Inventor · disambiguated record
Aihua Chen
Also filed as: CHEN AIHUA · CHEN AIHUA STEVEN
33 granted patents·10 pending applications·1,307 citations·filing 1994–2024
98Inventor score
Files withAPPLIED MATERIALS INC25CHEN AIHUA4ADVANCED MICRO FAB EQUIP INC2TAIZHOU HANCHUANG MEDICAL APPARATUS TECHNOLOGY CO LTD2GUANGDONG RUIXUN ELECTRONIC TECH CO LTD1
Top patents by PatentIndex Score
43 records- 0196US7745329B2Tungsten nitride atomic layer deposition processesAPPLIED MATERIALS INC·Filed 2008·Granted Jun 29, 2010·36 cites·14 claims
- 0296US7172792B2Method for forming a high quality low temperature silicon nitride filmAPPLIED MATERIALS INC·Filed 2002·Granted Feb 6, 2007·135 cites·43 claims
- 0396US6833161B2Cyclical deposition of tungsten nitride for metal oxide gate electrodeAPPLIED MATERIALS INC·Filed 2002·Granted Dec 21, 2004·143 cites·53 claims
- 0494US7658800B2Gas distribution assembly for use in a semiconductor work piece processing reactorADVANCED MICRO FAB EQUIP INC·Filed 2006·Granted Feb 9, 2010·28 cites·21 claims
- 0594US5763851ASlotted RF coil shield for plasma deposition systemAPPLIED MATERIALS INC·Filed 1996·Granted Jun 9, 1998·93 cites·64 claims
- 0693US6713127B2Methods for silicon oxide and oxynitride deposition using single wafer low pressure CVDAPPLIED MATERIALS INC·Filed 2001·Granted Mar 30, 2004·82 cites·10 claims
- 0793US6303501B1Gas mixing apparatus and methodAPPLIED MATERIALS INC·Filed 2000·Granted Oct 16, 2001·66 cites·23 claims
- 0893US6231674B1Wafer edge deposition eliminationAPPLIED MATERIALS INC·Filed 2000·Granted May 15, 2001·53 cites·27 claims
- 0992US5906683ALid assembly for semiconductor processing chamberAPPLIED MATERIALS INC·Filed 1996·Granted May 25, 1999·129 cites·24 claims
- 1090US8336488B2Multi-station plasma reactor with multiple plasma regionsCHEN AIHUA·Filed 2007·Granted Dec 25, 2012·11 cites·28 claims
- 1190US7429516B2Tungsten nitride atomic layer deposition processesAPPLIED MATERIALS INC·Filed 2006·Granted Sep 30, 2008·12 cites·11 claims
- 1288US5536330AMethod of purging and pumping vacuum chamber to ultra-high vacuumAPPLIED MATERIALS INC·Filed 1995·Granted Jul 16, 1996·57 cites·23 claims
- 1387US7115499B2Cyclical deposition of tungsten nitride for metal oxide gate electrodeAPPLIED MATERIALS INC·Filed 2004·Granted Oct 3, 2006·28 cites·23 claims
- 1487US5691876AHigh temperature polyimide electrostatic chuckAPPLIED MATERIALS INC·Filed 1995·Granted Nov 25, 1997·74 cites·17 claims
- 1584US8715418B2Semiconductor processing system; a semiconductor processing chamber; and a method for loading, unloading and exchanging semiconductor work pieces from a semiconductor processing chamberCHEN AIHUA·Filed 2006·Granted May 6, 2014·10 cites·17 claims
- 1683USD944974SWater flosserSHENZHEN CHENGKANG ZHIHUI MEDICAL CO LTD·Filed 2021·Granted Mar 1, 2022·15 cites·1 claims
- 1783US6033480AWafer edge deposition eliminationAPPLIED MATERIALS INC·Filed 1996·Granted Mar 7, 2000·51 cites·14 claims
- 1881US7335266B2Method of forming a controlled and uniform lightly phosphorous doped silicon filmAPPLIED MATERIALS INC·Filed 2005·Granted Feb 26, 2008·7 cites·6 claims
- 1980US6500266B1Heater temperature uniformity qualification toolAPPLIED MATERIALS INC·Filed 2000·Granted Dec 31, 2002·30 cites·25 claims
- 2080US6068703AGas mixing apparatus and methodAPPLIED MATERIALS INC·Filed 1997·Granted May 30, 2000·51 cites·24 claims
- 2176US6884464B2Methods for forming silicon comprising films using hexachlorodisilane in a single-wafer deposion chamberAPPLIED MATERIALS INC·Filed 2002·Granted Apr 26, 2005·21 cites·20 claims
- 2276US5908334AElectrical connector for power transmission in an electrostatic chuckAPPLIED MATERIALS INC·Filed 1997·Granted Jun 1, 1999·41 cites·12 claims
- 2373US5759287AMethod of purging and passivating a semiconductor processing chamberAPPLIED MATERIALS INC·Filed 1996·Granted Jun 2, 1998·33 cites·4 claims
- 2470US9005552B2Selective CO methanation catalyst, method of producing the same, and apparatus using the sameWATANABE MASAHIRO·Filed 2011·Granted Apr 14, 2015·1 cites·9 claims
- 2568USD1025430SSolar lampCHEN AIHUA·Filed 2024·Granted Apr 30, 2024·2 cites·1 claims
- 2668US9947562B2Method and apparatus for processing semiconductor work piecesCHEN AIHUA·Filed 2011·Granted Apr 17, 2018·2 cites·9 claims
- 2767USD708326SVideo laryngoscopeTAIZHOU HANCHUANG MEDICAL APPARATUS TECHNOLOGY CO LTD·Filed 2012·Granted Jul 1, 2014·17 cites·1 claims
- 2864US7972663B2Method and apparatus for forming a high quality low temperature silicon nitride layerAPPLIED MATERIALS INC·Filed 2003·Granted Jul 5, 2011·7 cites·29 claims
- 2963US5868847AClamp ring for shielding a substrate during film layer depositionAPPLIED MATERIALS INC·Filed 1994·Granted Feb 9, 1999·34 cites·14 claims
- 3062US6982214B2Method of forming a controlled and uniform lightly phosphorous doped silicon filmAPPLIED MATERIALS INC·Filed 2002·Granted Jan 3, 2006·7 cites·15 claims
- 3160US2025207229A1Electrical steelsNUCOR CORP·Filed 2023·Application pending·0 cites
- 3258USD708327SVideo laryngoscopeTAIZHOU HANCHUANG MEDICAL APPARATUS TECHNOLOGY CO LTD·Filed 2012·Granted Jul 1, 2014·12 cites·1 claims
- 3358US6143084AApparatus and method for generating plasmaAPPLIED MATERIALS INC·Filed 1998·Granted Nov 7, 2000·14 cites·52 claims
- 3456US2010029094A1Method and Apparatus for Forming a High Quality Low Temperature Silicon Nitride LayerAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 3547US2007032097A1Method and apparatus for processing semiconductor work piecesADVANCED MICRO FAB EQUIP INC·Filed 2006·Application pending·0 cites
- 3643US2013071318A1Fuel reformer, selective co methanation method, selective co methanation catalyst, and process for producing the sameUNIV YAMANASHI·Filed 2012·Application pending·0 cites
- 3742US2023152129A1Optical Encoder AssemblyGUANGDONG RUIXUN ELECTRONIC TECH CO LTD·Filed 2021·Application pending·0 cites
- 3840US2013061805A1Epitaxial wafer susceptor and supportive and rotational connection apparatus matching the susceptorJiangSu Zhangsheng Semiconductor Equiment Co·Filed 2012·Application pending·0 cites
- 3939US2004266123A1Electron beam treatment of SixNy filmsAPPLIED MATERIALS INC·Filed 2004·Application pending·0 cites
- 4037US2014235940A1S-shaped Visible Hard Intubation CoreWANG WEIDONG·Filed 2012·Application pending·0 cites
- 4136US2003059535A1Cycling deposition of low temperature films in a cold wall single wafer process chamberFiled 2001·Application pending·0 cites
- 4233USD752744SVideo laryngoscopeZHEJIANG YOUYI MEDICAL APPARATUS CO LTD·Filed 2014·Granted Mar 29, 2016·5 cites·1 claims
- 4331US2003124873A1Method of annealing an oxide filmFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →