Inventor · disambiguated record
Harvey Wayne Pinder
Also filed as: PINDER HARVEY · PINDER HARVEY WAYNE · PINDER JR HARVEY WAYNE
2 granted patents·6 pending applications·17 citations·filing 1997–2011
56Inventor score
Top patents by PatentIndex Score
8 records- 0162US8597539B2Chemical mechanical polishing (CMP) polishing solution with enhanced performanceLI YUZHUO·Filed 2009·Granted Dec 3, 2013·2 cites·20 claims
- 0239US5895315ARecovery device for polishing agent and deionizing water for a polishing machineFiled 1997·Granted Apr 20, 1999·15 cites·6 claims
- 0333US2013171824A1Process for chemically mechanically polishing substrates containing silicon oxide dielectric films and polysilicon and/or silicon nitride filmsLI YUZHUO·Filed 2011·Application pending·0 cites
- 0433US2013161285A1Aqueous polishing composition and process for chemically mechanically polishing substrate materials for electrical, mechanical and optical devicesLI YUZHUO·Filed 2011·Application pending·0 cites
- 0533US2013168348A1Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon filmsLI YUZHUO·Filed 2011·Application pending·0 cites
- 0633US2013200038A1Aqueous polishing composition and process for chemically mechanically polishing substrates for electrical, mechanical and optical devicesLI YUZHUO·Filed 2011·Application pending·0 cites
- 0732US2005277376A1Single component pad backer for polishing head of an orbital chemical mechanical polishing machine and method thereforPINDER HARVEY·Filed 2005·Application pending·0 cites
- 0831US2013200039A1Aqueous polishing compositions containing n-substituted diazenium dioxides and/or n'-hydroxy-diazenium oxide saltsNOLLER BASTIAN·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →