Inventor · disambiguated record
Sonal A. Srivastava
Also filed as: SRIVASTAVA SONAL A
1 granted patent·1 pending application·0 citations·filing 2012–2014
9Inventor score
Technology areasH10W
Top patents by PatentIndex Score
2 records- 0137US9023227B2Increased deposition efficiency and higher chamber conductance with source power increase in an inductively coupled plasma (ICP) chamberDINEV JIVKO·Filed 2012·Granted May 5, 2015·0 cites·20 claims
- 0237US2014199833A1Methods for performing a via reveal etching process for forming through-silicon vias in a substrateAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →