Inventor · disambiguated record
Ryoichi Inanami
Also filed as: INANAMI RYOICHI
35 granted patents·20 pending applications·165 citations·filing 2001–2016
96Inventor score
Top patents by PatentIndex Score
55 records- 0192US8227151B2Flare correction method, method for manufacturing mask for lithography, and method for manufacturing semiconductor deviceINANAMI RYOICHI·Filed 2010·Granted Jul 24, 2012·10 cites·12 claims
- 0289US7449700B2Electron beam exposure apparatus, electron beam exposure method and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2006·Granted Nov 11, 2008·17 cites·20 claims
- 0388US8560977B2Drop recipe creating method, database creating method and mediumMATSUOKA YASUO·Filed 2011·Granted Oct 15, 2013·8 cites·3 claims
- 0487US8444889B2Imprint pattern forming methodTOKUE HIROSHI·Filed 2010·Granted May 21, 2013·7 cites·13 claims
- 0587US6560768B2Circuit pattern design method, circuit pattern design system, and recording mediumTOSHIBA KK·Filed 2001·Granted May 6, 2003·28 cites·18 claims
- 0685US9021983B2Stage apparatus and process apparatusINANAMI RYOICHI·Filed 2012·Granted May 5, 2015·7 cites·18 claims
- 0783US8468480B2Method of designing a template pattern, method of manufacturing a template and method of manufacturing a semiconductor deviceINANAMI RYOICHI·Filed 2010·Granted Jun 18, 2013·8 cites·13 claims
- 0882US8227267B2Template inspection method and manufacturing method for semiconductor deviceYONEDA IKUO·Filed 2009·Granted Jul 24, 2012·7 cites·8 claims
- 0978US8740377B2Imprint recipe creating device and imprint deviceMIKAMI SHINJI·Filed 2011·Granted Jun 3, 2014·4 cites·4 claims
- 1075US8420422B2Pattern forming method, processing method, and processing apparatusASANO MASAFUMI·Filed 2011·Granted Apr 16, 2013·4 cites·3 claims
- 1175US6543044B2Method of extracting characters and computer-readable recording mediumTOSHIBA KK·Filed 2001·Granted Apr 1, 2003·11 cites·15 claims
- 1274US8647106B2Template and method of manufacturing a semiconductor deviceINANAMI RYOICHI·Filed 2010·Granted Feb 11, 2014·4 cites·12 claims
- 1374US7683352B2Electron beam writing data creating method and electron beam writing data creating apparatusTOSHIBA KK·Filed 2007·Granted Mar 23, 2010·3 cites·11 claims
- 1473US6718532B2Charged particle beam exposure system using aperture mask in semiconductor manufactureTOSHIBA KK·Filed 2002·Granted Apr 6, 2004·10 cites·5 claims
- 1572US8392855B2Transferring pattern onto semiconductor substrate using optimum transfer condition determined for each divided areaMORINAGA HIROYUKI·Filed 2011·Granted Mar 5, 2013·4 cites·12 claims
- 1672US7079994B2Method and system for producing semiconductor devicesTOSHIBA KK·Filed 2001·Granted Jul 18, 2006·5 cites·5 claims
- 1771USRE46901EDrop recipe creating method, database creating method and mediumTOSHIBA MEMORY CORP·Filed 2015·Granted Jun 19, 2018·1 cites·35 claims
- 1871US6756159B2Method of preparing exposure data and method of preparing aperture mask dataTOSHIBA KK·Filed 2002·Granted Jun 29, 2004·8 cites·4 claims
- 1971US6481004B2Circuit pattern design method, exposure method, charged-particle beam exposure systemTOSHIBA KK·Filed 2001·Granted Nov 12, 2002·9 cites·8 claims
- 2069US7102147B2Charged particle beam exposure method and method for producing charged particle beam exposure dataTOSHIBA KK·Filed 2002·Granted Sep 5, 2006·8 cites·33 claims
- 2166US7368737B2Electron beam writing method, electron beam writing apparatus and semiconductor device manufacturing methodTOSHIBA KK·Filed 2006·Granted May 6, 2008·2 cites·12 claims
- 2265USRE47093EImprint pattern forming methodTOSHIBA MEMORY CORP·Filed 2016·Granted Oct 23, 2018·0 cites·53 claims
- 2361USRE46191EImprint pattern forming methodTOSHIBA KK·Filed 2015·Granted Nov 1, 2016·0 cites·30 claims
- 2456USRE48815EMethod of designing a template pattern, method of manufacturing a template and method of manufacturing a semiconductor deviceKIOXIA CORP·Filed 2015·Granted Nov 9, 2021·0 cites·27 claims
- 2556US8071263B2Reflective mask and manufacturing method for reflective maskINANAMI RYOICHI·Filed 2009·Granted Dec 6, 2011·0 cites·18 claims
- 2654US7914958B2Semiconductor device manufacturing methodTOSHIBA KK·Filed 2009·Granted Mar 29, 2011·0 cites·16 claims
- 2753US9329490B2Pattern formation method, mask for exposure, and exposure apparatusTOSHIBA KK·Filed 2013·Granted May 3, 2016·0 cites·19 claims
- 2851US2009206280A1Charged-beam exposure apparatus having an improved alignment precision and exposure methodKOSHIBA TAKESHI·Filed 2009·Application pending·0 cites
- 2951US2010164146A1Imprinting mold and pattern formation methodFURUTONO YOHKO·Filed 2009·Application pending·0 cites
- 3050US7972932B2Mark forming method and method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2009·Granted Jul 5, 2011·0 cites·17 claims
- 3150US7459705B2Charged particle beam exposure method of character projection system, charged particle beam exposure device of character projection system, program for use in charged particle beam exposure device, and manufacturing method of semiconductor deviceTOSHIBA KK·Filed 2006·Granted Dec 2, 2008·0 cites·16 claims
- 3250US2009305165A1Wafer exposing method, euv exposing apparatus, and eb exposing apparatusINANAMI RYOICHI·Filed 2009·Application pending·0 cites
- 3350US2012040293A1Reflective mask, manufacturing method for reflective mask, and manufacturing method for semiconductor deviceINANAMI RYOICHI·Filed 2011·Application pending·0 cites
- 3449USRE47271EImprint recipe creating device and imprint deviceTOSHIBA MEMORY CORP·Filed 2016·Granted Mar 5, 2019·0 cites·25 claims
- 3548USRE46390EPattern forming method, processing method, and processing apparatusTOSHIBA KK·Filed 2015·Granted May 2, 2017·0 cites·36 claims
- 3647US2015253659A1Mask and pattern forming methodTOSHIBA KK·Filed 2014·Application pending·0 cites
- 3746US2015053867A1Pattern formation method, mask for pattern formation, method for manufacturing mask, and pattern formation apparatusTOSHIBA KK·Filed 2013·Application pending·0 cites
- 3845US9957630B2Pattern transfer mold and pattern formation methodTOSHIBA KK·Filed 2014·Granted May 1, 2018·0 cites·20 claims
- 3944US2013077066A1Pattern forming apparatusINANAMI RYOICHI·Filed 2012·Application pending·0 cites
- 4042US9188879B2Substrate holding apparatus, pattern transfer apparatus, and pattern transfer methodKASA KENTARO·Filed 2012·Granted Nov 17, 2015·0 cites·20 claims
- 4142US7301161B2Method of producing electron beam writing data, program of producing electron beam writing data, and electron beam writing apparatusTOSHIBA KK·Filed 2005·Granted Nov 27, 2007·0 cites·20 claims
- 4242US2012049417A1Imprint apparatus and imprint methodINANAMI RYOICHI·Filed 2011·Application pending·0 cites
- 4341US8728711B2Cleaning reticle, method for cleaning reticle stage, and method for manufacturing semiconductor deviceNAKAJIMA YUMI·Filed 2010·Granted May 20, 2014·0 cites·8 claims
- 4441US2012129279A1Imprinting method, imprinting apparatus and mediumMATSUOKA YASUO·Filed 2011·Application pending·0 cites
- 4540US2012072003A1Imprinting method, semiconductor integrated circuit manufacturing method and drop recipe creating methodMATSUOKA YASUO·Filed 2011·Application pending·0 cites
- 4640US2013080991A1Pattern forming apparatusINANAMI RYOICHI·Filed 2012·Application pending·0 cites
- 4739US2010264113A1Template, method of manufacturing the same, and method of forming patternYONEDA IKUO·Filed 2010·Application pending·0 cites
- 4839US2008121709A1Semiconductor Chip With Identification Codes, Manufacturing Method Of The Chip And Semiconductor Chip Management SystemTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 4938US2010308485A1Pattern forming apparatus and pattern forming methodINANAMI RYOICHI·Filed 2010·Application pending·0 cites
- 5038US2012214272A1Method of manufacturing organic thin film solar cellAZUMA TSUKASA·Filed 2011·Application pending·0 cites
Showing the top 50 of 55 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →