Inventor · disambiguated record
Marcel Mathijs Theodore Marie Dierichs
Also filed as: DIERICHS MARCEL · DIERICHS MARCEL MATHIJS T M · DIERICHS MARCEL MATHIJS THEODO · DIERICHS MARCEL MATHIJS THEODOR
62 granted patents·8 pending applications·946 citations·filing 2001–2019
99Inventor score
Files withASML NETHERLANDS BV55DIERICHS MARCEL MATHIJS THEODORE MARIE6STREEFKERK BOB3BAKKER LEVINUS PIETER1CLAESSENS BERT JAN1
Top patents by PatentIndex Score
70 records- 0198US7733459B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Jun 8, 2010·66 cites·50 claims
- 0297US9952515B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2015·Granted Apr 24, 2018·6 cites·20 claims
- 0397US7326522B2Device manufacturing method and a substrateASML NETHERLANDS BV·Filed 2004·Granted Feb 5, 2008·97 cites·20 claims
- 0497US7317504B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Jan 8, 2008·114 cites·24 claims
- 0597US6927004B2Mask for use in lithography, method of making a mask, lithographic apparatus, and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Aug 9, 2005·100 cites·17 claims
- 0696US9134623B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted Sep 15, 2015·8 cites·21 claims
- 0796US9134622B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Sep 15, 2015·9 cites·29 claims
- 0896US8634056B2Lithographic apparatus and device manufacturing methodSTREEFKERK BOB·Filed 2011·Granted Jan 21, 2014·10 cites·21 claims
- 0996US7684008B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Mar 23, 2010·58 cites·69 claims
- 1096US7528929B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted May 5, 2009·46 cites·35 claims
- 1196US6737662B2Lithographic apparatus, device manufacturing method, device manufactured thereby, control system, computer program, and computer program productASML NETHERLANDS BV·Filed 2002·Granted May 18, 2004·109 cites·23 claims
- 1295US10345712B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Jul 9, 2019·3 cites·20 claims
- 1395US8629971B2Lithographic apparatus and device manufacturing methodDIERICHS MARCEL MATHIJS THEODORE MARIE·Filed 2010·Granted Jan 14, 2014·9 cites·20 claims
- 1494US8129702B2Radiation system with contamination barrierBAKKER LEVINUS PIETER·Filed 2010·Granted Mar 6, 2012·10 cites·3 claims
- 1593US9581914B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2015·Granted Feb 28, 2017·5 cites·21 claims
- 1693US9025127B2Lithographic apparatus and device manufacturing methodDIERICHS MARCEL MATHIJS THEODORE MARIE·Filed 2011·Granted May 5, 2015·6 cites·22 claims
- 1793US8953144B2Lithographic apparatus and device manufacturing methodDIERICHS MARCEL MATHIJS THEODORE MARIE·Filed 2011·Granted Feb 10, 2015·6 cites·22 claims
- 1893US7473907B2Illumination system for a wavelength of ≦ 193 nm, with sensors for determining an illuminationZEISS CARL SMT AG·Filed 2005·Granted Jan 6, 2009·26 cites·29 claims
- 1992US8547519B2Lithographic apparatus and device manufacturing methodSTREEFKERK BOB·Filed 2009·Granted Oct 1, 2013·8 cites·18 claims
- 2088US7259827B2Diffuser unit, lithographic apparatus, method for homogenizing a beam of radiation, a device manufacturing method and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted Aug 21, 2007·29 cites·42 claims
- 2186US8363208B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2010·Granted Jan 29, 2013·3 cites·19 claims
- 2284US7737425B2Contamination barrier with expandable lamellasASML NETHERLANDS BV·Filed 2007·Granted Jun 15, 2010·5 cites·21 claims
- 2383US7247866B2Contamination barrier with expandable lamellasASML NETHERLANDS BV·Filed 2003·Granted Jul 24, 2007·16 cites·21 claims
- 2483US7148952B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Dec 12, 2006·24 cites·20 claims
- 2582US7175968B2Lithographic apparatus, device manufacturing method and a substrateASML NETHERLANDS BV·Filed 2004·Granted Feb 13, 2007·15 cites·35 claims
- 2680US7697116B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Apr 13, 2010·4 cites·16 claims
- 2778US8508716B2HomogenizerCLAESSENS BERT JAN·Filed 2010·Granted Aug 13, 2013·5 cites·11 claims
- 2876US7170587B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Jan 30, 2007·11 cites·20 claims
- 2976US6771352B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Aug 3, 2004·14 cites·12 claims
- 3075US7224430B2Optical component, optical system including such an optical component, lithographic apparatus, method of correcting apodization in an optical system, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted May 29, 2007·12 cites·18 claims
- 3175US6710856B2Method of operating a lithographic apparatus, lithographic apparatus, method of manufacturing a device, and device manufactured therebyASML NETHERLANDS BV·Filed 2001·Granted Mar 23, 2004·17 cites·26 claims
- 3274US7808611B2Lithographic apparatus and device manufacturing method using acidic liquidASML NETHERLANDS BV·Filed 2006·Granted Oct 5, 2010·3 cites·78 claims
- 3373US7804574B2Lithographic apparatus and device manufacturing method using acidic liquidASML NETHERLANDS BV·Filed 2004·Granted Sep 28, 2010·10 cites·49 claims
- 3473US7362413B2Uniformity correction for lithographic apparatusASML NETHERLANDS BV·Filed 2004·Granted Apr 22, 2008·12 cites·32 claims
- 3573US7333178B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Feb 19, 2008·3 cites·20 claims
- 3672US7277158B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Oct 2, 2007·11 cites·21 claims
- 3771US2019324374A1Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2019·Application pending·0 cites
- 3869US7206059B2Stationary and dynamic radial transverse electric polarizer for high numerical aperture systemsASML NETHERLANDS BV·Filed 2004·Granted Apr 17, 2007·9 cites·11 claims
- 3968US2017139333A1Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2017·Application pending·0 cites
- 4067US2019086819A1Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Application pending·0 cites
- 4165US9606448B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Mar 28, 2017·2 cites·39 claims
- 4265US7113261B2Radiation system, lithographic apparatus, device manufacturing method and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted Sep 26, 2006·8 cites·11 claims
- 4363US8208123B2Lithographic apparatus and device manufacturing methodLOOPSTRA ERIK ROELOF·Filed 2004·Granted Jun 26, 2012·6 cites·40 claims
- 4462US8252487B2Device manufacturing method and mask for use thereinDIERICHS MARCEL MATHIJS THEODORE MARIE·Filed 2003·Granted Aug 28, 2012·6 cites·14 claims
- 4561US7042550B2Device manufacturing method and computer programASML NETHERLANDS BV·Filed 2003·Granted May 9, 2006·8 cites·19 claims
- 4659US9964858B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2015·Granted May 8, 2018·0 cites·20 claims
- 4759US7763355B2Device manufacturing method, top coat material and substrateASML NETHERLANDS BV·Filed 2008·Granted Jul 27, 2010·0 cites·19 claims
- 4858US7023524B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Apr 4, 2006·5 cites·13 claims
- 4958US6987275B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Jan 17, 2006·6 cites·24 claims
- 5056US7894040B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Feb 22, 2011·3 cites·38 claims
Showing the top 50 of 70 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →