US2012212722A1PendingUtilityA1
Fast Illumination Simulator Based on a Calibrated Flexible Point Spread Function
Est. expiryFeb 21, 2031(~4.6 yrs left)· nominal 20-yr term from priority
G03F 7/7055G03F 7/705G03F 7/70083
50
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Claims
Abstract
A way of predicting distribution of light in an illumination pupil, comprising: (a) identifying one or more component(s) of an illumination system having an illumination pupil, where the component(s) affect the distribution of light in the illumination pupil; (b) generating a point spread function that depends on the identified component(s) and has a functional relationship with the configurable settings of the illumination system; and (c) predicting the distribution of light in the illumination pupil using the point spread function.
Claims
exact text as granted — not AI-modified1 . A method of predicting the distribution of light in the illumination pupil of an illumination system, comprising:
(a) identifying one or more component(s) of the illumination system that affect the distribution of light in the illumination pupil of the illumination system; (b) generating a point spread function that depends on the identified component(s) and has a functional relationship with the configurable settings of the illumination system; and (c) predicting the distribution of light in the illumination pupil using the point spread function.
2 . The method of claim 1 , wherein the illumination system is configured to relay scattered light from a scattering component to an illumination pupil and a reticle.
3 . The method of claim 2 , wherein one of the identified component(s) comprises an axicon pair.
4 . The method of claim 3 , wherein one of the identified components further comprise a zoom lens combined with the axicon pair.
5 . The method of claim 2 , wherein one of the identified component(s) comprises a zoom lens.
6 . The method of claim I, wherein one of the identified component(s) includes one or more micromirror arrays.
7 . The method of claim 1 , wherein the illumination system comprises a light source that generates light at a wavelength of 193 nm.
8 . The method of claim 7 , wherein the prediction of the distribution of light in the illumination pupil is according to the following algorithm
A reticle ( x mn ,y mn )≈Σ i Σ j A s (α ij ,β ij ) psf ( x mn ,y mn ,α ij ,β ij ,IU setting ) (1)
where the far field distribution of a diffracting/scattering element that produces the scattered light is represented by A s , and is a function of the entrance pupil coordinates α ij and β ij ; the subscripts are a consequence of the discrete (rather than continuous) sum across the two dimensional array of pixels in the pupil—each pixel (ij) has a pair of pupil coordinates (α,β); and the distribution in the exit pupil of the illuminator, or the incident far field at the reticle, is then A reticle , a function of the exit pupil coordinates (x mn , y mn ).
9 . An illumination system configured for use in predicting the distribution of light in the illumination pupil of the illumination system, comprising:
(a) one or more component(s) of the illumination system that are identified as affecting the distribution of light in the illumination pupil of the illumination system; and (b) the illumination system configured to enable prediction of the distribution of light in the illumination pupil of the system from a point spread function that depends on the identified component(s) and has a functional relationship with the configurable settings of the illumination system.
10 . The illumination system of claim 9 , wherein the illumination system has a scattering component and is configured to relay scattered light from the scattering component to the illumination pupil and to a reticle.
11 . The illumination system of claim 10 , wherein the identified components comprises an axicon pair.
12 . The illumination system of claim 11 , wherein the identified component(s) further comprise a zoom lens combined with the axicon pair.
13 . The illumination system of claim 10 , wherein the identified component(s) comprises a zoom lens.
14 . The illumination system of claim 9 , wherein the identified component(s) comprises a micromirror array.
15 . The illumination system of claim 9 , wherein the illumination system comprises a light source that generates light at a wavelength of 193 nm.
16 . A process that enables a computer to simulate an exposure apparatus which irradiates an illumination light and forms a pattern on an object, to predict the distribution of light in the illumination pupil of an illumination system, the process comprising:
(a) identifying one or more component(s) of the illumination system that affect the distribution of light in the illumination pupil of the illumination system; and (b) configuring the computer to simulate an exposure apparatus which irradiates an illumination light and forms a pattern on an object, to predict the distribution of light in the illumination pupil of an illumination system, by
(i) generating a point spread function that depends on the identified component(s) and has a functional relationship with the configurable settings of the illumination system; and
(ii) predicting the distribution of light in the illumination pupil using the point spread function.Join the waitlist — get patent alerts
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