Inventor · disambiguated record
Donis Flagello
Also filed as: FLAGELLO DONIS · FLAGELLO DONIS G · FLAGELLO DONIS GEORGE
36 granted patents·11 pending applications·1,440 citations·filing 1987–2024
98Inventor score
Top patents by PatentIndex Score
47 records- 0197US5470661ADiamond-like carbon films from a hydrocarbon helium plasmaIBM·Filed 1993·Granted Nov 28, 1995·362 cites·7 claims
- 0296US7221501B2Stationary and dynamic radial transverse electric polarizer for high numerical aperture systemsASML NETHERLANDS BV·Filed 2005·Granted May 22, 2007·28 cites·26 claims
- 0395US10310387B2Dynamic patterning method that removes phase conflicts and improves pattern fidelity and CDU on a two phase-pixelated digital scannerNIKON CORP·Filed 2018·Granted Jun 4, 2019·15 cites·17 claims
- 0495US6943941B2Stationary and dynamic radial transverse electric polarizer for high numerical aperture systemsASML NETHERLANDS BV·Filed 2003·Granted Sep 13, 2005·58 cites·10 claims
- 0594US5517340AHigh performance projection display with two light valvesIBM·Filed 1995·Granted May 14, 1996·152 cites·20 claims
- 0694US4840923ASimultaneous multiple level interconnection processIBM·Filed 1988·Granted Jun 20, 1989·137 cites·11 claims
- 0792US7511884B2Stationary and dynamic radial transverse electric polarizer for high numerical aperture systemsASML NETHERLANDS BV·Filed 2005·Granted Mar 31, 2009·23 cites·8 claims
- 0892US6954256B2Gradient immersion lithographyASML NETHERLANDS BV·Filed 2003·Granted Oct 11, 2005·275 cites·23 claims
- 0992US6855486B1Lithographic method and apparatusASML NETHERLANDS BV·Filed 2000·Granted Feb 15, 2005·77 cites·19 claims
- 1091US8910093B2Fast photoresist modelFLAGELLO DONIS G·Filed 2011·Granted Dec 9, 2014·9 cites·24 claims
- 1190US5054872APolymeric optical waveguides and methods of forming the sameIBM·Filed 1990·Granted Oct 8, 1991·102 cites·34 claims
- 1289US7684013B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Mar 23, 2010·12 cites·15 claims
- 1388US7548302B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2007·Granted Jun 16, 2009·12 cites·45 claims
- 1488US5569501ADiamond-like carbon films from a hydrocarbon helium plasmaIBM·Filed 1995·Granted Oct 29, 1996·82 cites·28 claims
- 1583US7292315B2Optimized polarization illuminationASML MASKTOOLS BV·Filed 2004·Granted Nov 6, 2007·17 cites·16 claims
- 1682US6887625B2Assist features for use in lithographic projectionASML NETHERLANDS BV·Filed 2001·Granted May 3, 2005·25 cites·62 claims
- 1777US10890849B2EUV lithography system for dense line patterningNIKON CORP·Filed 2017·Granted Jan 12, 2021·1 cites·18 claims
- 1876US11099483B2Euv lithography system for dense line patterningNIKON CORP·Filed 2017·Granted Aug 24, 2021·1 cites·29 claims
- 1976US7256873B2Enhanced lithographic resolution through double exposureASML NETHERLANDS BV·Filed 2004·Granted Aug 14, 2007·12 cites·11 claims
- 2075US9086633B2Lithographic methodFLAGELLO DONIS GEORGE·Filed 2009·Granted Jul 21, 2015·4 cites·19 claims
- 2172US9091941B2Fast illumination simulator based on a calibrated flexible point-spread functionNIKON CORP·Filed 2014·Granted Jul 28, 2015·1 cites·20 claims
- 2272US7710544B2Optimized polarization illuminationASML MASKTOOLS BV·Filed 2007·Granted May 4, 2010·2 cites·13 claims
- 2371US11300884B2Illumination system with curved 1d-patterned mask for use in EUV-exposure toolNIKON CORP·Filed 2019·Granted Apr 12, 2022·1 cites·46 claims
- 2469US7206059B2Stationary and dynamic radial transverse electric polarizer for high numerical aperture systemsASML NETHERLANDS BV·Filed 2004·Granted Apr 17, 2007·9 cites·11 claims
- 2568US2025053105A1Systems and methods for monitoring spatial light modulator (slm) flareNIKON CORP·Filed 2024·Application pending·0 cites
- 2666US8395757B2Optimized polarization illuminationSOCHA ROBERT·Filed 2010·Granted Mar 12, 2013·1 cites·14 claims
- 2766US7317506B2Variable illumination sourceASML NETHERLANDS BV·Filed 2005·Granted Jan 8, 2008·2 cites·20 claims
- 2865US12346029B2Curved reticle by mechanical and phase bending along orthogonal axesNIKON CORP·Filed 2022·Granted Jul 1, 2025·0 cites·34 claims
- 2962US8252487B2Device manufacturing method and mask for use thereinDIERICHS MARCEL MATHIJS THEODORE MARIE·Filed 2003·Granted Aug 28, 2012·6 cites·14 claims
- 3055US9366952B2Lithographic substrate and a deviceASML HOLDING NV·Filed 2015·Granted Jun 14, 2016·0 cites·20 claims
- 3152US2007258073A1Enhanced lithographic resolution through double exposureASML NETHERLANDS BV·Filed 2007·Application pending·0 cites
- 3252US2008030708A1Device manufacturing methodASML NETHERLANDS BV·Filed 2007·Application pending·0 cites
- 3350US2012212722A1Fast Illumination Simulator Based on a Calibrated Flexible Point Spread FunctionSMITH DANIEL GENE·Filed 2012·Application pending·0 cites
- 3448US7538875B2Lithographic apparatus and methods for use thereofASML NETHERLANDS BV·Filed 2004·Granted May 26, 2009·2 cites·12 claims
- 3548US2009208878A1Lithographic System, Lithographic Apparatus and Device Manufacturing MethodASML NETHERLANDS BV·Filed 2008·Application pending·0 cites
- 3647US4770947AMultiple density mask and fabrication thereofIBM·Filed 1987·Granted Sep 13, 1988·7 cites·9 claims
- 3747US2008284998A1Lithographic apparatus and method of controllingZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 3847US2015234295A1Dynamic patterning method that removes phase conflicts and improves pattern fidelity and cdu on a two phase-pixelated digital scannerNIKON CORP·Filed 2015·Application pending·0 cites
- 3946US2010041239A1Diffractive Optical Element, Lithographic Apparatus and Semiconductor Device Manufacturing MethodASML NETHERLANDS BV·Filed 2009·Application pending·0 cites
- 4045US7952803B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted May 31, 2011·0 cites·21 claims
- 4141US8588508B2Method or matching high-numerical aperture scannersPALMER SHANE ROY·Filed 2011·Granted Nov 19, 2013·0 cites·14 claims
- 4241US2005007573A1Device manufacturing methodASML NETHERLANDS BV·Filed 2004·Application pending·0 cites
- 4340US10133184B2Using customized lens pupil optimization to enhance lithographic imaging in a source-mask optimization schemeFLAGELLO DONIS G·Filed 2012·Granted Nov 20, 2018·0 cites·9 claims
- 4440US5238773AAlkaline developable photoresist composition containing radiation sensitive organosilicon compound with quinone diazide terminal groupsIBM·Filed 1992·Granted Aug 24, 1993·5 cites·18 claims
- 4539US2006256311A1Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Application pending·0 cites
- 4638US7113259B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Sep 26, 2006·0 cites·17 claims
- 4738US2013065185A1Scanning Lithography using point source imaging arraysFLAGELLO DONIS G·Filed 2011·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →