Inventor · disambiguated record
Nobuyuki Negishi
Also filed as: NEGISHI NOBUYUKI
13 granted patents·12 pending applications·298 citations·filing 1994–2018
93Inventor score
Top patents by PatentIndex Score
25 records- 0191US5525911AVertical probe tester card with coaxial probesTOKYO ELECTRON LTD·Filed 1994·Granted Jun 11, 1996·116 cites·17 claims
- 0289US6551445B1Plasma processing system and method for manufacturing a semiconductor device by using the sameHITACHI LTD·Filed 2000·Granted Apr 22, 2003·50 cites·32 claims
- 0387US9099349B2Semiconductor device manufacturing methodHITACHI HIGH TECH CORP·Filed 2013·Granted Aug 4, 2015·8 cites·10 claims
- 0487US6842658B2Method of manufacturing a semiconductor device and manufacturing systemHITACHI LTD·Filed 2001·Granted Jan 11, 2005·40 cites·6 claims
- 0586US9960014B2Plasma etching methodHITACHI HIGH TECH CORP·Filed 2016·Granted May 1, 2018·4 cites·14 claims
- 0685US10418224B2Plasma etching methodHITACHI HIGH TECH CORP·Filed 2018·Granted Sep 17, 2019·3 cites·8 claims
- 0780US6475918B1Plasma treatment apparatus and plasma treatment methodHITACHI LTD·Filed 2000·Granted Nov 5, 2002·24 cites·21 claims
- 0874US6645870B2Process for fabricating semiconductor deviceHITACHI LTD·Filed 2001·Granted Nov 11, 2003·16 cites·14 claims
- 0965US7585776B2Dry etching method of insulating filmHITACHI HIGH TECH CORP·Filed 2007·Granted Sep 8, 2009·2 cites·9 claims
- 1064US8747763B2Plasma sterilization apparatusTANDOU TAKUMI·Filed 2012·Granted Jun 10, 2014·2 cites·7 claims
- 1163US7371690B2Dry etching method and apparatusHITACHI HIGH TECH CORP·Filed 2004·Granted May 13, 2008·8 cites·14 claims
- 1258US7372582B2Method for fabrication semiconductor deviceHITACHI LTD·Filed 2002·Granted May 13, 2008·6 cites·13 claims
- 1356US6573190B1Dry etching device and dry etching methodHITACHI LTD·Filed 1999·Granted Jun 3, 2003·19 cites·12 claims
- 1455US2009181545A1Dry-etching method and apparatusNEGISHI NOBUYUKI·Filed 2009·Application pending·0 cites
- 1552US2010025369A1Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2008·Application pending·0 cites
- 1650US2013087285A1Plasma etching apparatusKOFUJI NAOYUKI·Filed 2012·Application pending·0 cites
- 1748US2004228774A1Microreactor, its production method, and sample screening deviceHITACHI LTD·Filed 2003·Application pending·0 cites
- 1847US2005284571A1Dry-etching method and apparatusNEGISHI NOBUYUKI·Filed 2005·Application pending·0 cites
- 1942US2010297849A1Plasma etching method for etching an objectMIYAKE MASATOSHI·Filed 2009·Application pending·0 cites
- 2038US2004058554A1Dry etching methodFiled 2003·Application pending·0 cites
- 2138US2011030899A1Plasma processing apparatus using transmission electrodeSUZUKI KEIZO·Filed 2010·Application pending·0 cites
- 2238US2013202479A1Plasma sterilizer, plasma sterilization system, and plasma sterilization methodTANDOU TAKUMI·Filed 2010·Application pending·0 cites
- 2335US2007181528A1Method of etching treatmentKOROYASU KUNIHIKO·Filed 2006·Application pending·0 cites
- 2434US2011253313A1Plasma processing apparatus using transmission electrodeHITACHI HIGH TECH CORP·Filed 2010·Application pending·0 cites
- 2530US2002020494A1Plasma processing system and methodFiled 1999·Application pending·0 cites
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