Inventor · disambiguated record
Ady Levy
Also filed as: LEVY ADY
85 granted patents·10 pending applications·4,005 citations·filing 2000–2021
99Inventor score
Top patents by PatentIndex Score
95 records- 0199US6633831B2Methods and systems for determining a critical dimension and a thin film characteristic of a specimenKLA TENCOR TECHNOLOGIES·Filed 2001·Granted Oct 14, 2003·362 cites·82 claims
- 0298US7826071B2Parametric profiling using optical spectroscopic systemsKLA TENCOR CORP·Filed 2007·Granted Nov 2, 2010·114 cites·24 claims
- 0398US6891627B1Methods and systems for determining a critical dimension and overlay of a specimenKLA TENCOR TECH CORP·Filed 2001·Granted May 10, 2005·192 cites·100 claims
- 0498US6694284B1Methods and systems for determining at least four properties of a specimenKLA TENCOR TECH CORP·Filed 2001·Granted Feb 17, 2004·211 cites·61 claims
- 0598US6486954B1Overlay alignment measurement markKLA TENCOR TECH CORP·Filed 2000·Granted Nov 26, 2002·199 cites·38 claims
- 0697US8330281B2Overlay marks, methods of overlay mark design and methods of overlay measurementsGHINOVKER MARK·Filed 2007·Granted Dec 11, 2012·43 cites·9 claims
- 0797US8179530B2Methods and systems for determining a critical dimension and overlay of a specimenLEVY ADY·Filed 2010·Granted May 15, 2012·143 cites·24 claims
- 0897US7433040B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2007·Granted Oct 7, 2008·28 cites·18 claims
- 0997US7317824B2Overlay marks, methods of overlay mark design and methods of overlay measurementsKLA TENCOR TECH CORP·Filed 2006·Granted Jan 8, 2008·22 cites·60 claims
- 1097US7317531B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2003·Granted Jan 8, 2008·83 cites·30 claims
- 1197US7242477B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2004·Granted Jul 10, 2007·124 cites·20 claims
- 1297US7175945B2Focus masking structures, focus patterns and measurements thereofKLA TENCOR CORP·Filed 2005·Granted Feb 13, 2007·37 cites·4 claims
- 1397US6812045B1Methods and systems for determining a characteristic of a specimen prior to, during, or subsequent to ion implantationKLA TENCOR INC·Filed 2001·Granted Nov 2, 2004·97 cites·52 claims
- 1497US6673637B2Methods and systems for determining a presence of macro defects and overlay of a specimenKLA TENCOR TECHNOLOGIES·Filed 2001·Granted Jan 6, 2004·120 cites·83 claims
- 1596US7751046B2Methods and systems for determining a critical dimension and overlay of a specimenKLA TENCOR TECH CORP·Filed 2003·Granted Jul 6, 2010·79 cites·13 claims
- 1696US7564557B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2007·Granted Jul 21, 2009·19 cites·7 claims
- 1796US7298481B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2004·Granted Nov 20, 2007·46 cites·11 claims
- 1896US7289213B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2004·Granted Oct 30, 2007·49 cites·15 claims
- 1996US7280212B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2004·Granted Oct 9, 2007·45 cites·12 claims
- 2096US7139083B2Methods and systems for determining a composition and a thickness of a specimenKLA TENCOR TECH CORP·Filed 2001·Granted Nov 21, 2006·68 cites·62 claims
- 2196US6987572B2Methods and systems for lithography process controlKLA TENCOR TECH CORP·Filed 2003·Granted Jan 17, 2006·143 cites·26 claims
- 2296US6917433B2Methods and systems for determining a property of a specimen prior to, during, or subsequent to an etch processKLA TENCOR TECH CORP·Filed 2001·Granted Jul 12, 2005·61 cites·56 claims
- 2396US6806951B2Methods and systems for determining at least one characteristic of defects on at least two sides of a specimenKLA TENCOR TECH CORP·Filed 2001·Granted Oct 19, 2004·65 cites·74 claims
- 2495US9222771B2Acquisition of information for a construction siteKLA TENCOR CORP·Filed 2012·Granted Dec 29, 2015·36 cites·37 claims
- 2595US8502979B2Methods and systems for determining a critical dimension and overlay of a specimenLEVY ADY·Filed 2012·Granted Aug 6, 2013·24 cites·8 claims
- 2695US7989729B1Detecting and repairing defects of photovoltaic devicesKLA TENCOR CORP·Filed 2008·Granted Aug 2, 2011·48 cites·7 claims
- 2795US7933016B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2009·Granted Apr 26, 2011·15 cites·20 claims
- 2895US7876440B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2009·Granted Jan 25, 2011·13 cites·18 claims
- 2995US7663753B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2007·Granted Feb 16, 2010·19 cites·45 claims
- 3095US7297453B2Systems and methods for mitigating variances on a patterned wafer using a prediction modelKLA TENCOR TECH CORP·Filed 2006·Granted Nov 20, 2007·25 cites·15 claims
- 3195US7280230B2Parametric profiling using optical spectroscopic systemsKLA TENCOR TECH CORP·Filed 2002·Granted Oct 9, 2007·71 cites·32 claims
- 3295US7196782B2Methods and systems for determining a thin film characteristic and an electrical property of a specimenKLA TENCOR TECH CORP·Filed 2001·Granted Mar 27, 2007·56 cites·71 claims
- 3395US7006235B2Methods and systems for determining overlay and flatness of a specimenKLA TENCOR TECH CORP·Filed 2001·Granted Feb 28, 2006·48 cites·71 claims
- 3495US6950196B2Methods and systems for determining a thickness of a structure on a specimen and at least one additional property of the specimenKLA TENCOR TECH CORP·Filed 2001·Granted Sep 27, 2005·50 cites·73 claims
- 3595US6919957B2Methods and systems for determining a critical dimension, a presence of defects, and a thin film characteristic of a specimenKLA TENCOR TECH CORP·Filed 2001·Granted Jul 19, 2005·110 cites·90 claims
- 3695US6917419B2Methods and systems for determining flatness, a presence of defects, and a thin film characteristic of a specimenKLA TENCOR TECH CORP·Filed 2001·Granted Jul 12, 2005·51 cites·88 claims
- 3795US6891610B2Methods and systems for determining an implant characteristic and a presence of defects on a specimenKLA TENCOR TECH CORP·Filed 2001·Granted May 10, 2005·48 cites·87 claims
- 3895US6829559B2Methods and systems for determining a presence of macro and micro defects on a specimenK L A TENCOR TECHNOLOGIES·Filed 2001·Granted Dec 7, 2004·103 cites·80 claims
- 3994US10451412B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR CORP·Filed 2017·Granted Oct 22, 2019·7 cites·14 claims
- 4094US7385699B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2004·Granted Jun 10, 2008·34 cites·33 claims
- 4194US7301634B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2004·Granted Nov 27, 2007·35 cites·33 claims
- 4294US7106425B1Methods and systems for determining a presence of defects and a thin film characteristic of a specimenKLA TENCOR TECH CORP·Filed 2001·Granted Sep 12, 2006·71 cites·86 claims
- 4394US7068833B1Overlay marks, methods of overlay mark design and methods of overlay measurementsKLA TENCOR CORP·Filed 2001·Granted Jun 27, 2006·81 cites·38 claims
- 4494US6946394B2Methods and systems for determining a characteristic of a layer formed on a specimen by a deposition processKLA TENCOR TECHNOLOGIES·Filed 2001·Granted Sep 20, 2005·43 cites·64 claims
- 4594US6782337B2Methods and systems for determining a critical dimension an a presence of defects on a specimenKLA TENCOR TECH CORP·Filed 2001·Granted Aug 24, 2004·85 cites·83 claims
- 4694US6689519B2Methods and systems for lithography process controlKLA TENCOR TECH CORP·Filed 2001·Granted Feb 10, 2004·75 cites·28 claims
- 4793US9702693B2Apparatus for measuring overlay errorsKLA TENCOR CORP·Filed 2016·Granted Jul 11, 2017·6 cites·64 claims
- 4893US7879627B2Overlay marks and methods of manufacturing such marksKLA TENCOR TECH CORP·Filed 2009·Granted Feb 1, 2011·25 cites·12 claims
- 4993US7656512B2Method for determining lithographic focus and exposureKLA TENCOR TECH CORP·Filed 2008·Granted Feb 2, 2010·15 cites·40 claims
- 5093US7382447B2Method for determining lithographic focus and exposureKLA TENCOR TECH CORP·Filed 2002·Granted Jun 3, 2008·46 cites·18 claims
Showing the top 50 of 95 patent records by PatentIndex Score.
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