Functionalized carbosilane polymers and photoresist compositions containing the same

Abstract

Linear or branched functionalized polycarbosilanes having an absorbance less than 3.0 μm −1 at 193 nm and a relatively high refractive index are provided. The functionalized polycarbosilanes contain at least one pendant group that is acid labile or aqueous base soluble. Also disclosed are photoresists formulations containing the functionalized polycarbosilanes that are suitable for use in lithography, e.g., immersion lithography.

1 . A process for generating a resist image on a substrate, comprising:
 coating a substrate with a film comprising a photoresist composition comprising a linear or branched functionalized carbosilane polymer having at least one acid labile functionality and/or an aqueous base soluble functionality, wherein the functionalized polycarbosilane has a refractive index greater than 1.7 and an absorbance less than 3.0 μm −1  at 193 nanometers and has a formula selected from the group consisting of:   
     
       
         
         
             
             
         
       
       
         
         
             
             
         
       
     
     wherein a, b, and c are integers that represent a number of repeat units;
 providing a liquid medium between the film and a lens of an exposure tool; 
 exposing the film selectively to a predetermined pattern of radiation so as to form a latent patterned image in the film; and 
 developing the latent image with a developer to form the resist image. 
 
   
   
       2 - 19 . (canceled)