Assignee
INANAMI RYOICHI
JP·5 granted patents·6 pending applications·29 citations·filing 2009–2012
Top patents by PatentIndex Score
11 records- 0192US8227151B2Flare correction method, method for manufacturing mask for lithography, and method for manufacturing semiconductor deviceINANAMI RYOICHI·Filed 2010·Granted Jul 24, 2012·10 cites·12 claims
- 0285US9021983B2Stage apparatus and process apparatusINANAMI RYOICHI·Filed 2012·Granted May 5, 2015·7 cites·18 claims
- 0383US8468480B2Method of designing a template pattern, method of manufacturing a template and method of manufacturing a semiconductor deviceINANAMI RYOICHI·Filed 2010·Granted Jun 18, 2013·8 cites·13 claims
- 0474US8647106B2Template and method of manufacturing a semiconductor deviceINANAMI RYOICHI·Filed 2010·Granted Feb 11, 2014·4 cites·12 claims
- 0556US8071263B2Reflective mask and manufacturing method for reflective maskINANAMI RYOICHI·Filed 2009·Granted Dec 6, 2011·0 cites·18 claims
- 0650US2009305165A1Wafer exposing method, euv exposing apparatus, and eb exposing apparatusINANAMI RYOICHI·Filed 2009·Application pending·0 cites
- 0750US2012040293A1Reflective mask, manufacturing method for reflective mask, and manufacturing method for semiconductor deviceINANAMI RYOICHI·Filed 2011·Application pending·0 cites
- 0844US2013077066A1Pattern forming apparatusINANAMI RYOICHI·Filed 2012·Application pending·0 cites
- 0942US2012049417A1Imprint apparatus and imprint methodINANAMI RYOICHI·Filed 2011·Application pending·0 cites
- 1040US2013080991A1Pattern forming apparatusINANAMI RYOICHI·Filed 2012·Application pending·0 cites
- 1138US2010308485A1Pattern forming apparatus and pattern forming methodINANAMI RYOICHI·Filed 2010·Application pending·0 cites
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