Inventor · disambiguated record
Scott Coston
Also filed as: COSTON SCOTT · COSTON SCOTT D · COSTON SCOTT DOUGLAS
13 granted patents·4 pending applications·97 citations·filing 2002–2022
91Inventor score
Top patents by PatentIndex Score
17 records- 0184US10466601B2Alignment sensor for lithographic apparatusASML NETHERLANDS BV·Filed 2016·Granted Nov 5, 2019·5 cites·20 claims
- 0283US6813003B2Advanced illumination system for use in microlithographyFiled 2002·Granted Nov 2, 2004·18 cites·96 claims
- 0380US7006295B2Illumination system and method for efficiently illuminating a pattern generatorASML HOLDING NV·Filed 2004·Granted Feb 28, 2006·15 cites·23 claims
- 0477US8164740B2Illumination system coherence remover with two sets of stepped mirrorsVISSER HUIBERT·Filed 2008·Granted Apr 24, 2012·4 cites·14 claims
- 0575US6775069B2Advanced illumination system for use in microlithographyASML HOLDING NV·Filed 2002·Granted Aug 10, 2004·18 cites·18 claims
- 0674US7187430B2Advanced illumination system for use in microlithographyASML HOLDING NV·Filed 2004·Granted Mar 6, 2007·10 cites·30 claims
- 0770US7158307B2Efficiently illuminating a modulating deviceASML HOLDING NV·Filed 2006·Granted Jan 2, 2007·4 cites·18 claims
- 0869US7079321B2Illumination system and method allowing for varying of both field height and pupilASML HOLDING NV·Filed 2004·Granted Jul 18, 2006·10 cites·23 claims
- 0968US8013979B2Illumination system with low telecentricity error and dynamic telecentricity correctionASML HOLDING NV·Filed 2007·Granted Sep 6, 2011·2 cites·25 claims
- 1063US6888615B2System and method for improving linewidth control in a lithography device by varying the angular distribution of light in an illuminator as a function of field positionASML HOLDING NV·Filed 2002·Granted May 3, 2005·9 cites·27 claims
- 1157US2024201486A1Controlling aberration in an optical system, a metrology system, lithographic apparatus, and methods thereofASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 1255US8159651B2Illumination system coherence remover with a series of partially reflective surfacesVISSER HUIBERT·Filed 2008·Granted Apr 17, 2012·0 cites·10 claims
- 1353US2007146674A1Advanced Illumination System for Use in MicrolithographyASML HOLDING NV·Filed 2007·Application pending·0 cites
- 1453US2007247606A1Illumination systemASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 1548US6784976B2System and method for improving line width control in a lithography device using an illumination system having pre-numerical aperture controlASML HOLDING NV·Filed 2002·Granted Aug 31, 2004·2 cites·33 claims
- 1646US2007127005A1Illumination systemASML NETHERLANDS BV·Filed 2005·Application pending·0 cites
- 1742US8164739B2Controlling fluctuations in pointing, positioning, size or divergence errors of a beam of light for optical apparatusCOSTON SCOTT D·Filed 2008·Granted Apr 24, 2012·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →