Inventor · disambiguated record
Kevin Anglin
Also filed as: ANGLIN KEVIN · ANGLIN KEVIN R
19 granted patents·8 pending applications·43 citations·filing 2014–2023
91Inventor score
Files withVARIAN SEMICONDUCTOR EQUIPMENT ASS INC16APPLIED MATERIALS INC9VARIAN SEMICONDUCTOR EQUIPMENT2
Top patents by PatentIndex Score
27 records- 0194US10879055B2Techniques, system and apparatus for selective deposition of a layer using angled ionsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Dec 29, 2020·12 cites·18 claims
- 0294US9287148B1Dynamic heating method and system for wafer processingVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2014·Granted Mar 15, 2016·17 cites·15 claims
- 0384US10522330B2In-situ plasma cleaning of process chamber componentsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Dec 31, 2019·3 cites·8 claims
- 0482US11646213B2Multi-zone platen temperature controlAPPLIED MATERIALS INC·Filed 2020·Granted May 9, 2023·1 cites·13 claims
- 0581US10222202B2Three dimensional structure fabrication control using novel processing systemVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Mar 5, 2019·2 cites·16 claims
- 0680US11127593B2Techniques and apparatus for elongation patterning using angled ion beamsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Sep 21, 2021·2 cites·10 claims
- 0777US10410844B2RF clean system for electrostatic elementsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Sep 10, 2019·2 cites·10 claims
- 0875US10553448B2Techniques for processing a polycrystalline layer using an angled ion beamVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2016·Granted Feb 4, 2020·2 cites·18 claims
- 0970US11495434B2In-situ plasma cleaning of process chamber componentsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2020·Granted Nov 8, 2022·0 cites·12 claims
- 1070US2023223269A1Techniques and apparatus for unidirectional hole elongation using angled ion beamsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1170US2023238264A1Multi-Zone Platen Temperature ControlAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1268US10269663B2Critical dimensions variance compensationVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Apr 23, 2019·1 cites·9 claims
- 1368US10002764B1Sputter etch material selectivityVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2016·Granted Jun 19, 2018·1 cites·19 claims
- 1465US11037758B2In-situ plasma cleaning of process chamber componentsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2019·Granted Jun 15, 2021·0 cites·16 claims
- 1563US2021375626A1Techniques and apparatus for elongation patterning using angled ion beamsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2021·Application pending·0 cites
- 1662US11664193B2Temperature controlled/electrically biased wafer surroundAPPLIED MATERIALS INC·Filed 2021·Granted May 30, 2023·0 cites·19 claims
- 1761US11640909B2Techniques and apparatus for unidirectional hole elongation using angled ion beamsAPPLIED MATERIALS INC·Filed 2019·Granted May 2, 2023·0 cites·16 claims
- 1858US12106943B2Substrate halo arrangement for improved process uniformityAPPLIED MATERIALS INC·Filed 2021·Granted Oct 1, 2024·0 cites·9 claims
- 1955US10665421B2In-situ beam profile metrologyAPPLIED MATERIALS INC·Filed 2018·Granted May 26, 2020·0 cites·32 claims
- 2055US2025112052A1Directional rie feature rectangularityAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2153US10847372B2Workpiece processing techniqueVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Nov 24, 2020·0 cites·18 claims
- 2252US12191117B2Compact low angle ion beam extraction assembly and processing apparatusAPPLIED MATERIALS INC·Filed 2021·Granted Jan 7, 2025·0 cites·16 claims
- 2348US11053580B2Techniques for selective deposition using angled ionsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Jul 6, 2021·0 cites·16 claims
- 2443US2017005013A1Workpiece Processing TechniqueVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Application pending·0 cites
- 2540US2019272983A1Substrate halo arrangement for improved process uniformityVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Application pending·0 cites
- 2635US2016111254A1Workpiece Processing Method And ApparatusVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2015·Application pending·0 cites
- 2733US2017092473A1In-situ plasma cleaning of process chamber electrostatic elements having varied geometriesVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →