Inventor · disambiguated record
William W. Dostalik
Also filed as: DOSTALIK JR WILLIAM W · DOSTALIK WILLIAM W · DOSTALIK WILLIAM WESLEY
8 granted patents·9 pending applications·80 citations·filing 1992–2011
86Inventor score
Files withTEXAS INSTRUMENTS INC15
Top patents by PatentIndex Score
17 records- 0183US8008200B2Poison-free and low ULK damage integration scheme for damascene interconnectsTEXAS INSTRUMENTS INC·Filed 2011·Granted Aug 30, 2011·6 cites·16 claims
- 0282US6984580B2Dual damascene pattern linerTEXAS INSTRUMENTS INC·Filed 2004·Granted Jan 10, 2006·29 cites·21 claims
- 0373US7884019B2Poison-free and low ULK damage integration scheme for damascene interconnectsTEXAS INSTRUMENTS INC·Filed 2007·Granted Feb 8, 2011·5 cites·19 claims
- 0469US7192880B2Method for line etch roughness (LER) reduction for low-k interconnect damascene trench etchingTEXAS INSTRUMENTS INC·Filed 2004·Granted Mar 20, 2007·13 cites·33 claims
- 0561US7425512B2Method for etching a substrate and a device formed using the methodTEXAS INSTRUMENTS INC·Filed 2003·Granted Sep 16, 2008·9 cites·20 claims
- 0656US7067435B2Method for etch-stop layer etching during damascene dielectric etching with low polymerizationTEXAS INSTRUMENTS INC·Filed 2004·Granted Jun 27, 2006·6 cites·18 claims
- 0751US2009081864A1SiC Film for Semiconductor ProcessingTEXAS INSTRUMENTS INC·Filed 2007·Application pending·0 cites
- 0849US2008303141A1Method for etching a substrate and a device formed using the methodTEXAS INSTRUMENTS INC·Filed 2008·Application pending·0 cites
- 0945US2009075480A1Silicon Carbide Doped Oxide Hardmask For Single and Dual Damascene IntegrationTEXAS INSTRUMENTS INC·Filed 2007·Application pending·0 cites
- 1045US2011034023A1Silicon carbide film for integrated circuit fabricationTEXAS INSTRUMENTS INC·Filed 2010·Application pending·0 cites
- 1142US7087518B2Method of passivating and/or removing contaminants on a low-k dielectric/copper surfaceTEXAS INSTRUMENTS INC·Filed 2003·Granted Aug 8, 2006·0 cites·7 claims
- 1242US2007290347A1Semiconductive device having resist poison aluminum oxide barrier and method of manufactureTEXAS INSTRUMENTS INC·Filed 2006·Application pending·0 cites
- 1342US2008057701A1Method for prevention of resist poisoning in integrated circuit fabricationTEXAS INSTRUMENTS INC·Filed 2006·Application pending·0 cites
- 1442US2007210421A1Semiconductor device fabricated using a carbon-containing film as a contact etch stop layerTEXAS INSTRUMENTS INC·Filed 2006·Application pending·0 cites
- 1541US5268067AWafer clamping methodTEXAS INSTRUMENTS INC·Filed 1992·Granted Dec 7, 1993·12 cites·10 claims
- 1639US2003170992A1Method of passivating and/or removing contaminants on a low-k dielectric/copper surfaceFiled 2002·Application pending·0 cites
- 1738US2004222527A1Dual damascene pattern linerFiled 2003·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →