Inventor · disambiguated record
Andrei V. Shchegrov
Also filed as: SHCHEGROV ANDREI · SHCHEGROV ANDREI V
97 granted patents·8 pending applications·1,470 citations·filing 2000–2023
99Inventor score
Top patents by PatentIndex Score
105 records- 0198US10352695B2X-ray scatterometry metrology for high aspect ratio structuresKLA TENCOR CORP·Filed 2016·Granted Jul 16, 2019·68 cites·21 claims
- 0298US10324050B2Measurement system optimization for X-ray based metrologyKLA TENCOR CORP·Filed 2016·Granted Jun 18, 2019·32 cites·20 claims
- 0398US9518916B1Compressive sensing for metrologyKLA TENCOR CORP·Filed 2014·Granted Dec 13, 2016·38 cites·29 claims
- 0498US7826071B2Parametric profiling using optical spectroscopic systemsKLA TENCOR CORP·Filed 2007·Granted Nov 2, 2010·114 cites·24 claims
- 0598US7357513B2System and method for driving semiconductor laser sources for displaysNOVALUX INC·Filed 2006·Granted Apr 15, 2008·75 cites·15 claims
- 0697US10895541B2Systems and methods for combined x-ray reflectometry and photoelectron spectroscopyKLA TENCOR CORP·Filed 2018·Granted Jan 19, 2021·21 cites·20 claims
- 0797US10013518B2Model building and analysis engine for combined X-ray and optical metrologyKLA TENCOR CORP·Filed 2013·Granted Jul 3, 2018·29 cites·20 claims
- 0897US9885962B2Methods and apparatus for measuring semiconductor device overlay using X-ray metrologyKLA TENCOR CORP·Filed 2014·Granted Feb 6, 2018·35 cites·22 claims
- 0997US9826614B1Compac X-ray source for semiconductor metrologyKLA TENCOR CORP·Filed 2014·Granted Nov 21, 2017·22 cites·20 claims
- 1097US9784690B2Apparatus, techniques, and target designs for measuring semiconductor parametersKLA TENCOR CORP·Filed 2015·Granted Oct 10, 2017·14 cites·20 claims
- 1197US9778213B2Metrology tool with combined XRF and SAXS capabilitiesKLA TENCOR CORP·Filed 2014·Granted Oct 3, 2017·39 cites·20 claims
- 1297US7570676B2Compact efficient and robust ultraviolet solid-state laser sources based on nonlinear frequency conversion in periodically poled materialsSPECTRALUS CORP·Filed 2007·Granted Aug 4, 2009·50 cites·21 claims
- 1396US11300524B1Pupil-plane beam scanning for metrologyKLA CORP·Filed 2021·Granted Apr 12, 2022·12 cites·27 claims
- 1496US10545104B2Computationally efficient X-ray based overlay measurementKLA TENCOR CORP·Filed 2016·Granted Jan 28, 2020·10 cites·20 claims
- 1596US10401738B2Overlay metrology using multiple parameter configurationsKLA TENCOR CORP·Filed 2017·Granted Sep 3, 2019·14 cites·49 claims
- 1696US9310290B2Multiple angles of incidence semiconductor metrology systems and methodsKLA TENCOR CORP·Filed 2015·Granted Apr 12, 2016·18 cites·35 claims
- 1796US9291554B2Method of electromagnetic modeling of finite structures and finite illumination for metrology and inspectionKUZNETSOV ALEXANDER·Filed 2014·Granted Mar 22, 2016·67 cites·23 claims
- 1896US9243886B1Optical metrology of periodic targets in presence of multiple diffraction ordersKLA TENCOR CORP·Filed 2013·Granted Jan 26, 2016·34 cites·25 claims
- 1996US8860937B1Metrology systems and methods for high aspect ratio and large lateral dimension structuresKLA TENCOR CORP·Filed 2013·Granted Oct 14, 2014·35 cites·19 claims
- 2096US7322704B2Frequency stabilized vertical extended cavity surface emitting lasersNOVALUX INC·Filed 2006·Granted Jan 29, 2008·37 cites·22 claims
- 2195US11519719B2Transmission small-angle X-ray scattering metrology systemKLA CORP·Filed 2020·Granted Dec 6, 2022·3 cites·20 claims
- 2295US9816810B2Measurement of multiple patterning parametersKLA TENCOR CORP·Filed 2016·Granted Nov 14, 2017·11 cites·14 claims
- 2395US8879073B2Optical metrology using targets with field enhancement elementsKLA TENCOR CORP·Filed 2013·Granted Nov 4, 2014·23 cites·20 claims
- 2495US7296897B2Projection display apparatus, system, and methodNOVALUX INC·Filed 2005·Granted Nov 20, 2007·30 cites·30 claims
- 2595US7280230B2Parametric profiling using optical spectroscopic systemsKLA TENCOR TECH CORP·Filed 2002·Granted Oct 9, 2007·71 cites·32 claims
- 2694US11333621B2Methods and systems for semiconductor metrology based on polychromatic soft X-Ray diffractionKLA TENCOR CORP·Filed 2018·Granted May 17, 2022·10 cites·27 claims
- 2794US10490462B2Metrology systems and methods for process controlKLA TENCOR CORP·Filed 2017·Granted Nov 26, 2019·10 cites·25 claims
- 2894US10345095B1Model based measurement systems with improved electromagnetic solver performanceKLA TENCOR CORP·Filed 2015·Granted Jul 9, 2019·11 cites·20 claims
- 2994US10152678B2System, method and computer program product for combining raw data from multiple metrology toolsKLA TENCOR CORP·Filed 2015·Granted Dec 11, 2018·21 cites·21 claims
- 3094US9490182B2Measurement of multiple patterning parametersKLA TENCOR CORP·Filed 2014·Granted Nov 8, 2016·12 cites·19 claims
- 3194US7359420B2Manufacturable vertical extended cavity surface emitting laser arraysARASOR CORP·Filed 2006·Granted Apr 15, 2008·91 cites·17 claims
- 3294US6900892B2Parametric profiling using optical spectroscopic systemsKLA TENCOR TECH CORP·Filed 2000·Granted May 31, 2005·66 cites·92 claims
- 3393US11899375B2Massive overlay metrology sampling with multiple measurement columnsKLA CORP·Filed 2021·Granted Feb 13, 2024·2 cites·56 claims
- 3493US11604420B2Self-calibrating overlay metrologyKLA CORP·Filed 2021·Granted Mar 14, 2023·2 cites·44 claims
- 3593US10769320B2Integrated use of model-based metrology and a process modelKLA TENCOR CORP·Filed 2013·Granted Sep 8, 2020·23 cites·30 claims
- 3693US10533848B2Metrology and control of overlay and edge placement errorsKLA TENCOR CORP·Filed 2018·Granted Jan 14, 2020·5 cites·42 claims
- 3793US10458912B2Model based optical measurements of semiconductor structures with anisotropic dielectric permittivityKLA TENCOR CORP·Filed 2017·Granted Oct 29, 2019·6 cites·27 claims
- 3893US10352876B2Signal response metrology for scatterometry based overlay measurementsKLA—TENCOR CORP·Filed 2015·Granted Jul 16, 2019·7 cites·20 claims
- 3993US10006865B1Confined illumination for small spot size metrologyKLA TENCOR CORP·Filed 2017·Granted Jun 26, 2018·8 cites·15 claims
- 4092US10438825B2Spectral reflectometry for in-situ process monitoring and controlKLA TENCOR CORP·Filed 2017·Granted Oct 8, 2019·8 cites·20 claims
- 4192US9846132B2Small-angle scattering X-ray metrology systems and methodsKLA TENCOR CORP·Filed 2014·Granted Dec 19, 2017·10 cites·13 claims
- 4292US9693439B1High brightness liquid droplet X-ray source for semiconductor metrologyKLA TENCOR CORP·Filed 2014·Granted Jun 27, 2017·20 cites·19 claims
- 4392US7009704B1Overlay error detectionKLA TENCOR TECH CORP·Filed 2000·Granted Mar 7, 2006·46 cites·90 claims
- 4491US10203247B2Systems for providing illumination in optical metrologyKLA TENCOR CORP·Filed 2016·Granted Feb 12, 2019·10 cites·21 claims
- 4591US7742510B2Compact solid-state laser with nonlinear frequency conversion using periodically poled materialsSPECTRALUS CORP·Filed 2007·Granted Jun 22, 2010·17 cites·28 claims
- 4690US11698251B2Methods and systems for overlay measurement based on soft X-ray ScatterometryKLA CORP·Filed 2020·Granted Jul 11, 2023·2 cites·22 claims
- 4790US10801953B2Semiconductor metrology based on hyperspectral imagingKLA TENCOR CORP·Filed 2019·Granted Oct 13, 2020·7 cites·23 claims
- 4890US10107765B2Apparatus, techniques, and target designs for measuring semiconductor parametersKLA TENCOR CORP·Filed 2017·Granted Oct 23, 2018·3 cites·40 claims
- 4990US9412673B2Multi-model metrologyKLA TENCOR CORP·Filed 2014·Granted Aug 9, 2016·10 cites·25 claims
- 5090US7375810B2Overlay error detectionKLA TENCOR CORP·Filed 2005·Granted May 20, 2008·21 cites·35 claims
Showing the top 50 of 105 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →