Inventor · disambiguated record
Hoa D. Truong
Also filed as: ITO LEGAL REPRESENTATIVE ATSUKO · TRUONG HOA · TRUONG HOA D · TRUONG HOA DAO
37 granted patents·2 pending applications·244 citations·filing 2000–2018
97Inventor score
Top patents by PatentIndex Score
39 records- 0196US6806026B2Photoresist compositionIBM·Filed 2002·Granted Oct 19, 2004·62 cites·69 claims
- 0295US9671694B1Wet strippable gap fill materialsIBM·Filed 2016·Granted Jun 6, 2017·12 cites·17 claims
- 0395US9244345B1Non-ionic photo-acid generating polymers for resist applicationsIBM·Filed 2014·Granted Jan 26, 2016·13 cites·37 claims
- 0491US8323868B2Bilayer systems including a polydimethylglutarimide-based bottom layer and compositions thereofCHENG JOY·Filed 2009·Granted Dec 4, 2012·4 cites·19 claims
- 0591US7883828B2Functionalized carbosilane polymers and photoresist compositions containing the sameIBM·Filed 2008·Granted Feb 8, 2011·7 cites·9 claims
- 0689US7358029B2Low activation energy dissolution modification agents for photoresist applicationsIBM·Filed 2005·Granted Apr 15, 2008·9 cites·31 claims
- 0788US7141692B2Molecular photoresists containing nonpolymeric silsesquioxanesIBM·Filed 2003·Granted Nov 28, 2006·19 cites·69 claims
- 0887US9879152B2Block copolymers for directed self-assembly applicationsIBM·Filed 2015·Granted Jan 30, 2018·2 cites·46 claims
- 0987US9057960B2Resist performance for the negative tone develop organic development processIBM·Filed 2013·Granted Jun 16, 2015·4 cites·30 claims
- 1087US8821978B2Methods of directed self-assembly and layered structures formed therefromCHENG JOY·Filed 2009·Granted Sep 2, 2014·13 cites·29 claims
- 1184US8124327B2Method for using compositions containing fluorocarbinols in lithographic processesBREYTA GREGORY·Filed 2010·Granted Feb 28, 2012·4 cites·20 claims
- 1283US6794110B2Polymer blend and associated methods of preparation and useIBM·Filed 2002·Granted Sep 21, 2004·21 cites·59 claims
- 1382US8900802B2Positive tone organic solvent developed chemically amplified resistIBM·Filed 2013·Granted Dec 2, 2014·3 cites·36 claims
- 1482US7135595B2Photoresist compositionIBM·Filed 2006·Granted Nov 14, 2006·4 cites·1 claims
- 1582US6251560B1Photoresist compositions with cyclic olefin polymers having lactone moietyIBM·Filed 2000·Granted Jun 26, 2001·20 cites·31 claims
- 1680US7781157B2Method for using compositions containing fluorocarbinols in lithographic processesIBM·Filed 2006·Granted Aug 24, 2010·4 cites·8 claims
- 1780US7476492B2Low activation energy photoresist composition and process for its useIBM·Filed 2006·Granted Jan 13, 2009·4 cites·1 claims
- 1876US7014980B2Photoresist compositionIBM·Filed 2004·Granted Mar 21, 2006·10 cites·29 claims
- 1975US7622240B2Low blur molecular resistIBM·Filed 2005·Granted Nov 24, 2009·4 cites·25 claims
- 2073US7951525B2Low outgassing photoresist compositionsIBM·Filed 2008·Granted May 31, 2011·2 cites·20 claims
- 2173US7193023B2Low activation energy photoresistsIBM·Filed 2003·Granted Mar 20, 2007·11 cites·56 claims
- 2271US7824845B2Functionalized carbosilane polymers and photoresist compositions containing the sameIBM·Filed 2008·Granted Nov 2, 2010·2 cites·13 claims
- 2365US8945808B2Self-topcoating resist for photolithographyDAVID ROBERT ALLEN·Filed 2006·Granted Feb 3, 2015·3 cites·16 claims
- 2458US11226561B2Self-priming resist for generic inorganic hardmasksIBM·Filed 2018·Granted Jan 18, 2022·0 cites·19 claims
- 2558US8802347B2Silicon containing coating compositions and methods of useALLEN ROBERT D·Filed 2009·Granted Aug 12, 2014·0 cites·20 claims
- 2655US8334088B2Functionalized carbosilane polymers and photoresist compositions containing the sameALLEN ROBERT D·Filed 2010·Granted Dec 18, 2012·0 cites·23 claims
- 2755US8168366B2Low activation energy photoresist composition and process for its useALLEN ROBERT DAVID·Filed 2008·Granted May 1, 2012·0 cites·23 claims
- 2855US2009081579A1Functionalized carbosilane polymers and photoresist compositions containing the sameIBM·Filed 2007·Application pending·0 cites
- 2953US9950999B2Non-ionic low diffusing photo-acid generatorsIBM·Filed 2016·Granted Apr 24, 2018·0 cites·22 claims
- 3053US8034532B2High contact angle topcoat material and use thereof in lithography processIBM·Filed 2006·Granted Oct 11, 2011·4 cites·17 claims
- 3151US9983475B2Fluorinated sulfonate esters of aryl ketones for non-ionic photo-acid generatorsIBM·Filed 2016·Granted May 29, 2018·0 cites·24 claims
- 3251US9057951B2Chemically amplified photoresist composition and process for its useALLEN ROBERT D·Filed 2009·Granted Jun 16, 2015·0 cites·16 claims
- 3350US9951164B2Non-ionic aryl ketone based polymeric photo-acid generatorsIBM·Filed 2016·Granted Apr 24, 2018·0 cites·25 claims
- 3448US9389516B2Resist performance for the negative tone develop organic development processIBM·Filed 2015·Granted Jul 12, 2016·0 cites·38 claims
- 3544US9851639B2Photoacid generating polymers containing a urethane linkage for lithographyALLEN ROBERT DAVID·Filed 2012·Granted Dec 26, 2017·0 cites·33 claims
- 3640US10915023B2Nitrogen heterocycle-containing monolayers on metal oxides for binding biopolymersIBM·Filed 2017·Granted Feb 9, 2021·0 cites·18 claims
- 3739US7820369B2Method for patterning a low activation energy photoresistIBM·Filed 2003·Granted Oct 26, 2010·3 cites·31 claims
- 3838US7759044B2Low activation energy dissolution modification agents for photoresist applicationsIBM·Filed 2008·Granted Jul 20, 2010·0 cites·20 claims
- 3936US2009081598A1Functionalized carbosilane polymers and photoresist compositions containing the sameIBM·Filed 2007·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →