Inventor · disambiguated record
Hali Forstner
Also filed as: FORSTNER HALI · FORSTNER HALI J · FORSTNER HALI J L
4 granted patents·2 pending applications·195 citations·filing 1998–2007
81Inventor score
Files withAPPLIED MATERIALS INC6
Top patents by PatentIndex Score
6 records- 0192US6042654AMethod of cleaning CVD cold-wall chamber and exhaust linesAPPLIED MATERIALS INC·Filed 1998·Granted Mar 28, 2000·134 cites·39 claims
- 0281US6916744B2Method and apparatus for planarization of a material by growing a sacrificial film with customized thickness profileAPPLIED MATERIALS INC·Filed 2002·Granted Jul 12, 2005·27 cites·19 claims
- 0374US7642171B2Multi-step anneal of thin films for film densification and improved gap-fillAPPLIED MATERIALS INC·Filed 2004·Granted Jan 5, 2010·15 cites·26 claims
- 0457US6368567B2Point-of-use exhaust by-product reactorAPPLIED MATERIALS INC·Filed 1998·Granted Apr 9, 2002·19 cites·18 claims
- 0549US2007000897A1Multi-step anneal of thin films for film densification and improved gap-fillAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 0644US2007212847A1Multi-step anneal of thin films for film densification and improved gap-fillAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →