Inventor · disambiguated record
Gerhard Karl Strauch
Also filed as: STRAUCH GERHARD · STRAUCH GERHARD K · STRAUCH GERHARD KARL
18 granted patents·17 pending applications·272 citations·filing 2002–2019
95Inventor score
Top patents by PatentIndex Score
35 records- 0192US7709398B2Process and apparatus for depositing semiconductor layers using two process gases, one of which is preconditionedAIXTRON AG·Filed 2005·Granted May 4, 2010·19 cites·19 claims
- 0290US7128785B2Method for depositing especially crystalline layers from the gas phase onto especially crystalline substratesAIXTRON AG·Filed 2003·Granted Oct 31, 2006·48 cites·20 claims
- 0389US7625448B2Inlet system for an MOCVD reactorAIXTRON AG·Filed 2006·Granted Dec 1, 2009·18 cites·20 claims
- 0487US9018105B2CVD method and CVD reactorSTRAUCH GERHARD KARL·Filed 2010·Granted Apr 28, 2015·5 cites·17 claims
- 0587US7147718B2Device and method for the deposition of, in particular, crystalline layers on, in particular, crystalline substratesAIXTRON AG·Filed 2003·Granted Dec 12, 2006·30 cites·15 claims
- 0686US6962624B2Method and device for depositing in particular organic layers using organic vapor phase depositionAIXTRON AG·Filed 2003·Granted Nov 8, 2005·38 cites·16 claims
- 0785US8846501B2Method for equipping an epitaxy reactorSTRAUCH GERHARD KARL·Filed 2010·Granted Sep 30, 2014·4 cites·7 claims
- 0879US7524532B2Process for depositing thin layers on a substrate in a process chamber of adjustable heightAIXTRON AG·Filed 2004·Granted Apr 28, 2009·18 cites·11 claims
- 0979US6670216B2Method for manufacturing a power semiconductor device and direct bonded substrate thereofIXYS CORP·Filed 2002·Granted Dec 30, 2003·24 cites·17 claims
- 1078US10385530B1Method for compaction detection and control when compacting a soil with a deep vibratorKELLER HOLDING GMBH·Filed 2019·Granted Aug 20, 2019·2 cites·21 claims
- 1178US6798060B2Power device and direct aluminum bonded substrate thereofIXYS CORP·Filed 2003·Granted Sep 28, 2004·22 cites·6 claims
- 1277US6972050B2Method for depositing in particular crystalline layers, and device for carrying out the methodAIXTRON AG·Filed 2003·Granted Dec 6, 2005·17 cites·11 claims
- 1374US8349081B2Gas distributor with pre-chambers arranged in planesAIXTRON SE·Filed 2006·Granted Jan 8, 2013·2 cites·14 claims
- 1471US7067012B2CVD coating deviceAIXTRON AG·Filed 2003·Granted Jun 27, 2006·9 cites·13 claims
- 1565US8298337B2Gas inlet element for a CVD reactorREINHOLD MARKUS·Filed 2006·Granted Oct 30, 2012·1 cites·14 claims
- 1664US6905548B2Device for the deposition of crystalline layers on crystalline substratesAIXTRON AG·Filed 2003·Granted Jun 14, 2005·5 cites·9 claims
- 1763US7332038B2Device for depositing in particular crystalline layers on one or more, in particular likewise crystalline substratesAIXTRON AG·Filed 2003·Granted Feb 19, 2008·5 cites·8 claims
- 1862US2010012034A1Process And Apparatus For Depositing Semiconductor Layers Using Two Process Gases, One Of Which is PreconditionedSTRAUCH GERHARD KARL·Filed 2009·Application pending·0 cites
- 1957US7282096B2Arrangement comprising a support body and a substrate holder which is driven in rotation and gas-supported thereonAIXTRON AG·Filed 2003·Granted Oct 16, 2007·5 cites·20 claims
- 2054US2009178620A1Process for Depositing Thin Layers on a Substrate in a Process Chamber of Adjustable HeightJUERGENSEN HOLGER·Filed 2009·Application pending·0 cites
- 2154US2010012036A1Isolation for multi-single-wafer processing apparatusSILVA HUGO·Filed 2009·Application pending·0 cites
- 2254US2006201427A1CVD coating deviceJURGENSEN HOLGER·Filed 2006·Application pending·0 cites
- 2348US2009283040A1Device for temperature-controlled accommodation of a containerAIXTRON INC·Filed 2005·Application pending·0 cites
- 2447US2008072821A1Small volume symmetric flow single wafer ald apparatusDALTON JEREMIC J·Filed 2007·Application pending·0 cites
- 2545US2005081788A1Device for depositing thin layers on a substrateFiled 2004·Application pending·0 cites
- 2644US2013040054A1Coating device and method for operating a coating device having a shielding plateAIXTRON SE·Filed 2011·Application pending·0 cites
- 2743US2012263877A1CVD Reactor Having Gas Inlet Zones that Run in a Strip-Like Manner and a Method for Deposition of a Layer on a Substrate in a CVD Reactor of this KindSTRAUCH GERHARD KARL·Filed 2010·Application pending·0 cites
- 2842US2012156396A1Cvd reactorSTRAUCH GERHARD KARL·Filed 2010·Application pending·0 cites
- 2939US2004013800A1Device and method for feeding a liquid starting material, which has been brought into the gaseous state, into a CVD reactorFiled 2003·Application pending·0 cites
- 3039US2004035202A1Method and device for the metered delivery of low volumetric flows of liquidFiled 2003·Application pending·0 cites
- 3138US2004168639A1Method and device for short-term thermal-treatment of flat objectsFiled 2003·Application pending·0 cites
- 3238US2004231599A1Process chamber with a base with sectionally different rotational drive and layer deposition method in such a process chamberFiled 2004·Application pending·0 cites
- 3336US2005106864A1Process and device for depositing semiconductor layersFiled 2004·Application pending·0 cites
- 3436US2009107401A1Device for vaporizing condensed substancesREINHOLD MARKUS·Filed 2005·Application pending·0 cites
- 3534US2006124055A1Mask-retaining deviceFRANKEN WALTER·Filed 2005·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →