Inventor · disambiguated record
Eric Askarinam
Also filed as: ASKARINAM ERIC · ASKARINAM ERIC FARAHMAND E
11 granted patents·2,027 citations·filing 1994–2000
95Inventor score
Technology areasH10P
Top patents by PatentIndex Score
11 records- 0198US6054013AParallel plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion densityAPPLIED MATERIALS INC·Filed 1996·Granted Apr 25, 2000·596 cites·19 claims
- 0296US6095083AVacuum processing chamber having multi-mode accessAPPLIED MATERIELS INC·Filed 1997·Granted Aug 1, 2000·534 cites·42 claims
- 0396US6077384APlasma reactor having an inductive antenna coupling power through a parallel plate electrodeAPPLIED MATERIALS INC·Filed 1996·Granted Jun 20, 2000·237 cites·67 claims
- 0496US6074512AInductively coupled RF plasma reactor having an overhead solenoidal antenna and modular confinement magnet linersAPPLIED MATERIALS INC·Filed 1997·Granted Jun 13, 2000·236 cites·101 claims
- 0595US6623596B1Plasma reactor having an inductive antenna coupling power through a parallel plate electrodeAPPLIED MATERIALS INC·Filed 2000·Granted Sep 23, 2003·84 cites·136 claims
- 0691US6063233AThermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antennaAPPLIED MATERIALS INC·Filed 1996·Granted May 16, 2000·92 cites·20 claims
- 0790US6524432B1Parallel-plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion densityAPPLIED MATERIALS INC·Filed 2000·Granted Feb 25, 2003·49 cites·72 claims
- 0889US6454898B1Inductively coupled RF Plasma reactor having an overhead solenoidal antenna and modular confinement magnet linersAPPLIED MATERIALS INC·Filed 2000·Granted Sep 24, 2002·43 cites·28 claims
- 0989US6440221B2Process chamber having improved temperature controlAPPLIED MATERIALS INC·Filed 1998·Granted Aug 27, 2002·93 cites·40 claims
- 1078US6514376B1Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antennaAPPLIED MATERIALS INC·Filed 2000·Granted Feb 4, 2003·22 cites·50 claims
- 1167US5722668AProtective collar for vacuum seal in a plasma etch reactorAPPLIED MATERIALS INC·Filed 1994·Granted Mar 3, 1998·41 cites·4 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →