Inventor · disambiguated record
Cecilia Annette Montgomery
Also filed as: MONTGOMERY CECILIA A · MONTGOMERY CECILIA ANNETTE
3 granted patents·2 pending applications·53 citations·filing 2001–2016
72Inventor score
Top patents by PatentIndex Score
5 records- 0187US6727047B2Method of extending the stability of a photoresist during direct writing of an image upon the photoresistAPPLIED MATERIALS INC·Filed 2001·Granted Apr 27, 2004·31 cites·31 claims
- 0278US6969569B2Method of extending the stability of a photoresist during direct writing of an imageAPPLIED MATERIALS INC·Filed 2004·Granted Nov 29, 2005·18 cites·18 claims
- 0353US7208249B2Method of producing a patterned photoresist used to prepare high performance photomasksAPPLIED MATERIALS INC·Filed 2002·Granted Apr 24, 2007·4 cites·18 claims
- 0450US2014206112A1Method for reducing charge in critical dimension-scanning electron microscope metrologySEMATECH INC·Filed 2014·Application pending·0 cites
- 0546US2017040228A1Method for reducing charge in critical dimension-scanning electron microscope metrologyUNIV NEW YORK STATE RES FOUND·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →