Inventor · disambiguated record
Timothy Weidman
Also filed as: WEIDMAN TIMOTHY · WEIDMAN TIMOTHY W · WEIDMAN TIMOTHY WILLIAM
80 granted patents·67 pending applications·4,159 citations·filing 1987–2025
99Inventor score
Top patents by PatentIndex Score
147 records- 0198US12278125B2Integrated dry processes for patterning radiation photoresist patterningLAM RES CORP·Filed 2023·Granted Apr 15, 2025·8 cites·19 claims
- 0298US12183604B2Integrated dry processes for patterning radiation photoresist patterningLAM RES CORP·Filed 2023·Granted Dec 31, 2024·9 cites·37 claims
- 0398US9829805B2Vapor deposition deposited photoresist, and manufacturing and lithography systems thereforAPPLIED MATERIALS INC·Filed 2016·Granted Nov 28, 2017·14 cites·12 claims
- 0498US9632411B2Vapor deposition deposited photoresist, and manufacturing and lithography systems thereforAPPLIED MATERIALS INC·Filed 2013·Granted Apr 25, 2017·26 cites·8 claims
- 0598US8536068B2Atomic layer deposition of photoresist materials and hard mask precursorsWEIDMAN TIMOTHY W·Filed 2011·Granted Sep 17, 2013·373 cites·34 claims
- 0698US8465903B2Radiation patternable CVD filmWEIDMAN TIMOTHY W·Filed 2011·Granted Jun 18, 2013·450 cites·20 claims
- 0798US7825044B2Curing methods for silicon dioxide multi-layersAPPLIED MATERIALS INC·Filed 2010·Granted Nov 2, 2010·55 cites·20 claims
- 0898US7745352B2Curing methods for silicon dioxide thin films deposited from alkoxysilane precursor with harp II processAPPLIED MATERIALS INC·Filed 2007·Granted Jun 29, 2010·57 cites·19 claims
- 0998US7465358B2Measurement techniques for controlling aspects of a electroless deposition processAPPLIED MATERIALS INC·Filed 2004·Granted Dec 16, 2008·235 cites·1 claims
- 1098US6573030B1Method for depositing an amorphous carbon layerAPPLIED MATERIALS INC·Filed 2000·Granted Jun 3, 2003·1.3k cites·129 claims
- 1197US12105422B2Photoresist development with halide chemistriesLAM RES CORP·Filed 2020·Granted Oct 1, 2024·13 cites·12 claims
- 1297US7951637B2Back contact solar cells using printed dielectric barrierAPPLIED MATERIALS INC·Filed 2009·Granted May 31, 2011·68 cites·19 claims
- 1397US7438949B2Ruthenium containing layer deposition methodAPPLIED MATERIALS INC·Filed 2005·Granted Oct 21, 2008·49 cites·21 claims
- 1497US7256139B2Methods and apparatus for e-beam treatment used to fabricate integrated circuit devicesAPPLIED MATERIALS INC·Filed 2005·Granted Aug 14, 2007·46 cites·19 claims
- 1597US6936551B2Methods and apparatus for E-beam treatment used to fabricate integrated circuit devicesAPPLIED MATERIALS INC·Filed 2003·Granted Aug 30, 2005·52 cites·36 claims
- 1697US6583071B1Ultrasonic spray coating of liquid precursor for low K dielectric coatingsAPPLIED MATERIALS INC·Filed 2000·Granted Jun 24, 2003·146 cites·14 claims
- 1796US12346035B2Process tool for dry removal of photoresistLAM RES CORP·Filed 2023·Granted Jul 1, 2025·6 cites·21 claims
- 1896US9502601B1Metallization of solar cells with differentiated P-type and N-type region architecturesSMITH DAVID D·Filed 2016·Granted Nov 22, 2016·11 cites·20 claims
- 1996US9263625B2Solar cell emitter region fabrication using ion implantationSMITH DAVID D·Filed 2014·Granted Feb 16, 2016·20 cites·16 claims
- 2096US6780753B2Airgap for semiconductor devicesAPPLIED MATERIALS INC·Filed 2002·Granted Aug 24, 2004·126 cites·18 claims
- 2195US12510825B2Photoresist development with halide chemistriesLAM RES CORP·Filed 2024·Granted Dec 30, 2025·2 cites·33 claims
- 2295US12510826B2Photoresist development with halide chemistriesLAM RES CORP·Filed 2024·Granted Dec 30, 2025·2 cites·12 claims
- 2395US12504692B2Cyclic development of metal oxide based photoresist for etch stop deterrenceLAM RES CORP·Filed 2023·Granted Dec 23, 2025·2 cites·28 claims
- 2495US8821986B2Activated silicon precursors for low temperature depositionWEIDMAN TIMOTHY W·Filed 2012·Granted Sep 2, 2014·19 cites·20 claims
- 2595US7514353B2Contact metallization scheme using a barrier layer over a silicide layerAPPLIED MATERIALS INC·Filed 2006·Granted Apr 7, 2009·37 cites·33 claims
- 2695US7335462B2Method of depositing an amorphous carbon layerAPPLIED MATERIALS INC·Filed 2007·Granted Feb 26, 2008·24 cites·20 claims
- 2795US6841341B2Method of depositing an amorphous carbon layerAPPLIED MATERIALS INC·Filed 2002·Granted Jan 11, 2005·78 cites·19 claims
- 2894US8183081B2Hybrid heterojunction solar cell fabrication using a metal layer maskWEIDMAN TIMOTHY W·Filed 2009·Granted May 22, 2012·23 cites·15 claims
- 2994US7888168B2Solar cell contact formation process using a patterned etchant materialAPPLIED MATERIALS INC·Filed 2008·Granted Feb 15, 2011·22 cites·23 claims
- 3093US7223526B2Method of depositing an amorphous carbon layerAPPLIED MATERIALS INC·Filed 2004·Granted May 29, 2007·50 cites·20 claims
- 3192US7659203B2Electroless deposition process on a silicon contactAPPLIED MATERIALS INC·Filed 2006·Granted Feb 9, 2010·16 cites·41 claims
- 3292US7651934B2Process for electroless copper depositionAPPLIED MATERIALS INC·Filed 2006·Granted Jan 26, 2010·25 cites·41 claims
- 3392US6875687B1Capping layer for extreme low dielectric constant filmsAPPLIED MATERIALS INC·Filed 2000·Granted Apr 5, 2005·113 cites·54 claims
- 3491US12211691B2Dry development of resistsLAM RES CORP·Filed 2019·Granted Jan 28, 2025·8 cites·12 claims
- 3591US9716205B2Solar cell emitter region fabrication using ion implantationWEIDMAN TIMOTHY·Filed 2016·Granted Jul 25, 2017·6 cites·11 claims
- 3691US8440571B2Methods for deposition of silicon carbide and silicon carbonitride filmsWEIDMAN TIMOTHY W·Filed 2011·Granted May 14, 2013·15 cites·15 claims
- 3791US8309446B2Hybrid heterojunction solar cell fabrication using a doping layer maskWEIDMAN TIMOTHY W·Filed 2009·Granted Nov 13, 2012·15 cites·21 claims
- 3891US8207005B2Forming solar cells using a patterned deposition processWEIDMAN TIMOTHY W·Filed 2011·Granted Jun 26, 2012·12 cites·17 claims
- 3991US7381052B2Apparatus and method for heating substratesAPPLIED MATERIALS INC·Filed 2006·Granted Jun 3, 2008·14 cites·7 claims
- 4090US8308858B2Electroless deposition process on a silicon contactSTEWART MICHAEL P·Filed 2010·Granted Nov 13, 2012·11 cites·16 claims
- 4190US7947561B2Methods for oxidation of a semiconductor deviceAPPLIED MATERIALS INC·Filed 2009·Granted May 24, 2011·14 cites·18 claims
- 4290US7226853B2Method of forming a dual damascene structure utilizing a three layer hard mask structureAPPLIED MATERIALS INC·Filed 2002·Granted Jun 5, 2007·51 cites·27 claims
- 4389US7827930B2Apparatus for electroless deposition of metals onto semiconductor substratesAPPLIED MATERIALS INC·Filed 2005·Granted Nov 9, 2010·17 cites·21 claims
- 4489US6592980B1Mesoporous films having reduced dielectric constantsAIR PROD & CHEM·Filed 2000·Granted Jul 15, 2003·39 cites·6 claims
- 4588US12436464B2Pre-exposure photoresist curing to enhance EUV lithographic performanceLAM RES CORP·Filed 2021·Granted Oct 7, 2025·2 cites·25 claims
- 4688US11921427B2Methods for making hard masks useful in next-generation lithographyLAM RES CORP·Filed 2019·Granted Mar 5, 2024·4 cites·42 claims
- 4787US8129212B2Surface cleaning and texturing process for crystalline solar cellsWIJEKOON KAPILA·Filed 2009·Granted Mar 6, 2012·14 cites·31 claims
- 4886US9401450B2Solar cell emitter region fabrication using ion implantationSUNPOWER CORP·Filed 2014·Granted Jul 26, 2016·4 cites·6 claims
- 4986US7547569B2Method for patterning Mo layer in a photovoltaic device comprising CIGS material using an etch processAPPLIED MATERIALS INC·Filed 2006·Granted Jun 16, 2009·8 cites·14 claims
- 5086US7273813B2Wafer cleaning solution for cobalt electroless applicationAPPLIED MATERIALS INC·Filed 2005·Granted Sep 25, 2007·11 cites·12 claims
Showing the top 50 of 147 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →