·17 claims
- 3648US2007199657A1Apparatus and method for plasma etchingKOFUJI NAOYUKI·Filed 2006·Application pending·0 cites
- 3747US2008078505A1Plasma etching apparatus and plasma etching methodKOFUJI NAOYUKI·Filed 2007·Application pending·0 cites
- 3846US11189470B2Search device, search method and plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Nov 30, 2021·0 cites·14 claims
- 3944US7049243B2Surface processing method of a specimen and surface processing apparatus of the specimenHITACHI LTD·Filed 2004·Granted May 23, 2006·0 cites·4 claims
- 4044US2022319809A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2019·Application pending·0 cites
- 4142US2010167426A1Plasma etching apparatus and plasma etching methodKOFUJI NAOYUKI·Filed 2010·Application pending·0 cites
- 4242US2021335625A1Dry etching apparatus and dry etching methodHITACHI HIGH TECH CORP·Filed 2019·Application pending·0 cites
- 4339US2002129904A1Plasma treatment apparatus and method of producing semiconductor device using the apparatusHITACHI LTD·Filed 2001·Application pending·0 cites
- 4438US2004058554A1Dry etching methodFiled 2003·Application pending·0 cites
- 4537US6492277B1Specimen surface processing method and apparatusHITACHI LTD·Filed 1999·Granted Dec 10, 2002·4 cites·17 claims
- 4637US2002125206A1Method for manufacturing a semiconductor deviceHITACHI LTD·Filed 2002·Application pending·0 cites
- 4737US2007232067A1Semiconductor Fabrication Method and Etching SystemHIROTA KOUSA·Filed 2007·Application pending·0 cites
- 4835US2011253672A1Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2010·Application pending·0 cites
- 4934US2016079055A1Sample cleaning apparatus and sample cleaning methodHITACHI HIGH TECH CORP·Filed 2015·Application pending·0 cites
- 5030US2002084034A1Dry etching apparatus and a method of manufacturing a semiconductor deviceFiled 1999·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →