Inventor · disambiguated record
Alan E. Walter
Also filed as: WALTER ALAN · WALTER ALAN E
10 granted patents·5 pending applications·1,420 citations·filing 1985–2006
94Inventor score
Top patents by PatentIndex Score
15 records- 0196US6348101B1Methods for treating objectsCFMT INC·Filed 2000·Granted Feb 19, 2002·59 cites·27 claims
- 0296US4917123AApparatus for treating wafers with process fluidsCFM TECHNOLOGIES LTD·Filed 1988·Granted Apr 17, 1990·223 cites·24 claims
- 0396US4911761AProcess and apparatus for drying surfacesCFM TECHN RES ASS·Filed 1988·Granted Mar 27, 1990·214 cites·27 claims
- 0495US4984597AApparatus for rinsing and drying surfacesCFM TECHN RES ASS·Filed 1989·Granted Jan 15, 1991·249 cites·20 claims
- 0595US4778532AProcess and apparatus for treating wafers with process fluidsCFM TECHNOLOGIES LTD·Filed 1985·Granted Oct 18, 1988·259 cites·58 claims
- 0694US4899767AMethod and system for fluid treatment of semiconductor wafersCFM TECHNOLOGIES INC·Filed 1988·Granted Feb 13, 1990·137 cites·19 claims
- 0793US6143087AMethods for treating objectsCFMT INC·Filed 1999·Granted Nov 7, 2000·62 cites·23 claims
- 0889US4633893AApparatus for treating semiconductor wafersCFM TECHNOLOGIES LTD·Filed 1985·Granted Jan 6, 1987·102 cites·17 claims
- 0987US4795497AMethod and system for fluid treatment of semiconductor wafersMCCONNELL CHRISTOPHER F·Filed 1985·Granted Jan 3, 1989·86 cites·12 claims
- 1077US6491763B2Processes for treating electronic componentsMATTSON TECHNOLOGY IP·Filed 2001·Granted Dec 10, 2002·29 cites·51 claims
- 1142US2006260638A1Method and system for processing substrates with sonic energy that reduces or eliminates damage to semiconductor devicesFANI PEJMAN·Filed 2006·Application pending·0 cites
- 1242US2006260639A1Method and system for processing substrates with sonic energy that reduces or eliminates damage to semiconductor devicesFANI PEJMAN·Filed 2006·Application pending·0 cites
- 1341US2007094885A1Apparatus and method for removing trace amounts of liquid from substrates during single-substrate processingWALTER ALAN·Filed 2005·Application pending·0 cites
- 1440US2006021634A1Method and apparatus for creating ozonated process solutions having high ozone concentrationLIU ZHI LEWIS·Filed 2005·Application pending·0 cites
- 1540US2006011214A1System and method for pre-gate cleaning of substratesLIU ZHI·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →