Assignee
DINEV JIVKO
US·2 granted patents·2 citations·filing 2011–2012
Top patents by PatentIndex Score
2 records- 0165US8920599B2High efficiency gas dissociation in inductively coupled plasma reactor with improved uniformityDINEV JIVKO·Filed 2011·Granted Dec 30, 2014·2 cites·13 claims
- 0237US9023227B2Increased deposition efficiency and higher chamber conductance with source power increase in an inductively coupled plasma (ICP) chamberDINEV JIVKO·Filed 2012·Granted May 5, 2015·0 cites·20 claims
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