Inventor · disambiguated record
Toyohisa Tsuruda
Also filed as: TSURUDA TOYOHISA
21 granted patents·10 pending applications·13 citations·filing 2008–2025
89Inventor score
Top patents by PatentIndex Score
31 records- 0191US12123778B2Thermal imaging sensor for integration into track systemTOKYO ELECTRON LTD·Filed 2021·Granted Oct 22, 2024·2 cites·13 claims
- 0289US12051189B2Estimation model creation device, estimation model creation method, and storage mediumTOKYO ELECTRON LTD·Filed 2021·Granted Jul 30, 2024·1 cites·13 claims
- 0380US12406350B2Estimation model creation device, estimation model creation method, and storage mediumTOKYO ELECTRON LTD·Filed 2024·Granted Sep 2, 2025·0 cites·17 claims
- 0479US8801891B2Substrate warpage removal apparatus and substrate processing apparatusTSURUDA TOYOHISA·Filed 2012·Granted Aug 12, 2014·6 cites·2 claims
- 0572US12300526B2Substrate processing control method, substrate processing apparatus and storage mediumTOKYO ELECTRON LTD·Filed 2023·Granted May 13, 2025·0 cites·19 claims
- 0669US10211050B2Method for photo-lithographic processing in semiconductor device manufacturingTOKYO ELECTRON LTD·Filed 2016·Granted Feb 19, 2019·1 cites·4 claims
- 0766US10937673B2Substrate processing apparatus, substrate processing method and recording mediumTOKYO ELECTRON LTD·Filed 2018·Granted Mar 2, 2021·1 cites·14 claims
- 0866US2025146807A1Information processing apparatus, information processing method and computer-readable recording mediumTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0964US8455183B2Resist pattern slimming treatment methodTSURUDA TOYOHISA·Filed 2010·Granted Jun 4, 2013·2 cites·3 claims
- 1062US12228390B2Information processing apparatus, information processing method and computer-readable recording mediumTOKYO ELECTRON LTD·Filed 2021·Granted Feb 18, 2025·0 cites·17 claims
- 1162US2024404042A1Shape characteristic value estimation apparatus, shape characteristic value estimation method, and storage mediumTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1259US11862496B2Substrate processing control method, substrate processing apparatus and storage mediumTOKYO ELECTRON LTD·Filed 2020·Granted Jan 2, 2024·0 cites·5 claims
- 1357US2023149973A1Control parameter setting method, substrate processing apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1456US12467742B2Film thickness analysis method, film thickness analysis device and storage mediumTOKYO ELECTRON LTD·Filed 2022·Granted Nov 11, 2025·0 cites·12 claims
- 1555US2025298400A1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1654US2024096656A1Etching control system and etching control methodTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1754US2024096658A1Etching control device, etching control method, and etching control systemTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1854US2024096657A1Etching control system and etching control methodTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1953US12442635B2Substrate processing apparatus, substrate processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2022·Granted Oct 14, 2025·0 cites·9 claims
- 2053US11703459B2System and method to calibrate a plurality of wafer inspection system (WIS) modulesTOKYO ELECTRON LTD·Filed 2020·Granted Jul 18, 2023·0 cites·23 claims
- 2153US10023477B2Treatment solution supply method, treatment solution supply apparatus, and non-transitory computer-readable recording mediumTOKYO ELECTRON LTD·Filed 2015·Granted Jul 17, 2018·0 cites·15 claims
- 2253US2009029046A1Substrate processing apparatus, method for processing substrate, and storage mediumTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 2351US11555691B2Substrate inspection system, substrate inspection method and recording mediumTOKYO ELECTRON LTD·Filed 2020·Granted Jan 17, 2023·0 cites·11 claims
- 2450US11876022B2Substrate treatment method and substrate treatment systemTOKYO ELECTRON LTD·Filed 2020·Granted Jan 16, 2024·0 cites·16 claims
- 2550US11636579B2Information processing method, information processing apparatus and computer-readable recording mediumTOKYO ELECTRON LTD·Filed 2021·Granted Apr 25, 2023·0 cites·15 claims
- 2650US11544864B2Shape characteristic value estimation apparatus, shape characteristic value estimation method, and storage mediumTOKYO ELECTRON LTD·Filed 2020·Granted Jan 3, 2023·0 cites·7 claims
- 2749US11461885B2Substrate inspection method, substrate inspection system, and control apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Oct 4, 2022·0 cites·14 claims
- 2845US2016049292A1Semiconductor Device Manufacturing MethodTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 2942US10248030B2Process recipe evaluation method, storage medium, assisting device for process recipe evaluation, and liquid processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Apr 2, 2019·0 cites·9 claims
- 3041US8992687B2Substrate processing apparatus, method for processing substrate, and storage mediumKUDOH HIROYUKI·Filed 2011·Granted Mar 31, 2015·0 cites·9 claims
- 3137US2010291491A1Resist pattern slimming treatment methodTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →